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EVALUATION OF SCALE-UP CHARACTERISTICS AND DEVELOPMENT OF SIMULATOR FOR MANUFACTURE OF FUNCTIONAL FINE PARTICLES BY GAS - PHASE METHOD

Research Project

Project/Area Number 09555231
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section展開研究
Research Field 化学工学一般
Research InstitutionHiroshima University

Principal Investigator

OKUYAMA Kikuo  HIROSHIMA UNIVERSITY, FACULTY OF ENGINEERING, PROFESSOR, 工学部, 教授 (00101197)

Co-Investigator(Kenkyū-buntansha) SHIMADA Manabu  HIROSHIMA UNIVERSITY, FACULTY OF ENGINEERING, ASSOCIATE PROFESSOR, 工学部, 助教授 (70178953)
大島 賢太郎  花王(株), 生産技術開発研究所, 研究員
Project Period (FY) 1997 – 1999
Project Status Completed (Fiscal Year 1999)
Budget Amount *help
¥11,200,000 (Direct Cost: ¥11,200,000)
Fiscal Year 1999: ¥2,100,000 (Direct Cost: ¥2,100,000)
Fiscal Year 1998: ¥3,500,000 (Direct Cost: ¥3,500,000)
Fiscal Year 1997: ¥5,600,000 (Direct Cost: ¥5,600,000)
KeywordsFunctional Fine Particle / Chemical Vapor Deposition / Scale-up / Numerical Simulation / Titania / Distrete-Sectional Model / Gold Nanopartical / Sintering phenomenon / 気相化学折出法(CVD) / CVD / Discrete-Sectioanlモデル / 液体原料 / 微粒子材料 / エアロゾルプロセス / 凝集粒子 / 焼結 / 酸化チタン粒子 / 一次粒子径 / 核生成
Research Abstract

In the experimental portion of this study,
1. A reactor equipped with wall temperature controllers for preparation of fine particles was manufactured, and the temperature distribution at the wall and inside of the reactor were measured. Analysis of the gas velocity and temperature distributions in the reactor by numerical simulation showed that these distributions governing particle formation in the reactor could be evaluated theoretically.
2. A device for generating titanium alkoxide vapor or titanium tetrachloride vapor was also manufactured, to perform experiments of manufacturing titania fine particles by feeding either of the vapors into the reactor with carrier gas using the device. The state of agglomeration, and the size distributions of agglomerates and primary particles were determined by aerosol measurement techniques and electron microscopy. The complicated changes of the characteristics of manufactured particles with reaction temperature, flow rate of the carrier gas and two … More different vapors were clarified experimentally.
In the theoretical portion, a dynamic equation to model the particle manufacturing processes was derived in which formation of supersaturated atmosphere of reaction products, coagulational particle growth from monomers via clusters to particles, morphology change of agglomerated particles by sintering and growth of primary particles and transport of particles in a nonisothermal flow field, were taken into account. Here, a new model called the 2-dimensional discrete-sectional model was constructed to predict the early stage of particle formation processes more accurately by describing the simultaneous change in size and morphology of agglomerated particles using the surface area and volume of the particles. The chemical reaction rates of the vapors used were evaluated from the experimental results to incorporate the reaction rates in the model. Numerical simulation for the particle manufacturing processes based on the model gave good prediction for size and morphology of particles manufactured under various conditions. Consequently, it was made clear that the simulation technique proposed in the present study could give useful guidelines to design and scale-up of particle manufacturing reactors. Less

Report

(4 results)
  • 1999 Annual Research Report   Final Research Report Summary
  • 1998 Annual Research Report
  • 1997 Annual Research Report
  • Research Products

    (27 results)

All Other

All Publications (27 results)

  • [Publications] Okuyama,K.: "Effects of Prepration Conditions on the Characteristics of Titanium Dioxide Particlos Produced by a CVD Method"J.Aerosol Sci.. 29(S1). S907-S908 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Okuyama,K.: "Performance Evaluation of Cluster-DMA with Integrated Electrometer and Its Application to Ion Mobility Measurements"J.Aerosol Res.Jpn. 13(2). 83-93 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Fujimoto,T.: "Effect of cluster/partide deposition atomospheric presisure chemical vapor deposition of SiO_2 from four gaseous organic Si-containing precursors and ozonp"J.Appl.phys.. 85. 4196-4206 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Kuga,Y.: "Insitu Observarion of UF_5 Nanoparticle growth in a Low Pressure Mixed Flow Reactor"Appl.Phys A. 68(1). 75-80 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 浅井 琢也: "DMA内部の粒子濃度の偏りに及ぼす構造と操作条件のシミュレーションによる検討"エアロゾル研究. 14(2). 145-153 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Habuka,H.: "Chemical Process of Silicon Epitaxial Growth in a SiHCl_3-H_2 System"J.Crystal Growth. 207. 77-86 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Adachi,M.: "Film Formation by Motion Control of Ionized Precoursors in Electric Field"Appl.Phys.Lett.. 75(13). 1973-1975 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 足立 元明: "ソースガスのイオン化によるCVD成膜装置内における粒子発生の抑制"化学工学論文集. 25(6). 878-883 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 藤本 敏行: "TEOS/O_3-APCVD薄膜製造プロセスにおける蒸気とクラスター/微粒子の同時沈着の評価と制御"化学工学シンポジウムシリーズ. 67. 31-39 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Okuyama, K.: "Effects of Preparation Conditions of Titanium Dioxide Particles Produced by a CVD Method."J. Aerosol Sci.. 29(S1). S907-S908 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Okuyama, K.: "Performance Evaluation of Cluster-DMA with Integrated Electrometer and Its Application to Ion Mobility Measurements."J. Aerosol Res., Jpn.. 13(2). 83-93 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Fujimoto, T.: "Effect of Cluster/particle Deposition on Atmospheric Pressure Chemical Vapor Deposition of SiOィイD22ィエD2 from Four Gaseous Organic Si-containing Precursors and Ozone."J. Appl. Phys.. 85. 4196-4206 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Kuga, Y.: "In- situ Observation of UFィイD25ィエD2 Nanoparticle Growth in a Low Pressure Mixed Flow Reactor."Appl. Phys. A. 68(1). 75-80 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Asai, T.: "Numerical Simulation on the Internal Geometry and Operation Conditions on Particle Concentration Distribution within a Differential Mobility Analyzer."J. Aerosol Res., Jpn.. 14(2). 145-153 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Habuka, H.: "Chemical Process of Silicon Epitaxial Growth in a SiHClィイD23ィエD2-HィイD22ィエD2 System."J. Crystal Growth. 207. 77-86 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Adachi, M.: "Film Formation by Mot ion Control of Ionized Precursors in Electric Field."Appl. Phys. Lett.. 75(13). 1973-1975 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Adachi, M.: "Control of Particle Generation in CVD Reactor by Ionization of Source Vapor."Kagaku Kogaku Ronbunshu. 25(6). 878-883 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Fujimoto, T.: "Evaluation and Control of Co - deposition o f Vapor and Cluster/particle in TEOS/OィイD23ィエD2-APCVD Thin Film Preparation Process."Kagaku Kogaku Symposium Series. 67. 31-39 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Kuga,Y.: "In-situ Observation of UFs Nanoparticle Growth in a Low Pressure Mixed Flow Reactor"Appl. Phys. A. 68・(1). 75-80 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 浅井琢也: "DMA内部の粒子濃度の偏りに及ぼす構造と操作条件のシミュレーションによる検討"エアロゾル研究. 14・(2). 145-153 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] Habuka,H.: "Chemical Process of Silicon Epitaxial Growth in a SiHCl_3-H_2 System"J. Crystal Growth. 207. 77-86 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] Adachi,M.: "Film Formation by Motion Control of Ionized Precursors in Electric Field"Appl. Phys. Lett.. 75・(13). 1973-1975 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 足立元明: "ソースガスのイオン化によるCVD成膜装置内における粒子発生の抑制"化学工学論文集. 25・(6). 878-883 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 藤本敏行: "TEOS/O_3-APCVD薄膜製造プロセスにおける蒸気とクラスター/微粒子の同時沈着の評価と制御"化学工学シンポジウムシリーズ. 67. 31-39 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] Okuyama,K.: "Effects of Preparation Conditions on the Characteristics of Titanium Dioxide Particles Produced by a CVD Method." J.Aerosol Sci.29・(S1). S907-S908 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] Okuyama,K.: "Performance Evaluation of Cluster-DMA with lntegrated Electrometer and its Application to lon Mobility Measurements." J.Aerosol Res.Jpn.13・(2). 83-93 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] Fujimoto,T.: "Effect of cluster/particle deposition on atmospheric pressure chemical vapor deposition of SiO2 from four gaseous organic Si-containing precursors and ozone." J.Appl.Phys.(in press). (1999)

    • Related Report
      1998 Annual Research Report

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Published: 1997-04-01   Modified: 2016-04-21  

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