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Size Effects of Ferrelectric Thin Films and Influences of the Size on the Thin Film Memory Device Properties

Research Project

Project/Area Number 09650366
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionHimeji Institute of Technology

Principal Investigator

SHIMIZU Masaru  Himeji Institute of Technology, Fac.of Eng., Asso.Prof., 工学部, 助教授 (30154305)

Co-Investigator(Kenkyū-buntansha) FUJISAWA Hironori  Himeji Institute of Technology, Fac.of Eng, Research Asso., 工学部, 助手 (30285340)
Project Period (FY) 1997 – 1998
Project Status Completed (Fiscal Year 1998)
Budget Amount *help
¥2,800,000 (Direct Cost: ¥2,800,000)
Fiscal Year 1998: ¥1,200,000 (Direct Cost: ¥1,200,000)
Fiscal Year 1997: ¥1,600,000 (Direct Cost: ¥1,600,000)
Keywordsferroelectric thin film / memory / size effect / MOCVD / Pb(Zr, Ti)O_3 thin film / film thickness / grain size / grain boundary / 強誘電体 / Pb(Zr,Ti)O_3 / 薄膜 / メモリデバイス
Research Abstract

The size effects, including thickness and grain size, have become more and more iimportant for the realization of low voltage operation and ultra high integration in memory devices. In order to investigate the size effect of ferroelectric Pb(Zr, Ti)0_3 (PZT) thin films prepared by MOCVD (metalorganic chemical vapor deposition), two types of experiments were performed.
In the first set of experiments, dependence of electrical properties of PZT thin films on the film thicknesswas investigated. Thickness was controlled from 70 to 600nm by changing the deposition time.The dielectric constants, remanent polarizations and grain size decreased and the coercive fields increased as film thickness decreased. This experimental result means that the gain size effect was included in the thickness effect when films were prepared by MOCVD.
In order to separate the garin size effect from the thickness effect, grain size dependence of films was investigated. Grain size of PZT films was successfully controlled by changing the thickness of bottom I* electrode and by changing the growth rate of PZT films.
The dielectric constants and remant polarizations decreased, and current densities and coercive fields of films with a film thickness of 200nm incresed as grain size decreased from 240 to l2Onm. This dependence of electrical properties on the grain size coincided with that of ceramics. Polarization switching endurance properties were also influenced by the garin size. PZT films with grain size of 190 and 240nm showed no switching fatigue up to a switching cycle of 10'. On the other hand, PZT film with a grain size of l2Onm showed the fatigue.
Our experimental results also means that grain boundaries of thin films play very important roles in determining electrical properties.

Report

(3 results)
  • 1998 Annual Research Report   Final Research Report Summary
  • 1997 Annual Research Report
  • Research Products

    (26 results)

All Other

All Publications (26 results)

  • [Publications] Masaru Shimizu: "Pb(Zr,Ti)O_3 Thin Film Deposition on Ir and IrO_2 Electrodes by MOCVD" J.Korean Physical Society. 32. S1349-S1352 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Masaru Shimizu: "Effects of Sputtered Ir and IrO_2 Electrodes in the Properties of PZT Thin Films Deposited by MOCVD" Mat.Res.Soc.Symp.Proc.493. 159-164 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Hironori Fujisawa: "Dependence of Electrical Properties of Pb(Zr,Ti)O_3 Thin Films on the Grain Size and Film Thickness" Proc.11the IEEE Int. Symp. Applications of Ferroelectrics. 印刷中未定. (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Hironori Fujisawa: "Control of Grain size of Pb(Zr,Ti)O_3 Thin Film by MOCVD and the Effects of size on the Electrical Properties" Mat.Res.Soc.Symp.Proc.541印刷中. (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] 藤沢 浩訓: "MUCVD-Pb(Zr,Ti)O_3 薄膜の電気的特性のグレインサイズ依存性" 信学技報. 98巻591号. 13-20 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] 清水 勝: "MOCVD法によるPb(Zr,Ti)O_3(PZT)系薄膜の成長" 応用物理. 67巻11号. 1299-1300 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Masaru Shimizu: ""Pb(Zr, Ti)O_3 Thin Film Deposition on Ir and IrO_2 Electrodes by MOCVD"" J.Korean Phys.Soc.Vol.33. 1349-1352 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Masaru Shimizu: ""Effects of Sputtered Ir and IrO_2 Electrodes on the Properties of PZT Thin Films deposited by MOCVD"" Mat.Res.Soc.Symp.Proc.Vol.493. 159-164 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Hironori Fujisawa: ""Influence of the Purity of Source Precursors on the Electrical Properties of Pb(Zr, Ti)O_3 Thin Films by Metalorganic Chemical Vapor Deposition"" Jpn.J.Appl.Phys.Vol.37. 5132-5136 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Hironori Fujisawa: ""Dependence of Electrical Properties of Pb(Zr, Ti)O_3 Thin Film on the Grain Size and Film Thickness"" Proc.11th IEEE Int.Symp.Applications of Ferroelectrics. (in press). (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Hironori Fujisawa: ""Control of Grain size of Pb(Zr, Ti)O_3 Thin Films by MOCVD and the Effects on the Electrical Properties"" Mat.Res.Soc.Symp.Proc.Vol.541 (in press). (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Hironori Fujisawa: ""Dependence of the Grain Size on the Electrical properties of MOCVD-Pb(Zr, Ti)O_3 Thin Films"" IEICE Technical Report. Vol.98, No.591. 13-20 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Masaru Shimizu: ""Growth of Pb(Zr, Ti)O_3(PZT)-Based Thin Films by MOCVD"" Oyo Buturi. Vol.67, NO.11. 1299-1300 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Masaru Shimizu: ""Effects of the Purity of Metaloragnic Sources on the Electrical Properties of Pb(Zr, Ti)O_3 Thin Films by MOCVD"" Mat.Res.Soc.Symp.Proc.Vol.541 (in press). (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] 清水 勝: "MOCV-D法による強誘電体Pb(Zr,Ti)O_3薄膜の諸特性とメモリーデバイスへの応用" 信学技報. 97. 19-24 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] Masaru Shimizu: "Effects of Spuffered Ir and IrU_2 Electrodes on the Properfies of PZT Thin Films Deposited by MOCVD" Mat.Res.Soc.Symp.Proc.493. 159-164 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] Masaru Shimizu: "Pb(Zr,Ti)O_3 Thin Jilm Deposetion on Ir and IrO_2 Electrodes by MOCVD" J.Korem Physical Society. 32. S1349-S1352 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] Hironori Fujisawa: "Influence of the Purity of Source Precursers on the Electrical Properties of Pb(Zr,Ti)O_3 Thin Films by Metalorganic Chenical Vapor Deposition" Jpn.J.Appl.Phys.37. 5132-5136 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] 藤沢 浩訓: "MOCVD-Pb(Zr,Ti)O_3薄膜の電気的特性のグレインサイズ依存性" 信学技報. 98. 13-20 (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] 清水 勝: "MOCVD法によるPb(Zr,Ti)O_3(PZT)系薄膜の成長" 応用物理. 67巻11号. 1299-1300 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] Masaru SHIMIZU: "Step Coverage characteristics of Pb(Zr, Ti)O_3 Thin films on Various Electrode Materials by Metulorganic Chemicul Vapor Deposition" Jpn. J. Appl. Phys.36. 5808-5811 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] Masaru SHIMIZU: "Properties of Sputtened Ir and IrO_2 Electrodes for PZT Capacitors" Ext. Abs. 8th US-Japan Seminor on Dielectvic and Piezoelectric Ceramics. 124-127 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] Masaru SHIMIZU: "Pb(Zr, Ti)O_3 Thin film Deposition on Ir and IrO_2 Electrodes by MOCVD" Proc. 9th International Meeting on Fewoelectricity. (未定). (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] Tadashi SHIOSAKI: "Pb-Baced and Bi-Bused Ferroelectric Thin Films" Proc. 9th International Meeting on Ferroelectricity. 未定 (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] Masaru SHIMIZU: "Effects of Sputtered Ir and IrO_2 Electrodes on the Properties of PZT Thin Films Deposited by MOCVD" Mater. Res. Soc. Symp. Proc.493(未定). (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] 清水勝: "MOCVD法による強誘電体Pb(Zr, Ti)O_3薄膜の諸特性とメモリーデバイスへの応用" 電子情報通信学会技術研究報告. ED97(未定). (1998)

    • Related Report
      1997 Annual Research Report

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Published: 1997-04-01   Modified: 2016-04-21  

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