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Particle Changing using UV/Photoelectron Method at Low Pressures

Research Project

Project/Area Number 09650849
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field 反応・分離工学
Research InstitutionOsaka Prefecture University

Principal Investigator

ADACHI Motoaki  Osaka Prefecture University, Research Institute for Advanced Science and Technology, Assistant Professor, 先端科学研究所, 講師 (40100177)

Co-Investigator(Kenkyū-buntansha) OKUYAMA Kikuo  Hiroshima University Dept. of Chemical Engineering, Professor, 工学部, 教授 (00101197)
Project Period (FY) 1997 – 1999
Project Status Completed (Fiscal Year 1999)
Budget Amount *help
¥3,300,000 (Direct Cost: ¥3,300,000)
Fiscal Year 1999: ¥600,000 (Direct Cost: ¥600,000)
Fiscal Year 1998: ¥800,000 (Direct Cost: ¥800,000)
Fiscal Year 1997: ¥1,900,000 (Direct Cost: ¥1,900,000)
KeywordsSemiconductor / Nanometer-sized particle / Vacuum process / UV excitation / Photoelectron emission / Charging / Particle collection
Research Abstract

Two devices using UV/photoelectron method were developed. In one device, photoelectrons are released from the photoelectron emitter by UV irradiation (Photoelectron emission-diffusion charging device, PE-CD) and, in other, they are done directly from particles (Direct photoelectron charging device, DPC). Two devices were estimated theoretically and experimentally. In the experiments, SiOィイD22ィエD2 particles prepared by CVD method were used. For PE-DC device, the reduce of pressure decreased strongly the particle charge, but the UV intensity and particle size gave small effects on the charge. The experimental results agreed well with numerical simulation. For DPC device, particle charge increased with the increase of UV Intensity and particle size and the decrease of the pressure. The numerical results explained the tendency of charging but did not quantitatively.

Report

(4 results)
  • 1999 Annual Research Report   Final Research Report Summary
  • 1998 Annual Research Report
  • 1997 Annual Research Report
  • Research Products

    (19 results)

All Other

All Publications (19 results)

  • [Publications] 足立元明、藤本敏行、中曽浩一、金泰吾、奥山喜久夫: "ソースガスのイオンかによるCVD成膜装置内における粒子発生の抑制"化学工学論文集. 25. 878-883 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] M. Adachi, T. Fujimoto, K. Nakaso, K. Okuyama, F. G. Shi, H. Sato et al.: "Film Foramton by Motion Control of lonization Precursores in Electric Field"Appl. Phys. Letters. 75. 1973-1975 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] M. Adachi, T. Fujimoto, K. Okuyama: "Motion Control of lonized Intermediates in TEOS/O_3-APCVD Reactor"Proc. 1st Asia Aerosol Conf.. 219-220 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] M. Shimada, K. Okuyama, Y. Inoue, M. Adachi and T. Fujii: "Removal of Airborne Particles by a Device Using U/Photoelectron Method under Reduced Presure Conditions"J. Aerosol Sci.. 30. 341-353 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 足立元明、須藤収、高橋武士: "減圧場におけるナノサイズ粒子の帯電量測定"エアロゾル研究. 13. 94-102 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] M. Shimada, S. J. Cho, K. Okuyama, T. Tamura, M. Adachi and T. Fujii: "Removal of Airborn Particles by a Tublar Particle-Removal Device Using UV/Photoelectron Method"J. of Aerosol Sci.. 28. 649-661 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 足立元明、奥山喜久夫: "新版 シリコンウェーハ表面の超クリーン化技術"服部毅編 リアライズ社. 520 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] M.Adachi, T.Fujimoto, K.Nakaso, T.Kim and K.Okuyama: "Control of Particle Generation in CVD Reactor by Ionization of Source Vapor."Kagaku Kogaku Ronbunshu. 25-6 (in Japanese). 878-883 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] M.Adachi, T.Fujimoto, K.Nakaso, K.Okuyama, F.G.Shi, H.Sato et al.: "Film Formation by Motion Control of Ionization Precursors in Electric Field"Appl Phys. Letters. 78-13. 1973-1975 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] M.Adachi, T.Fujimoto, K.Okuyama: "Motion Control of Ionized Intermediates in TEOS/OィイD23-ィエD2 APCVD Reactor"Proc.1st Asia Aerosol Conf.. 219-220 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] M.Shimada, K.Okuyama, Y.Inoue, M.Adachi and T.Fujii: "Removal of Airborne Particles by a Device Using UV/Photoelectron Method under Reduced Pressure Conditions"J. Aerosol Sci.. 30-3. 341-353 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] M.Adachi, O.Sudo, T.Takahashi: "Charge Measurement of Nanometer-Sized Particles at Low Pressure"J. of Aerosol Research, Jpn.. 13-2 (in Japanese). 94-102 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] M.Shimada, S.J.Cho, K.Okuyama, T.Tamura, M.Adachi and T.Fujii: "Removal of Airborn Particles by a Tubular Particle-Removal Device Using UV/Photoelectron Method"J. of Aerosol Sci.. 28-4. 649-661 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] M.Adachi and K.Okuyama: "Ultraclean Technology of Silicon Wafers"T,Hattori Ed.REALIZE Inc.. (in press). (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] M.Shimada, K.Okuyama, Y.Inoue, M.Adachi and T.Fujii: "Removal of Airborne Particles by a Device Using UV/Photoelectron Method under Reduced Pressure Conditions"J. Aerosol Sci.. 30(3). 341-353 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 足立元明、奥山喜久夫: "新版 シリコンウェーハ表面の超クリーン化技術"服部毅編 リアライズ社. 526 (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] M.Shimada, K.Okuyama, Y.Inoue, M.Adachi and T.Fujii: "Removal of Airborne Prticles by a Device Using UV/Photoelectron Method under Reduced Pressure Conditions" J.Aerosol Sci.30・3. 341-353 (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] 足立元明、 須藤收、 高橋武士: "減圧場におけるナノサイズ粒子の帯電量測定" エア ロゾル研究. 13・2. 94-102 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] M.Shimada, K.Okuyama, M.Adachi and T.Fujii: "Aerosol particle removal at reduced pressure by an electrical precipitator using UV/photoelectron method." Proc.of the 1998 International Aerosol Conference, J.Aerosol Sci.29・S1. S1237-S1238 (1998)

    • Related Report
      1998 Annual Research Report

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Published: 1997-04-01   Modified: 2016-04-21  

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