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Development of Transparent Super Water-repellent Films by Composing Surface Fine Structure

Research Project

Project/Area Number 10450257
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Structural/Functional materials
Research InstitutionNagoya University

Principal Investigator

TAKAI Osamu  Nagoya Univ., Materials Proc. Eng., Professor, 工学研究科, 教授 (40110712)

Co-Investigator(Kenkyū-buntansha) HOZUMI Atsushi  National Industrial Research Institute of Nagoya, Ceramic Technology, Researcher, セラミックス応用部, 研究員
INOUE Yasushi  Nagoya Univ., Materials Proc. Eng., Research Associate, 工学研究科, 助手 (10252264)
SUGIMURA Hiroyuki  Nagoya Univ., Materials Proc. Eng., Associate Professor, 工学研究科, 助教授 (10293656)
Project Period (FY) 1998 – 1999
Project Status Completed (Fiscal Year 1999)
Budget Amount *help
¥11,100,000 (Direct Cost: ¥11,100,000)
Fiscal Year 1999: ¥2,000,000 (Direct Cost: ¥2,000,000)
Fiscal Year 1998: ¥9,100,000 (Direct Cost: ¥9,100,000)
Keywordswater repellent / plasma CVD / surface morphology / organosilicon compound / hard coating / transparent / adhesiveness / low-tempareture preparation
Research Abstract

This research project aimed at an establishment of a method to control both the surface morphology and the chemical bonding states of the water-repellent films in plasma CVD processes and at a development of a technique ton deposit transparent, hard and super water-repellent films at low temperature over wide area.
We succeeded in in-situ measurement of infrared (IR) absorption spectra by infrared reflection absorption spectroscopy (IRRAS) at an incident angle of 80 degree using an rf plasma CVD system combined with a Fourier-transform infrared spectrometer (FTIR). Especially, selecting p-polarized IR light lead to measurement at a high sensitivity. We could obtain IR spectra even for a monolayer of organsilicon molecules. By means of this method, we established a deposition technique to control the chemical bonding states of the films in real time.
It has been supposed that super water-repellent films cannot be synthesized with mixture of an oxygen has gas because of formation of hydrophobic Si-OH groups. We made clear, however, that super water repellency can be realized at relatively higher total pressure, in the range of 150-200 Pa, with the mixture of oxygen. From this result, it can be expected that the formation of water-repellent films with hardness. The films have super water-repellency although they include Si-OH functional groups. The reason has not been elucidated and can be an interesting research object.
The water repellency was observed by means of environmental scanning electron microscope. The contact angle was over 150 degree even for the water drops in μm size.

Report

(3 results)
  • 1999 Annual Research Report   Final Research Report Summary
  • 1998 Annual Research Report
  • Research Products

    (24 results)

All Other

All Publications (24 results)

  • [Publications] Atsushi Hozumi: "Fluoroalkylsilane Monolayers Formed by Chemical Vapor Surface Modification on Hydroxylated Oxide Surfaces"Langmuir. 15. 7600-7604 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Atsushi Hozumi: "Preparation of Silicon Oxide Films Having a Water-repellent Layer by Multiple-step Microwave Plasma-enhanced Chemical Vapor Deposition"Thin Solid Films. 334. 54-59 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Yasushi Inoue: "In situ Observation of Behavior of Organosilicon Molecules in Low-temperature Plasma Enhanced CVD"Thin Solid Films. 345. 90-93 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Yasushi Inoue: "Infrared Absorption Measurement During Low-temperature PECVD of Silicon-oxide Films"J. Korean Inst. Surf. Eng.. 32. 297-302 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 杉村博之: "親水/疎水基板へのメゾポーラスシリカ膜の成長"表面技術. 50. 574-575 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 穂積篤: "疎水/親水マイクロ領域からなる不均一表面上に成長した微小水滴"表面技術. 50. 652-653 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Atushi Hozumi: "Fluoroalkylsilane Monolayers Formed by Chemical Vapor Surface Modificationon Hydroxylated Oxide Surfaces"Langmuir. 15. 7600-7604 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Atsushi Hozumi: "Preparation of Silicon Oxide Films Having a Water-repellent Layer by Multiple-step Microwave Plasma-enhanced Chemical Vapor Deposition"Thin Solid Films. 334. 54-59 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Yasushi Inoue: "In situ Observation of Behavior of Organosilicon Molecules in Low-temperature Plasma Enhanced CVD"Thin Solid Films. 345. 90-93 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Yasushi Inoue: "Infrared Absorption Mneasurement During Low-temperature PECVD o Silicon-oxide Films"J. Korean Inst. Surf. Eng.. 32. 297-302 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Hiroyuki Sugimura: "Growth of Mesoporous Silica Films on Hydrophilic or Hydrophobic Surfaces"J. Surface Finishing Soc. Jpn. 50. 574-575 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Atushi Hozumi: "Water Microdrops Condensed on Heterogeneous Surfaces Composed of Micropatterned Hydrophobic and Hydropholic Regions"J. Surface Finishing Soc. Jpn. 50. 652-653 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Atushi Hozumi: "Fluoroalkylsilane Monolayers Formed by Chemical Vapor Surface Modification on Hydroxylated Oxide Surfaces"Langmuir. 15. 7600-7604 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] Atushi Hozumi: "Preparation of Silicon Oxide Films Having a Water-repellent Layer by Multiple-step Microwave Plasma-enhanced Chemical Vapor Deposition"Thin Solid Films. 334. 54-59 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] Yasushi Inoue: "In situ Observation of Behavior of Organosilicon Molecules in Low-temperature Plasma Enhanced CVD"Thin Solid Films. 345. 90-93 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] Yasushi Inoue: "Infrared Absorption Measurement During Low-temperature PECVD of Silicon-oxide Films"J. Korean Inst. Surf. Eng.. 32. 297-302 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 杉村博之: "親水/疎水基板へのメゾポーラスシリカ膜の成長"表面技術. 50. 574-575 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 穂積篤: "疎水/親水マイクロ領域からなる不均一表面上に成長した微小水滴"表面技術. 50. 652-653 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 穂積 篤: "マイクロ波プラズマCVD法による傾斜機能皮膜の作製-酸化シリコン皮膜の表面はっ水化-" 表面技術. 49. 489-495 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] 穂積 篤: "表面制御された超はっ水性皮膜のマイクロ波プラズマCVD法による作製" 表面技術. 49. 385-390 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] Yasushi Inoue: "Mass Spectroscopy in Plasma-Enhanced Chemical Vapor Deposition of Silicon-Oxide Films Using Tetramethoxysilane" Thin Solid Films. 316. 79-84 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] Osamu Takai: "Microwave-plasma-enhanced CVD for high rate coatings of silicon oxide" Trans IMF. 76. 16-18 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] Yasushi Inoue: "Properties of silicon oxide films deposited by plasma-enhanced CVD using organosilicon reactants and mass analysis in plasma" Thin Solid Films. 341. 47-51 (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] Yasushi Inoue: "In situ observation of behavior of organosilicon molecules in low-temperature plasma enhanced CVD" Thin Solid Films. (in press). (1999)

    • Related Report
      1998 Annual Research Report

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Published: 1998-04-01   Modified: 2016-04-21  

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