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The Study on the surface modification of metals by the new nitride or oxide thin films and their spectroscopic evaluation

Research Project

Project/Area Number 10555252
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section展開研究
Research Field Material processing/treatments
Research InstitutionTakaoka National College

Principal Investigator

NOSE Masateru  Takaoka National College, Dept. of Industrial Arts and Crafts, Professor, 産業造形学科, 教授 (70269570)

Co-Investigator(Kenkyū-buntansha) NAGAE Takekazu  Toyama Industrial Research Center, Central Laboratories, 主任研究員
NAKAMURA Takio  Takaoka National College, Dept. of Industrial Arts and Crafts, Professor, 産業造形学科, 教授 (60198215)
YOKOTA Masaru  Takaoka National College, Dept. of Industrial Arts and Crafts, Professor, 産業造形学科, 教授 (10029225)
MAE Takehiko  Toyama National College of Technology, Dept. of Environmental Material Engineering, Professor, 環境材料工学科, 教授 (10042821)
SAJI Shigeoki  Toyama University, School of Engineering, Dept. of Materials and Life Science, Professor, 工学部・物質生命システム工学科, 教授 (60029072)
Project Period (FY) 1998 – 2001
Project Status Completed (Fiscal Year 2001)
Budget Amount *help
¥10,700,000 (Direct Cost: ¥10,700,000)
Fiscal Year 2001: ¥700,000 (Direct Cost: ¥700,000)
Fiscal Year 2000: ¥1,000,000 (Direct Cost: ¥1,000,000)
Fiscal Year 1999: ¥3,600,000 (Direct Cost: ¥3,600,000)
Fiscal Year 1998: ¥5,400,000 (Direct Cost: ¥5,400,000)
Keywordsreactive sputtering / Zr-N / Zr-Si-N / Zr-N-O / high hardness / golden color / decorativeness / 透過電子顕微鏡 / 硬度 / 透明膜 / ZrN / Ti-O-N / 色彩 / 耐酸化性 / 色彩分析 / 視感反射率 / 色度値 / 明度 / 比抵抗 / TiN
Research Abstract

We have investigated the influence of nitrogen and/or oxygen content on the properties of TiN and ZrN thin films using spectrometer and colorimetric analysis as well as usual analytical instruments. The color of the films was evaluated by means of chromaticity coordinate, x and y, and the stimulus value Y. The major conclusions are as follows : (1) The color of ZrN coatings are more sensitive to nitrogen flow, namely to nitrogen partial pressure, than that of TiN coatings. (2) The bright gold-color of ZrN coatings can be obtained by the sputtering even at higher pressure of o.3 Pa. On the other hand, the bright gold color for TiN coatings is made only at the lower pressure of 0.15 Pa. (3) The oxygen content in TiN coatings increases with increasing the argon flow rate (the argon partial pressure). This tendency corresponds to the dependences of luminous reflectance and resistivity on the argon flow rate. These results can be explained from the morphology of the films and the nitrogen and oxygen concentrations.
Furthermore, we have studied the influence of Si addition on the structure and the mechanical properties of ZrN thin films. A study of their structure and mechanical properties has provided as follows : (1) With increasing Si content, the hardness of the films increases initially, attaining a maximum hardness at approximately 3%, and then decreases to lower hardness than that of Zr-N binary films. (2) The hardest film containing about 3% Si consists of large crystals in the range of 20 to 25 nm. (3) The increment in hardness of ZrSiN films by silicon addition cannot be explained by the crystal size. (4) Zr-Si-N films containing 3 at% of Si have a possibility of the new decorative coatings with higher hardness and golden color.

Report

(5 results)
  • 2001 Annual Research Report   Final Research Report Summary
  • 2000 Annual Research Report
  • 1999 Annual Research Report
  • 1998 Annual Research Report
  • Research Products

    (20 results)

All Other

All Publications (20 results)

  • [Publications] 野瀬正照, 中村滝雄, 中田幹子: "反応スパッタ法によるTiN薄膜の作製とその色彩特性"高岡短期大学紀要. Vol.11. 9-19 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] 野瀬正照, 長柄毅一, 横田 勝, 佐治重興, 中田幹子: "対向ターゲット式スパッタ法により作製したTiN薄膜の色彩特性"日本金属学会誌. Vol.63 No.7. 944-948 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] 野瀬正照, 長柄毅一, 横田 勝, 周 民, 佐治 重興, 中田幹子: "直流反応スパッタ法により作製したTiN薄膜の電気抵抗と視感反射率"日本金属学会誌. Vol.63 No.10. 1277-1282 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] M.Nose, T.Nagae, M.Yokota, S.Saji, M.Zhou, M.Nakada: "Electrical and Colorimetric Properties of TiN Thin Films Prepared by D.C. Reactive Sputtering in a Facing Targets Sputtering (FTS) System"Surface and Coatings Technology. Vol.116-119. 296-301 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] M.Nose, M.Zhou, T.Nagae, T.Mae, M.Yokota, S.Saji: "Properties of Zr-Si-N Coatings Prepared by R.F.-Reactive Sputtering"Surface and Coatings Technology. Vol.132. 163-168 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] M.Nose, M.Zhou, E.Honbo, M.Yokota, S.Saji: "Colorimetric Properties of ZrN and TiN Coatings Prepared by DC Reactive Sputtering"Surface and Coatings Technology. Vol.142-144. 211-217 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] T.Mae, M.Nose, M.Zhou, T.Nagae, K.Shimamura: "The Effect of Si Addition on the Structure and Mechanical Properties of ZrN Thin Films Deposited by r.f.-Reactive Sputterinig Method"Surface and Coatings Technology. Vol.142-144. 954-958 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] M, Nose, T, Nakamura and M, Nakada: "Fabrication of TiN thin films by dc-reactive sputtering and its colorimetric properties (in Japanese)"Bulletin of Takaoka National College. Vol.11. 9-19 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] M. Nose, T. Nagae, M.Yokota, S. Saji and M. Nakada: "The colorimetric properties of TiN thin films prepared by the facing targets sputtering system (in Japanese)"Journal of Japan Institute of Metals. Vol.63. 944-948 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] M, Nose, T, Nagae, M.Yokota, M, Zhou, S, Saji and M, Nakada: "Electrical resistivity and luminous reflectance of TiN films prepared by dc-reactive sputtering (in Japanese)"Journal of Japan Institute of Metals. Vol.63. 1277-1282 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] M.Nose, T, Nagae, M.Yokota, S, Saji, M, Zhou ; and M, Nakada: "Electrical and Colorimetric Properties of TIN Thin Films Prepared by D.C. Reactive Sputtering in a Facing Targets Sputtering (FTS) System"Surface and Coatings Technology. Vol.116-119. 296-301 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] M, Nose, M, Zhou, T, Nagae, T, Mae, M.Yokota, S, Saji: "Properties of Zr-Si-N Coatings Prepared by R.E-Reactive Sputering"Surface and Coatings Technology. Vol.132. 163-168 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] T, Mac, M, Nose, M, Zhou, T, Nagae and K, Shimamura: "Colorimetric Properties of ZrN and TIN Coatings Prepared by DC Reactive Sputtering"Surface and Coatings Technology. Vol.142-144. 211-217 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] M, Nose, M, Zhou, E, Honbo, T, Mac, M.Yokota, S, Saji: "The Effect of Si Addition on the Structure and Mechanical Properties of ZrN Thin Films Deposited by r.f.- Reactive Sputtering Method"Surface and Coatings Technology. Vol.142-145. 954-958 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] M.Nose, M.Zhou, E.Honbo, M.Yokota, S.Saji: "Colorimetric properties of ZrN and TiN coatings prepared by DC reactive sputtering"Surface and Coatings Technology. 142-144. 211-217 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] T.Mae, M.Nose, M.Zhou, T.Nagae, K.Shimamura: "The effects of Si addition on the structure and mechanical properties of ZrN thin films deposited by an. r.f. reactive sputtering method"Surface and Coatings Technology. 142-144. 954-958 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] M.Nose,M.Zhou,T.Nagae,M.Yokota and S.Saji: "Properties of Zr-Si-N coatings prepared by RF reactive sputtering"Surface and Coatings Technology. 132. 163-168 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] 野瀬正照,長柄毅一,横田勝,佐治重興,中田幹子: "対向ターゲット式スパッタ法により作製したTiN薄膜の色彩特性"日本金属学会誌. 63-7. 944-948 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 野瀬正照,長柄毅一,横田勝,周民,佐治重興,中田幹子: "直流反応スパッタ法により作製したTiN薄膜の電気抵抗と視感反射率"日本金属学会誌. 63-10. 1276-1282 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] M.Nose,T.Nagae,M.Yokota,S.Saji,M.Zhou and M.Nakada: "Electrical and Colorimetric Properties of TiN Thin Films Prepared by D.C. Reactive Sputtering in a Facing Targets Sputtering (FTS) System"Surface and Coatings Technology. 116-119. 296-301 (1999)

    • Related Report
      1999 Annual Research Report

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Published: 1998-04-01   Modified: 2016-04-21  

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