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High Density Interconnection and Packaging Chemical Engineering in 21st Century

Research Project

Project/Area Number 10555267
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section展開研究
Research Field 化学工学一般
Research InstitutionOKAYAMA UNIVERSITY

Principal Investigator

KONDO Kazuo  Okayama University, Associate Professor, 工学部, 助教授 (50250478)

Co-Investigator(Kenkyū-buntansha) FUKUI Keisuke  Himeji Institute of Technology, Associate Professor, 工学部, 助教授 (50047635)
Project Period (FY) 1998 – 1999
Project Status Completed (Fiscal Year 1999)
Budget Amount *help
¥12,000,000 (Direct Cost: ¥12,000,000)
Fiscal Year 1999: ¥1,300,000 (Direct Cost: ¥1,300,000)
Fiscal Year 1998: ¥10,700,000 (Direct Cost: ¥10,700,000)
KeywordsPackaging Chemical Engineering / High Density Inter Connection / Current Distribution / Electrodeposition / Bumping / electronics / 実装プロセス工学 / 表面実装化学工学
Research Abstract

Electrodeposited bumps are the indispensable micro-connectors for high density interconnection in the latest microelectronics applications. For the higher frequency circuit, shorter interconnection length by bumps in required in order to reduce the reflection noise. Ball grid array (BGA) of solder bumps is necessary for high pin count chips in order to reduce the their packaging size. Bumps can also be used as a new testing method for bare chips of high pin counts. Another application is the interconnection between liquid crystal display (LCD) and driver chips, which are mostly interconnected with tape automated bonding (TAB). The bumps act as micro connectors of TAB technology and conduct digital signals from the chips to the LCD pixels.
The bumps are electrodeposited onto the dot shaped cathode of 10 to 200μm in diam. The cathode, or photolithography patterns, are patterned by photomask and photoresist. The control of electrodeposited bump shape, as well as the uniformity in their height, is important for obtaining proper interconnection reliability.
The research summarized three topics on shape evolution of bumping. The effect of high aspect ratio cavity for CSP and flip chip, the effect of additive and interference effect of neighbor bumps.
Furthermore, we have organized the Packaging Process Engineering Division in the Society of the Chemical Engineering. Forty companies and ten university have already joined our division.

Report

(3 results)
  • 1999 Annual Research Report   Final Research Report Summary
  • 1998 Annual Research Report
  • Research Products

    (41 results)

All Other

All Publications (41 results)

  • [Publications] Kazuo Kondo and Keisuke Fukui: "Current Evolution of Electrodeposited Copper Bumps with Photoresist angle"Journal of the Electrochemical Society. 145. 840-847 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 近藤和夫: "表面実装と微細電気化学工学"ケミカルエンジンヤリング. 1. 30-38 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Kazuo Kondo and Keisuke Fukui: "Shape Evolution of Electrodeposited Bumps with Deep Cavity"J. Electrochem. Society. 145. 3007-3012 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 福井啓介、阿山雅之、林克彦 米田太輔、田中善之助、近藤和夫: "CSP実装に用いる高アスペクトバンプめっき"エレクトロニクス実装学会誌. 1. 35-43 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Kazuo Kondo, Zennosuke Tanaka, Munehiro Eguchi and Takuya Monden: "Shape Evolution of Electrodeposited Bumps with Additive and its Application"3rd IEMT/IMC Proceedings. 381. (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Keisuke Fukui, Masayuki Ayama, Katsuhiko Hayashi, Taisuke Yoneda, Zennosuke Tanaka and Kazyo Kondo: "Shape Evolution of Electrodeposited Bumps into Deep Cavity for Wafer Level CSP"3rd IEMT/IMC Proceedings. 164. (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] K. Kondo, Z. Tanaka and T. Monden: "Shape Evolution of Electrodeposited Bumps with Additive"Electrochimia Acta. 2530. 1-8 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 山川統広、間野和美、田中善之助、近藤和夫: "ビア導通めっきの形状制御"第9回マイクロエレクトロニクスシンポジウム. 209-216 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 近藤和夫、植村美帆子 奥野貴子、田中善之助: "電解エッチング法によるリードフレームの形状制御"化学工学論文集. 26. (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] K. Hayashi, K. Fukui, Z. Tanaka and K. Kondo: "Shape Evolution of Electrodeposited Bumps into Deep Cavity"The 1999 Joint International Meetings of ECS. (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] K. Kondo, M. Eguchi and Z. Tanaka: "Shape Evolution of Electrodeposited Bumps with Additive 11・Center Humped Bumps"IEMT-IMV 2000 Symposium. (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 近藤和夫、田中善之助 江口宗弘、門田卓也: "添加剤によるめっきバンプの形状制御とCOG接続特性"エレクトロニクス実装学会誌.

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] K. Hayashi, K. Fukui, Z. Tanaka and K. Kondo: "Shape Evolution of Electrodeposited Bumps into deep Cavity"Journal of the Electrochemical Society.

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 近藤和夫: "シンポジウム マイクロエレクトロニクス実装および材料工学"山形大学. (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 石井正人、近藤和夫: "ビルドアップ多層配線板のプロセス工学"日本工業倶楽部. (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 近藤和夫: "エレクトロニクス実装プロセスと化学工学"金沢大学. (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Kazuo Kondo and Keisuke Fukui: "Current Evolution of Electrodeposited Copper Bumps with Photoresist Angle"Journal of the Electrochemical Society. 145. 840-847 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Kazuo Kondo: "Packaging and Electrochemical Engineering"Chemical Engineering. 1. 30-38 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Kazuo Kondo and Keisuke Fukui: "Shape Evolution of Electrodeposited Bumps with Deep Cavity"J. Electrochem. Society. 145. 3007-3012 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Keisuke Fukui, Masayuki Ayama, Katsuhiko Hayashi, Taisuke Yoneda, Zennosuke Tanaka and Kazuo Kondo: "High aspect ratio Bumps Used for CSP"JIEP. 1. 35-43 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Kazuo Kondo, Zennnosuke Tanaka, Munehiro Eguchi and Takuya Monden: "Shape Evolution of Electrodeposited Bumps with Additive and its Application"3rd IEMT/IMC Proceedings. 381. (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Keisuke Fukui, Masayuki Ayama, Katsuhiro Hayashi, Taisuke Yoneda, Zennnosuke Tanaka and Kazuo Kondo: "Shape Evolution of Electrodeposited Bumps into Deep Cavity for Wafer Level CSP"3rd IEMT/IMC Proceedings. 164. (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] K. Kondo, Z. Tanaka and T. Monden: "Shape Evolution of Electrodeposited Bumps with Additive"Electrochimica Acta. 2530. 1-8 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Norihiko Yamakawa, Kazuyoshi Mano, Zennnosuke Tanaka and Kazuo Kondo: "Shape Evolution of Via Hole Plating"9th Micro Electronics Symposium. 209-216 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Kazuo Kondo, Mihoko Uemura, Takako Okuno and Zennnosuke Tanaka: "Shape Evolution of Lead Frame Etching"JAP. Journal of Chemical Engineering. 26. (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] K. Hayashi, K. Fukui, Z. Tanaka and K. Kondo: "Shape Evolution of Electrodeposited Bumps into Deep Cavity"The 1999 Joint International Meeting of ECS. (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] K. Kondo, M. Eguchi and Z. Tanaka: "Shape Evolution of Electrodeposited Bumps with Additive II ・ Center Humped Bumps"IEMT-IMC 2000 Symposium. (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Kazuo Kondo, Zennnosuke Tanaka, Munehiro Eguchi and Takuya Monden: "Shape Evolution of Bumps with Additive and COD Interconnection"JIEP.

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] K. Hayashi, K. Fukui, Z. Tanaka and K. Kondo: "Shape Evolution of Electrodeposited Bumps into Deep Cavity"Journal of the Electrochemical Society.

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Norihiro Yamakawa, Kazuyoshi Mano, Zennosuke Tanaka and Kazuo Kondo: "Shape Evolution of Via Hole Plating"JIEP.

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Katsuhiko Hayashi, Norihiro Yamakawa, Zennosuke Tanaka and Kazuo Kondo: "Cu Additive Mechanism in Via Hole Plating"JIEP.

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 近藤 和夫,福井 啓介他4名: "CSP実装に用いる高アスペクトバンプめっき"エレクトロニクス実装学会誌. 2・1. 35-41 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] Kazuo Kondo 他3名: "Shape Evolution of Electrodeposited Bumps with Additive and its Application"3rd IEMT/IMC Proceedings. 381-387 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] Kazuo Kondo, Keisuke Fukui 他4名: "Shape Evolution of Electrodeposited Bumps into Deep Cavity for Wafer Level CSP"3rd IEMT/IMC Proceedings. 164-170 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] K.Kondo 他 2名: "Shape Evolution of Electrodeposited Bumps with Additive"Electrochimica Acta. 1. 2530-2538 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 近藤和夫 他 3名: "ビア導通めっきの形状制御"第9回マイクロエレクトロニクスシンポジウム. 10月. 209-215 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 近藤和夫 他3名: "電解エッチング法によるリードフレームの形状制御"化学工学論文集. 2(印刷中). (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] Kazuo Kondo Keisuke Fukui: "Current Evolution of Electorodeposited Copper Bumps with Photoresist Angle." Journal of the Electorochemical Society. 145. 840-d842 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] 近藤和夫: "表面実装と微細電気化学工学" ケミカルエンジニアリング. 1. 30-36 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] Kazuo Kondo Keisuke Fukui: "Shape Evolution of Electrodeposited Bumps with Deep Cavity" Journal of the Electorochemical Society. 145. 3007-3012 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] 近藤和夫.田中善之介 外4名: "CSP実装に用いる高アスペクトバンプめっき" エレクトロニクス実装学会誌. Vol.2,No.1. 35d-41 (1999)

    • Related Report
      1998 Annual Research Report

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Published: 1998-04-01   Modified: 2016-04-21  

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