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Development of highly reactive high-density plasma sputtering process with excitation of helicon wave for synthesis of superhard nitride films

Research Project

Project/Area Number 10558065
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section展開研究
Research Field プラズマ理工学
Research InstitutionOsaka University

Principal Investigator

SETSUHARA Yuichi  Osaka University, Joining and Welding Research Institute, Research Associate, 接合科学研究所, 助手 (80236108)

Co-Investigator(Kenkyū-buntansha) OGATA Kiyoshi  Nissin Electric Co., Ltd., Advanced Technology Research Department, Chief Researcher, 先端技術研究開発部, 主席研究員
KUMAGAI Masao  Kanagawa Industrial Technology Research Institute, Analysis Technology Section, Chief Researcher, 技術支援部, 専門研究員
MIYAKE Syoji  Osaka University, Joining and Welding Research Institute, Professor, 接合科学研究所, 教授 (40029286)
Project Period (FY) 1998 – 1999
Project Status Completed (Fiscal Year 1999)
Budget Amount *help
¥11,600,000 (Direct Cost: ¥11,600,000)
Fiscal Year 1999: ¥4,000,000 (Direct Cost: ¥4,000,000)
Fiscal Year 1998: ¥7,600,000 (Direct Cost: ¥7,600,000)
KeywordsHelicon plasma / Highly reactive field / Reactive high-density plasma / Superhard nitride
Research Abstract

We performed investigations on the helicon-wave excited nitrogen plasmas generated using the m=0 mode helical antenna, which was designed for the reactive sputter synthesis of superhard nitride films. The achieved plasma density in m Torr range of nitrogen gas was measured to be 1012〜1013 cm-3. Carbon nitride films were deposited by the reactive sputtering of carbon target with the helicon waveexcited high-density nitrogen plasmas. Compositional characterizations of the CN films showed that the N/C ratio of〜1.3 was achieved by depositing the CN films at plasma densities as high as lx1012 cm-3. Increase in the plasma density and/or the emission-intensity ratio of the atomic nitrogen to the molecular band in the vicinity of the substrate was found to directly contribute to the N/C composition ratio in the CN films. Structural analysis by Fourier transform infrared spectroscopy showed that the bonds associated with hydrogen impurity could be effectively eliminated by increasing the substr … More ate temperature rather than intense UV light irradiation during film growth. Nanoindentation measurements showed that the hardness values of as high as 〜20 GPa was attained. We also performed investigations on the RF circuit configurations and the discharge characteristics of internal type antennas for plasma sputtering. The RF voltage amplitude of the antenna conductor was shown to be minimized to 1/2 of the antenna terminal voltage when the impedance balance condition was met in the floating antenna regime. Furthermore, materials investigations on the stress relaxation for enhancement of the superhard nitride films were additionally performed by ion bombardment processes. Tribological and structural characterizations of the buffer layer indicated that the buffer layer control can be effective for stress relaxation, however, the peak shifts of the IR TO-phonon mode of cBN indicated the accumulation of the compressive strain with increasing film thickness could not be avoided in the superhard film growth using ion bombardment. Less

Report

(3 results)
  • 1999 Annual Research Report   Final Research Report Summary
  • 1998 Annual Research Report
  • Research Products

    (34 results)

All Other

All Publications (34 results)

  • [Publications] 節原裕一、三宅正司: "イオン・プラズマプロセスによる硼素、炭素、窒素系超硬質薄膜の合成"応用物理. 67巻6号. 659-663 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] S.Miyake,Y.Setsuhara,K.Shibata,M.Kumagai,K.Ogata,Y.Sakawa and T.Shoji: "Sputter Deposition of Carbon Nitride Films by Reactive High-Density Plasmas with Excitation of m=0 Mode Helicon Wave"Ext.Abs.of 4th Int.Conf.on Reactive Plasmas(ICRP3)/51st Annual Gaseous Electronics Conf.(GEC51), Maui, USA. 87-88 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] M.Kumagai,S.Konuma,Y.Setsuhara,S.Miyake,K.Ogata and M.Kohata: "Properties of Cubic Boron Nitride Films Prepared by Ion Beam Assisted Deposition"Ion Implantation Technology-98 ed.by J.Matsuo, G.Takaoka and I.Yamada(IEEE Inc., New Jersey). 1140-1143 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] S.Miyake,Y.Setsuhara,K.Shibata,M.Kumagai,Y.Sakawa,T.Shoji: "Formation of carbon nitride films by reactive high-density plasma sputtering with excitation of m=0 mode helicon wave"Surface and Coatings Technology. 116-119. 11-17 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Y.Setsuhara,M.Kumagai,M.Suzuki,T.Suzuki and S.Miyake: "Properties of cubic boron nitride films with buffer layer control for stress relaxation using ion-beam-assisted deposition"Surface and Coatings Technology. 116-119. 100-107 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] M.Yamashita,Y.Setsuhara,S.Miyake,M.Kumagai,T.Shoji and J.Musil: "Studies on Magnetron Sputtering Assisted by Inductively Coupled RF plasma for Enhanced Metal Ionization"Japanese Journal of Applied Physics. 38. 4291-4295 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] S.Miyake,Y.Setsuhara,Y.Sakawa and T.Shoji: "Development of High Density RF Plasma and Application to PVD"Surface and Coatings Technology. 131. 171-176 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Y.Takaki,Y.Setsuhara,S.Miyake,M.Kumagai,Y.Sakawa and T.Shoji: "Formation of Superhard Nitride Films by High-Density Helicon-Plasma Sputtering"Proceedings of the 17th Symposiym on Plasma Processing. 383-386 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 節原裕一、三宅正司: "非平衡材料プロセスを用いた超硬質窒化物薄膜合成"日本真空協会関西支部平成12年度第1回研究例会資料. 17-26 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Y.Setsuhara,Y.Sakawa,T.Shoji,M.Kumagai and S.Miyake: "Development of High Density RF Plasma and Application to PVD"Surface and Coatings Technology(Accepted for publication February 5, 2001). (in press). (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Yuichi Setsuhara: "Ion-Beam and Plasma Processing Technology for Formation of Boron and Carbon Based Nitride Films"Proc.Osaka University/TWI Joint Seminar, Osaka, Japan. (in press). (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Y.Setsuhara and S.Miyake: "Ion-beam and plasma processing techniques for thin-film synthesis of superhard materials in boron-carbon-nitrogen system(in Japanese)"Oyobuturi. 67. 659-663 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] S.Miyake, Y.Setsuhara, K.Shibata, M.Kumagai, K.Ogata, Y.Sakawa and T.Shoji: "Sputter Deposition of Carbon Nitride Films by Reactive High-Density Plasmas with Excitation of m=0 Mode Helicon Wave"Ext.Abs.of 4th Int.Conf.on Reactive Plasmas (ICRP3)/51st Annual Gaseous Electronics Conf.(GEC51), Maui, USA. 87-88 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] M.Kumagai, S.Konuma, Y.Setsuhara, S.Miyake, K.Ogata and M.Kohata: "Properties of Cubic Boron Nitride Films Prepared by Ion Beam Assisted Deposition"Ion Implantation Technology-98 ed.by J.Matsuo, G.Takaoka and I.Yamada (IEEE Inc., New Jersey, 1999). 1140-1143

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] S.Miyake, Y.Setsuhara, K.Shibata, M.Kumagai, Y.Sakawa, T.Shoji: "Formation of carbon nitride films by reactive high-density plasma sputtering with excitation of m=0 mode helicon wave"Surf.Coat.Technol.. 116-119. 11-17 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Y.Setsuhara, M.Kumagai, M.Suznki, T.Suzuki and S.Miyake: "Properties of cubic boron nitride films with buffer layer control for stress relaxation using ion-beam-assisted deposition"Surf.Coat.Technol.. 116-119. 100-107 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] M.Yamashita, Y.Setsuhara, S.Miyake, M.Kumagai, T.Shoji and J.Musil: "Studies on Magnetron Sputtering Assisted by Inductively Coupled RF Plasma for Enhanced Metal Ionization"Jpn.J.Appl.Phys.. 38. 4291-4295 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] S.Miyake, Y.Setsuhara, Y.Sakawa and T.Shoji: "Development of High Density RF Plasma and Application to PVD"Surf.Coat.Technol.. 131. 171-176 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Y.Takaki, Y.Setsuhara, S.Miyake, M.Kumagai, Y.Sakawa and T.Shoji: "Formation of Superhard Nitride Films by High-Density Helicon-Plasma Sputtering"Proc.17th Symposium on Plasma Processing, Nagasaki. 383-386 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Y.Setsuhara and S.Miyake: "Nonequillibrium materials processing techniques for synthesis of superhard nitride thin films(in Japanese)"Proc.H12 1st Kansai Branch Meeting of Vac.Soc.Jpn.. 17-26 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Y.Setsuhara, Y.Sakawa, T.Shoji, M.Kumagai and S.Miyake: "Synthesis of carbon nitride films by high-density helicon wave-excited plasma sputtering"Surf.Coat.Technol.. (in press)(Accepted for publication February 5, 2001). (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] Yuichi Setsuhara: "Ion-Beam and Plasma Processing Technology for Formation of Boron and Carbon Based Nitride Films"Proc.Osaka University/TWI Joint Seminar, Osaka, Japan. (in press). (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] S. Miyake,Y. Setsuhara,K. Shibata,M. Kumagai,Y. Sakawa and T. Shoji: "Formation of Carbon Nitride Films by Reactive High-Density Plasma Sputtering with Excitation of m=0 Mode Helicon Wave"Surface and Coatings Technology. 116-119. 11-17 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] Y. Setsuhara, M. Kumagai,M. Suzuki,T. Suzuki,and S. Miyake: "Properties of Cubic Boron Nitride Films with Buffer Layer Control for Stress Relaxation using Ion Beam Assisted Deposition"Surface and Coatings Technology. 116-119. 100-107 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] S. Miyake,Y. Setsuhara,Y. Sakawa and T. Shoji: "Development of High Density RF Plasma and Application to PVD"Surface and Coatings Technology (to be published). (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] Y. Takaki,Y. Setsuhara,S. Miyake,M. Kumagai,Y. Sakawa,and T. Shoji: "Formation of Superhard Nitride Films by High-Density Helicon-Plasma Sputtering"Proceedings of the 17th Symposium on Plasma Processing. 383-386 (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] M. Yamashita,Y. Setsuhara,S. Miyake,M. Kumagai,T. Shoji and J. Musil: "Studies on Magnetron Sputtering Assisted by Inductively Coupled RP Plasma for Enhanced Metal lonization"Japanese Journal of Applied Physics. 38. 4291-4295 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] Y. Setsuhara, S. Miyake,Y. Sakawa and T. Shoji: "Production of Inductively-Coupled Large-Diameter Plasmas with Internal Antenna"Japanese Journal of Applied Physics. 38. 4263-4267 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] Y.Setsuhara and S.Miyake: "Ion-beam and plasma processing techniques for thin-film synthesis of superhard materials in boron-carbon-nitrogen system" 応用物理. 67-6. 659-663 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] S.MIYAKE,Y.SETSUHARA,K.SHIBATA,M.KUMAGAI,K.OGATA,Y.SAKAWA and T.SHOJI: "Sputter Deposition of Carbon Nitride Films by Reactive High-Density Plasmas with Excitation of m=0 Mode Helicon Wave" Bull.Am.Phys.Soc.43-5. 1428-1428 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] S.MIYAKE,Y.SETSUHARA,K.SHIBATA,M.KUMAGAI,Y.SAKAWA and T.SHOJI: "Formation of Carbon Nitride Films by Reactive High-Density Plasma Sputtering with Excitation of m=0 Mode Helicon Wave" Surf.& Coatings Technol.(to be published). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] Y.SETSUHARA,S.MIYAKE,Y.SAKAWA and T.SHOJI: "Production of Inductively-Coupled Large-Diameter Plasmas with Internal Antenna" Jpn.J.Appl.Phys.(to be published). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] Y.SETSUHARA,M.YAMASHITA,S.MIYAKE,M.KUMAGAI,and J.MUSIL: "Studies on Magnetron Sputtering Assisted by Inductively Coupled RF Plasma for Enhanced Metal Ionization" Jpn.J.Appl.Phys.(to be published). (1999)

    • Related Report
      1998 Annual Research Report
  • [Publications] Y.SETSUHARA,M.KUMAGAI,M.SUZUKI,T.SUZUKI and S.MIYAKE: "Properties of Cubic Boron Nitride Films with Buffer Layer Control for Stress Relaxation using Ion Beam Assisted Deposition" Surf.& Coatings Technol.(to be published). (1999)

    • Related Report
      1998 Annual Research Report

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Published: 1998-04-01   Modified: 2016-04-21  

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