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Ultra High Sensitive Electron Bombarded Imager

Research Project

Project/Area Number 10650341
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field 電子デバイス・機器工学
Research InstitutionKokushikan University

Principal Investigator

TAKETOSHI Kazuhisa  Kokushikan University, Electrical Professor, 電気電子工学科, 教授 (80255637)

Project Period (FY) 1998 – 2001
Project Status Completed (Fiscal Year 2001)
Budget Amount *help
¥3,300,000 (Direct Cost: ¥3,300,000)
Fiscal Year 2001: ¥600,000 (Direct Cost: ¥600,000)
Fiscal Year 2000: ¥700,000 (Direct Cost: ¥700,000)
Fiscal Year 1999: ¥800,000 (Direct Cost: ¥800,000)
Fiscal Year 1998: ¥1,200,000 (Direct Cost: ¥1,200,000)
KeywordsZnCdTe / EB-gain / Excess noise factor / EB利得 / 過剰雑音 / EB-利得 / ED-AMI / 電子増倍率 / S / N / 解像度 / 撮像評価実験 / 増倍利得 / 電子ミクロホトメトリ / 新構造 / 画像特性 / 寿命 / ランダムチェイン / CdTe,GaAs / EBIC動作 / 利得
Research Abstract

We studied characteristics of electron bombaraded(EB)gain, excess noise factor, resolution, optimum thickness for EB-AMI. ZnCdTe sensor layer is overlaid on AMI. EB-gain is 1500 at 10 kV. Resolution is excellent since there is no connecting fiber. Random noise, white spots, lag and sticking cannot be detectable. Fatigue of running of 5000hr is excellent, is under detection although that of a-Si sensor is strong. The threshold voltage of 2kV is explained as penetration loss of Al, Six_2Nix_2 Optimal sensor thickness is 0.83 μm. Lateral expansion of electron excited in sensor is 0.2μm. theoretical excess noise factor is 1.2 and agrees with observed values.

Report

(5 results)
  • 2001 Annual Research Report   Final Research Report Summary
  • 2000 Annual Research Report
  • 1999 Annual Research Report
  • 1998 Annual Research Report
  • Research Products

    (14 results)

All Other

All Publications (14 results)

  • [Publications] 特野 仁: "非晶質半導体の構造解析"国士舘大大学院博士提出論文. (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] Saito, Taketoshi, Kogu: "Study or Ring-to-claim structural change by RIUC"J.Vac.Soc.Jap.Vol.44. 2. 105-108 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] Taketosi, Andd: "Sludies of multiplication ponchos of EB-AMI"IEEE.ED.. 46. 1619-1622 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] Saito, Taketoshi: "Development of ED-AMI"J.Vac.Soc.. 44. 105-108 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] Saito, Taketoshi, Kozu: "Study of Ring-to-dam structural change by RNC"J. Vac. Soc. Jap. Vol.44 Vol.2. 105-108 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] Taketoshi, Andch: "Sludies of multiplication process of EB-AM1"IEEE, ED. Vol.46. 1619-1622 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] Saito, Taketoshi: "Development of ED-AM1"J. 1/ae. Soe. Vol.44. 105-108 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] Saito, Taketoshi: "Study of Ring-to-Chain bgRMC"J. Vac. Soc, Jap. 44. 583-587 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] H.Saito,K.Taketoshi,K.Kozu and K.Sato: "Development of an electron diffractometer using an electron-bombarded amplified MOS imager."J.Vac.Soc.J.Vol.44,No.2.. 44.2. (2001)

    • Related Report
      2000 Annual Research Report
  • [Publications] H.Saito,K.Taketoshi and K.Kozu: "Study of ring-to-chain structural change of evaporated amorphous selenium by Reverse Monte Carlo simulation."J.Vac.Soc.Accepted. (to be published). (2001)

    • Related Report
      2000 Annual Research Report
  • [Publications] k.Taketoshi F.Andoh,T.Kawamura,S.Araki:: "Development of a Novel Image Intensifier of an Amplified MOS Imager Overlaid with EB a-Si,"IEEE,ED.. Vol.45,NO.4,April. 778-784 (1998)

    • Related Report
      1999 Annual Research Report
  • [Publications] K.Taketoshi,F.Andoh: "Studies of Multiplication Process of a Novel Image Intensifier of an Amplified Metal-Oxide-Semiconductor Imager Overlaid with Electron-Bombarded Amorphous Silicon,"IEEE,ED.. Vol.46,No.8,August. 1619-1622 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] K.Taketoshi: "Developmento of a Novel Image Intensifier of an Amplified MOS Imager Overland with EB a-Si" IEEE ED. 45,4. 778-784 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] "Studies of Multiplication Process of a Novel Image Intensifier of an Amplified Metal-Oxide-Semiconductor Imager Overlaid with Elect-ron -Bombarded Amorphous Silicon" IEEE ED. accepted to be published. (1999)

    • Related Report
      1998 Annual Research Report

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Published: 1998-04-01   Modified: 2016-04-21  

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