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A Study of Magnetic Interaction Between Magnetic Layers in Laminated Films

Research Project

Project/Area Number 10650691
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Structural/Functional materials
Research InstitutionOKAYAMA UNIVERSITY

Principal Investigator

KOHMOTO Osamu  Okayama University, Department of Physics, Associate Professor, 理学部, 助教授 (00234716)

Co-Investigator(Kenkyū-buntansha) FUJII Tatsuo  Okayama University, Department of Applied Chemistry, Associate Professor, 工学部, 助教授 (10222259)
Project Period (FY) 1998 – 1999
Project Status Completed (Fiscal Year 1999)
Budget Amount *help
¥1,100,000 (Direct Cost: ¥1,100,000)
Fiscal Year 1999: ¥500,000 (Direct Cost: ¥500,000)
Fiscal Year 1998: ¥600,000 (Direct Cost: ¥600,000)
KeywordsNickel / Oxygen / Sputtering / Coercive Force / Heat Treatment / Magnetoresistance / Magnetic Susceptibility / 電気抵抗率 / 磁化率 / 強磁性共鳴
Research Abstract

Four types of the magnetic films has been studied.
(1) Single-layer Ni Films : Dependencies of the saturation magnetization, coercive force remanence ratio and perpendicular magnetic anisotropy in sputtered Ni films on the film thickness (100 and 300 nm) and Ar pressure (3-50 mTorr) have been studied.
(2) Single-layer Ni-O films prepared by sputtering in Ar+OィイD22ィエD2 atmosphere : Single phase NiO films are obtained below the oxygen partial pressure (OィイD22ィエD2/(Ar+OィイD22ィエD2)) of 9%. Lattice constant (a) and axis angle (α) of the Ni-O films have been studied. With increase in OィイD22ィエD2 pressure, the two values of a and α become close to those of the bulk. Saturation magnetization, coercive force, remanence ratio and electrical resistivity (ρ) has been studied. The NiO films are not stoichiometric composition. Oxygen deficient value (γ) in NiィイD21-γィエD2O decrease rapidly with annealing temperature. With decreasing γ, the electrical resistivity increases rapidly from 6x10ィイD1-1ィエD1 to 10ィイD14ィエD1 μΩcm.
(3) Layered Ni/NiO films : Sifted MH loops are observed in bilayered films. With increase in NiO layer thickness, exchange field(HィイD2exィエD2) coercive force (HィイD2cィエD2) and magetoresistance (Δρ/ρ) increases. HィイD2exィエD2 increase with decrease in the Ni layer thickness. With increase in the NiO layer thickness, the Ni layer thickness at which the field of appearing HィイD2exィエD2 increases.
(4) Layered Ni/Cu/Ni/NiO films : Shifted and asymmetrical MH loops have been observed. The latter indicated two ferromagnetic Ni layers have been surely separated by the Cu layer. HィイD2exィエD2 and HィイD2cィエD2 tend to increase with Cu layer thickness.

Report

(3 results)
  • 1999 Annual Research Report   Final Research Report Summary
  • 1998 Annual Research Report
  • Research Products

    (11 results)

All Other

All Publications (11 results)

  • [Publications] O. Kohmoto, H. Kitamura: "Magnetic properties of sputtered Co films"Phys. Status Solid A. 176. 1039-1045 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] T. Fujii, T. Yano: "Preparation of CoFe_2O_4/α-Fe_2O_3 bilayered films by helicon plasma sputtering"Proc. of 16th Int. Japan-Korea Seminar on Ceramics. 375-378 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 藤井,阿山,中西,高田: "反応性蒸着法によるFeTiO_3-α-Fe_2O_3固溶体薄膜の作成"粉体および粉末冶金. 46. 643-647 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] 河本,中川,小野: "スパッタ法によるNi-O膜の結晶構造と磁気特性"粉体および粉末冶金. 46. 797-800 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] O.Kohmoto, H. Kitamura, T. Tsuda, and F. Ono: "Magnetic properties of sputtering Co films"Phys. Status Solid A. Vol. 176. 1039-1045 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] T. Fujii, T. Yano, M. Nakanishi, J. Takada: "Preparation of CoFeィイD22ィエD2OィイD24ィエD2/α-FeィイD22ィエD2OィイD23ィエD2 bilayered films by helicon plasma sputtering"Proc. of 16th Int. Japan-Korea Seminar on Ceram.. 375-378 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] T. Fujii, K. Ayama, M. Nakanishi, J. Takada: "FeTiOィイD23ィエD2-α-FeィイD22ィエD2OィイD23ィエD2 Solid Solution Films Prepared by a Reactive Vapor Deposition Technique"Journal of the Japan Society of Powder and Powder Metallurgy. Vol. 46. 58-62 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] O. Kohmoto, H. Nakagawa, F. Ono: "Crystal Structures and Magnetic Properties of Ni-O Films Prepared by Sputtering"Journal of the Japan Society of Powder and Powder Metallurgy. Vol. 46. 797-800 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1999 Final Research Report Summary
  • [Publications] O. Kohmoto et al.: "Magnetic properties of sputtered Co films"Phys. Status Solid A. 176. 1039-1045 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 河本 修,中川泰通,小野文久: "スパッタ法によるNi-O膜の結晶構造と磁気特性"粉体および粉末冶金. 46. 797-800 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 藤井達生ら: "反応性蒸着法によるFeTiO_3-α-Fe_2O_3固溶体薄膜の作製"粉体および粉末冶金. 46. 643-647 (1999)

    • Related Report
      1999 Annual Research Report

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Published: 1998-04-01   Modified: 2016-04-21  

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