| Project/Area Number |
10680457
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
プラズマ理工学
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| Research Institution | Chubu University (1999-2000)
Nagoya University (1998) |
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Principal Investigator |
NAKAMURA Keiji Chubu University, Department of Electrical Engineering, Associate Professor, 工学部, 助教授 (20227888)
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| Co-Investigator(Kenkyū-buntansha) |
TOYODA Hirotaka Nagoya University, Department of Electrical Engineering, Associate Professor, 大学院・工学研究科, 助教授 (70207653)
SUGAI Hideo Nagoya University, Department of Electrical Engineering, Professor, 大学院・工学研究科, 教授 (40005517)
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| Project Period (FY) |
1998 – 2000
|
| Project Status |
Completed (Fiscal Year 2000)
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| Budget Amount *help |
¥3,500,000 (Direct Cost: ¥3,500,000)
Fiscal Year 2000: ¥500,000 (Direct Cost: ¥500,000)
Fiscal Year 1999: ¥500,000 (Direct Cost: ¥500,000)
Fiscal Year 1998: ¥2,500,000 (Direct Cost: ¥2,500,000)
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| Keywords | Plasma Process / Etching / Silicon dioxide / plasma-wall interaction / RF bias / Ion bombardment / Wall control / Radical desorption / プラズマ・壁相互作用 / RFバイアス / 壁制御 / ラジカル脱離 |
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| Research Abstract |
In silicon dioxide etching using high-density fluorocarbon plasmas, there are various problems, especially for process repeatability. One of the reasons is believed to be variations of plasma composition due to ion-induced speices desoption from walls on which fluorocarbon polymer films are deposited. In the present project, we have developed novel techniques for the suppression of the polymer deposition as well as the time variation of radical densities.
The polymer deposition at chamber walls was suppressed by two methods based on ion bombardment, so-called alternating ion bombardment method and plasma potential oscillation method. In these methods, the ion bombarding energy was controlled by RF bias. The deposition rate decreased with the ion bombarding energy, and the polymer deposition vanished for the ion bombarding energy over 〜100 eV.Simultaneous measurements of fluorocarbon radicals revealed that the suppression of the polymer deposition made it possible to reduce the time variation of radical densities, i.e. plasma composition. These results suggested that the present techniques were effective for improvement of the process repeatability in the oxide etching.
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