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GENERATING AND OBSERBATING OF SiC SUPPER LATTICE AND EXTRA SMOOTH SURFACE

Research Project

Project/Area Number 11450061
Research Category

Grant-in-Aid for Scientific Research (B).

Allocation TypeSingle-year Grants
Section一般
Research Field 機械工作・生産工学
Research InstitutionTOKYO METROPOLITAN UNIVERSITY

Principal Investigator

FURUKAWA Yuji  TOKYO METROPOLITAN UNIV., DEPT.OF MECHANICAL ENGINIERRING, PROFESSOR, 大学院・工学研究科, 教授 (10087190)

Co-Investigator(Kenkyū-buntansha) UCHIYAMA Kenji  TOKYO METROPOLITAN UNIV., DEPT.OF MECHANICAL ENGINIERRING, RESERCH ASSOCIATE, 大学院・工学研究科, 助手 (90281691)
KAKUTA Akira  TOKYO METROPOLITAN UNIV., DEPT.OF MECHANICAL ENGINIERRING, RESERCH ASSOCIATE, 大学院・工学研究科, 助手 (60224359)
MORONUKI Nobuyuki  TOKYO METROPOLITAN UNIV., DEPT.OF MECHANICAL ENGINIERRING, ASSOCIATE PROFESSOR, 大学院・工学研究科, 助教授 (90166463)
Project Period (FY) 1999 – 2000
Project Status Completed (Fiscal Year 2000)
Budget Amount *help
¥13,900,000 (Direct Cost: ¥13,900,000)
Fiscal Year 2000: ¥700,000 (Direct Cost: ¥700,000)
Fiscal Year 1999: ¥13,200,000 (Direct Cost: ¥13,200,000)
Keywordssilicon carbide / molecular beam epitaxy / atomically smooth surface / 単結晶炭化シリコン / 平滑面
Research Abstract

Single crystal silicon carbide (SiC) is one of the potential materials for the precise structures in severe environment, such as X-ray mirrors. But it is difficult to achieve high accuracy by using conventional cutting and/or grinding processes because of its high hardness. We have been applying molecular beam epitaxy (MBE), which is one of the crystal growth techniques in vacuum, to the surface finishing process in atomic level. We were extending this process from homo-epitaxy of silicon on silicon substrate to hetero-epitaxy of SiC on silicon substrate. The motivations of previous studies related to MBE were not the application to machining process but the interest in physical or electric property, thus, MBE has not been established as a surface smoothing process. This study tried to investigate the SiC hetero-epitaxial growth process on Si substrate experimentally, aiming to establish it as a smoothing process. However, the properties of the obtained SiC surface, such as chemical composition and roughness, are not satisfactory. In this study, the proper conditions were investigated to improve the surface properties in hetero-epitaxy of silicon carbide on silicon substrate. The substrate temperature during the process, which strongly affects the epitaxial growth process, was changed between 1023K and 1373K.It is found that the proper substrate temperature, 1073-1173K in this case, improves the roughness up to 1.4 nm Ra while keeping good crystal structure.

Report

(3 results)
  • 2000 Annual Research Report   Final Research Report Summary
  • 1999 Annual Research Report
  • Research Products

    (10 results)

All Other

All Publications (10 results)

  • [Publications] N.Moronuki,Y.Furukawa: "An analysis of surface properties of hetero-epitaxially grown SiC surface on Si substrate"Annals of the CIRP. 49,1. 447-450 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] N.MORONUKI,A.KAKUTA and Y.FURUKAWA: "Large Scale Single-Crystal and Extremely Smooth SiC Surface Produced by Hetero-Epitaxial Growth and its Applicability to Optical Elements"Precision Science and Technology for Perfect Surfaces. 273-278 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] A.KAKUTA,H.MIYAKOSHI,N.MORONUKI and Y.FURUKAWA: "A study on the SiC Hetero-Epitaxial Gowth Process on Silicon Substrate"Precision Science and Technology for Perfect Surfaces. 279-284 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] Nobuyuki MORONUKI, Akira KAKUTA, and Yuji FURUKAWA: "Large Scale Single-Crystal and Extremely Smooth SiC Surface Produced by Hetero-Epitaxial Growth and its Applicability to Optical Elements"Precision Science and Technology for Perfect Surfaces, JSPE Publication Series. No.3. 273-278 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] Akira KAKUTA, H.MIYAKOSHI, Nobuyuki MORONUKI and Yuji FURUKAWA: "A study on the SiC Hetero-Epitaxial Growth Process on Silicon Substrate"Precision Science and Technology for Perfect Surfaces, JSPE Publication Series. No.3. 279-284 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] Nobuyuki MORONUKI and Yuji FURUKAWA: "An Analysis of Surface Properties of Hetero-Epitaxially Grown SiC Surface on Si Substrate"Annals of the CIRP. 49,1. 447-450 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] N.Moronuki,Y.Furukawa: "An analysis of surface properties of hetero-epitaxially grown SiC surface on Si substrate"Annals of the CIRP. 49,1. 447-450 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] N.MORONUKI, A.KAKUTA, Y.FURUKAWA: "Large scale single-crystal and extremely smooth SiC surface Produced by Hetero-epitaxial growth and its applicability to Optical elements"Proceedings of the 9th International conference on production Engineering. 273-278 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] A.KAKUTA, H.MIYAKOSHI, N.MORONUKI, Y.FURUKAWA: "A Study on the SiC Hetero-Epitaxial Growth Process on Silicon Substratc"Proceedings of the 9th International conference on production Engineering. 279-284 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 古川勇二、諸貫信行、角田陽、橋本克美: "分子線エピタキシによるSiC平滑面の創成(第4報)"精密工学会春季学術講演論文集. (印刷中). (2000)

    • Related Report
      1999 Annual Research Report

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Published: 1999-04-01   Modified: 2016-04-21  

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