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Preparation of Insulating Aluminum Nitride Film by Enhanced Shielded Vacuum

Research Project

Project/Area Number 11450122
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionToyohashi University of Technology

Principal Investigator

SAKAKIBARA Takeki  Toyohashi University of Technology, Faculty of Engineering, Professor, 工学部, 教授 (10023243)

Co-Investigator(Kenkyū-buntansha) NAGAO Masayuki  Toyohashi University of Technology, Faculty of Engineering, Professor, 工学部, 教授 (30115612)
TAKIKAWA Hirofumi  Toyohashi University of Technology, Faculty of Engineering, Associate Professor, 工学部, 助教授 (90226952)
Project Period (FY) 1999 – 2001
Project Status Completed (Fiscal Year 2001)
Budget Amount *help
¥12,900,000 (Direct Cost: ¥12,900,000)
Fiscal Year 2001: ¥2,600,000 (Direct Cost: ¥2,600,000)
Fiscal Year 2000: ¥3,600,000 (Direct Cost: ¥3,600,000)
Fiscal Year 1999: ¥6,700,000 (Direct Cost: ¥6,700,000)
Keywordsaluminum nitride film / vacuum arc deposition / enhanced shielded method / droplet-free / superconductor shield / magnetically filtered arc / film properties / 窒化アルミニウム膜 / 光学的特性 / 機械的特性 / 結晶配向 / イオンエネルギー分析
Research Abstract

In order to fabricate the AlN film, which exhibits high electrical insulation property with high thermal conduction and is available for of electric power device, which is available for electric power devices, new reactive vacuum arc deposition system was developed. In the shielded method (S-CAD: shielded cathodic arc deposition), we found that the transparent AlN films with different crystalline orientations could be prepared by using different substrate bias. The S-CAD was further available to prepare various droplet-free films of other nitride and oxides (AlO_2, TiN, TiO_2, CrN, ZnO, etc.). However, the S-CAD has a problem that the deposition rate decreases by 1/3 to 1/5. Then, in order to increase the deposition rate, the enhanced shielded method (ES-CAD) in which the ions behind the shield were conducted and focused to the substrate by external magnetic field, was designed and the system apparatus was fabricated. After optimizing the magnetic filed configuration and magnetic flux density, the deposition rate in ES-CAD was more than 5 times as high as that in S-CAD, and was even faster than that in the non-shielded conventional method.
The improved ES-CAD (ES-CAD) in which the superconductor shield employed was then build, in order to obtain much faster deposition rate. The ions emitted from the cathode were effectively transported to the substrate by the detoured magnetic filed due to meissner effect of the superconductor. ES-CAD had higher deposition rate than ES-CAD. Furthermore, linear and torus type magnetically filtered arc deposition (FAD) systems having droplet filtering duct, were developed. As a result, it was found that the liner-FAD was not able to filter the droplets, although the torus-FAD was able to filter the droplets sufficiently.

Report

(4 results)
  • 2001 Annual Research Report   Final Research Report Summary
  • 2000 Annual Research Report
  • 1999 Annual Research Report
  • Research Products

    (51 results)

All Other

All Publications (51 results)

  • [Publications] H.Takikawa: "Properties of titanium oxide film prepared by reactive cathodic vacuum arc deposition"Thin Solid Films. 348. 145-151 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H.Takikawa: "N_2 gas absorption in cathodic arc apparatus with an Al cathode under medium vacuum"IEEE Transactions on Plasma Science. 27・4. 1034-1038 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] 滝川浩史: "種々の反応性真空アーク蒸着装置によるアモルファス酸化チタン膜の生成"電気学会論文誌. 119-A・10. 1243-1248 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H.Takikawa: "Synthesis of a-axis-oriented AlN film by a shielded reactive vacuum arc deposition method"Surface and Coatings Technology. 120/121. 383-387 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] 宮野竜一: "TiN膜生成用シールド型真空アーク蒸着装置におけるプラズマパラメータ計測"電気学会論文誌. 119-A・12. 1397-1402 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] 滝川浩史: "パルス電流真空アークの放電特性とドロップレット抑制効果"プラズマ応用科学. 7. 3-10 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H.Takikawa: "ZnO film fabrication by reactive shielded vacuum arc deposition"Transactions of the Material Research Society of Japan. 25・1. 345-348 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] R.Miyano: "Ion energy measurement in shielded vacuum arc with graphite cathode"電気学会論文誌. 120-A・6. 724-725 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] R.Miyano: "Preparation of metal nitride and oxide thin films using shielded reactive vacuum arc disposition"Vacuum. 59. 159-167 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H.Takikawa: "ZnO film formation using a steered and shielded reactive vacuum arc deposition"Thin Solid Films. 377/378. 74-80 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] 池田光邦: "真空アークプラズマの磁気輸送とドロップレット削減効果"プラズマ応用科学. 8. 80-87 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H.Takikawa: "Effect of substrate bias on AlN thin film preparation in shielded reactive vacuum arc deposition"Thin Solid Films. 386. 276-280 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] R.Miyano: "Anode mode in cathodic arc deposition apparatus with various cathodes and ambient gases"Thin Solid Films. 390・1-2. 192-196 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] R.Miyano: "Cathode spot motion in vacuum arc of zinc cathode under oxygen gas flow"IEEE Transactions on Plasma Science. 29. 713-717 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] 滝川浩史: "磁気フィルタ型陰極アークプラズマによるダイヤモンドライクカーボン薄膜の合成"プラズマ応用科学. 9. 49-56 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H.Takikawa: "Cathodic arc deposition with activated anode (CADAA) for preparation of in situ doped thin solid films"Vacuum. (印刷中). (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] R.Miyano: "Influence of gap length and pressure on medium vacuum arc with Ti cathode in various ambient gases"Thin solid films. (印刷中). (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H. Takikawa, T. Matsui, T. Sakakibara, A. Bendavid, P. J. Martin: "Properties of titanium oxide film prepared by reactive cathodic vacuum arc deposition"Thin Solid Films. Vol.348. 145-151 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H. Takikawa, N. Kawakami, T. Sakakibara: "N_2 gas absorption in cathodic arc apparatus with an Al cathode under medium vacuum"IEEE Transactions on Plasma Science. Vol. 27, No. 4. 1034-1038 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H. Takikawa, T. Matsui, R. Miyano, T. Sakakibara, A. Bendavid, P. J. Martin: "Fabrication of amorphous titanium oxide films with various reactive vacuum arc deposition apparatuses"Transactions of the Institute of Electrical Engineering of Japan. 119-A. 1243-1248 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H. Takikawa, N. Kawakami, T. Sakakibara: "Synthesis of a-axis-oriented AlN film by a shielded reactive vacuum arc deposition method"Surface and Coatings Technology. Vol. 120-121. 383-387 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] R. Miyano, H. Takikawa, K. Shinsako, T. Sakakibara: "Measurements of plasma parameters in a shielded vacuum arc deposition apparatus for TiN film fabrication"Transactions of the Institute of Electrical Engineering of Japan. 119-A. 1397-1402 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H. Takikawa, K. Kimura, T. Sakakibara: "Discharge characteristics of vacuum arc with pulse current and efficiency of macrodroplet suppression"Journal of Applied Plasma Science. Vol. 7. 3-10 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H. Takikawa, K. Kimura, R. Miyano, T. Sakakibara: "ZnO film fabrication by reactive shielded vacuum arc deposition"Transactions of the Material Research Society of Japan. Vol. 25,No. 1. 345-348 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] R. Miyano, M. Nagayama, H. Takikawa, T. Sakakibara: "Ion energy measurement in shielded vacuum arc with graphite cathode"Transactions of the Institute of Electrical Engineering of Japan. 120-A. 724-725 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] R. Miyano, K. Kimura, K. Izumi, H. Takikawa, T. Sakakibara: "Preparation of metal nitride and oxide thin films using shielded reactive vacuum arc deposition"Vacuum. Vol. 59, No.1. 159-167 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H. Takikawa, K. Kimura, R. Miyano, T. Sakakibara: "ZnO film formation using a steered and shielded reactive vacuum arc deposition"Thin Solid Films. Vol.377-378. 74-80 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] M. Ikeda, K. Izumi, R. Miyano, H. Takikawa, T.Sakakibara: "Magnetic transportation of vacuum arc plasma and droplet filtering"Journal of Applied Plasma Science. Vol. 8. 80-87 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H. Takikawa, K. Kimura, T. Sakakibara, A. Bendavid, P. J. Martin, A. Matsumoto, K. Tsutsumi: "Effect of substrate bias on AlN thin film preparation in shielded reactive vacuum arc deposition"Thin Solid Films. Vol. 386. 276-280 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] R. Miyano, T. Saito, K. Kimura, M. Ikeda, H. Takikawa, T. Sakakibara: "Anode mode in cathodic arc deposition apparatus with various cathodes and ambient gases"Thin Solid Films. Vol. 390, No.1/2. 192-196 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] R. Miyano, Y. Fujimura, H. Takikawa, T. Sakakibara, M. Nagao: "Cathode spot motion in vacuum arc of zinc cathode under oxygen gas flow"IEEE Transactions on Plasma Science. 29. 713-717 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H. Takikawa, K. Izumi, T. Sakakibara: "Deposition of diamond-like carbon film using magnetically filtered cathodic-arc-plasma"Journal of Applied Plasma Science. Vol. 9. 49-56 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H. Takikawa, K. Kimura, R. Miyano, T. Sakakibara: "Cathodic arc deposition with activated anode (CADAA) for preparation of in situ doped thin solid films"Vacuum. (in press). (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] R. Miyano, T. Saito, H. Takikawa, T. Sakakibara: "Influence of gap length and pressure on medium vacuum arc with Ti cathode in various ambient gases"Thin solid films. (in press). (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] R.Miyano: "Anode mode in cathodic arc deposition apparatus with various cathodes and ambient gases"Thin Solid Films. 390・1-2. 192-196 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] R.Miyano: "Cathode spot motion in vacuum arc of zinc cathode under oxygen gas flow"IEEE Transactions on Plasma Science. 29. 713-717 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] 滝川浩史: "磁気フィルタ型陰極アークプラズマによるダイヤモンドライクカーボン薄膜の合成"プラズマ応用科学. 9. 49-56 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] H.Takikawa: "Cathodic arc deposition with activated anode(CADAA)for preparation of in situ doped thin solid films"Vacuum. (印刷中).

    • Related Report
      2001 Annual Research Report
  • [Publications] R.Miyano: "Influence of gap length and pressure on medium vacuum arc with Ti cathode in various ambient gases"Thin solid films. (印刷中).

    • Related Report
      2001 Annual Research Report
  • [Publications] H.Takikawa: "ZnO film fabrication by reactive shielded vacuum arc deposition"Trasactions of the Material Research Society of Japan. 25・1. 345-348 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] R.Miyano: "Ion energy measurement in shielded vacuum arc with graphite cathode"電気学会論文誌. 120-A・6. 724-725 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] R.Miyano: "Preparation of metal nitride and oxide thin films using shielded reactive vacuum arc disposition"Vacuum. 59. 159-167 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] H.Takikawa: "ZnO film formation using steered and shielded reactive vacuum arc deposition"Thin Solid Films. 377/378. 74-80 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] 池田光邦: "真空アークプラズマの磁気輸送とドロップレット削減効果"プラズマ応用科学. (掲載決定).

    • Related Report
      2000 Annual Research Report
  • [Publications] H.Takikawa: "Effect of substrate bias on AlN thin film preparation in shielded reactive vacuum arc deposition"Thin Solid Films. 386. 276-280 (2001)

    • Related Report
      2000 Annual Research Report
  • [Publications] H.Takikawa: "Properties of titanium oxide film prepared by reactive cathodic vacuum arc deposition"Thin Solid Films. 348. 145-151 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] H.Takikawa: "N_2 gas absorption in cathodic arc apparatus with an Al cathode under medium vacuum"IEEE Transaction on Plasma Science. 27・4. 1034-1038 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 滝川浩史: "種々の反応性真空アーク蒸着装置によるアモルファスTiO_2膜の生成"電気学会論文誌. 119-A・10. 1243-1248 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] H.Takikawa: "Synthesis of a-axis-oriented AlN film by a shielded reactive vacuum arc deposition method"Surface and Coating Technology. 120/121. 383-387 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 宮野竜一: "シールド型真空アーク蒸着装置におけるプラズマパラメータ計測"電気学会論文誌. 119-A・12. 1397-1402 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 滝川浩史: "パルス電流真空アークの放電特性とドロップレット抑制効果"プラズマ応用科学. (印刷中). (1999)

    • Related Report
      1999 Annual Research Report

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Published: 1999-04-01   Modified: 2016-04-21  

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