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Beating Effect of Traveling Electron Waves bv Terahertz Electromagnetic Wave and Its Application to Ultra-High Speed Three-Terminal Devices

Research Project

Project/Area Number 11450136
Research Category

Grant-in-Aid for Scientific Research (B).

Allocation TypeSingle-year Grants
Section一般
Research Field 電子デバイス・機器工学
Research InstitutionTokyo Institute of Technology

Principal Investigator

ASADA Masahiro  Tokyo Institute of Technology Information Processing Professor, 大学院・総合理工学研究科, 教授 (30167887)

Co-Investigator(Kenkyū-buntansha) WATANABE Masahiro  Tokyo Institute of Technology Information Processing Associate Professor, 大学院・総合理工学研究科, 助教授 (00251637)
Project Period (FY) 1999 – 2000
Project Status Completed (Fiscal Year 2000)
Budget Amount *help
¥14,300,000 (Direct Cost: ¥14,300,000)
Fiscal Year 2000: ¥6,400,000 (Direct Cost: ¥6,400,000)
Fiscal Year 1999: ¥7,900,000 (Direct Cost: ¥7,900,000)
KeywordsTerahertz amplifier device / Resonant tunneling structure / Photon-assisted tunneling / Beating of electron waves / Terahertz planar patch antenna / Semiconductor / insulator superlattice / Calcium fluoride / Cadmium fluoride / 金属 / 絶縁体 / 半導体超格子 / 半導体超挌子
Research Abstract

In this project, aiming at the realization of a novel electron device we proposed for a possibility of ultra-high frequency amplifier utilizing the photon-assisted transition and beating of electron waves, we have done (i) establishment of the epitaxial growth of insulator/semiconductor heterostructures and thier application to resonant tunneling structure which is a part of the proposed device, and (ii) detailed observation of the photon-assisted tunneling which is one of the principles of the proposed device.
For the epitaxial growth, we chose CaF_2/Si and CaF_2/CdF_2 heterostructures with large band offsets, and established the growth condition of resonant tunneling structure with the ionization beam epitaxial technique. The quality of the epitaxial layers was then optimized and greatly improved by a selective growth method in which the epitaxial layers were formed in windows with a few hundred-nanometer size made on Si substrates with SiO_2 masks. Resonant tunneling diodes with hish … More reproducibility and large peak-to-valley ratio, at least 10, in the negative differential resistance were obtained at room temperature.
For the observation of the photon-assisted tunneling effect, we fabricated small area GaInAs/InAlAs triple-barrier resonant tunneling diodes integrated with patch antennas, and irradiated terahertz electromagnetic wave onto them. The antenna loss was considerably reduced by an optimized structure, and thus, clear photon-assisted tunneling with large incident power was achieved. The observed results were well explained by the photon-assisted tunneling with multi-photon process of stimulated emission and absorption The terahertz optical gain was deduced from the observed stimulated emission rate. Using these results, we performed theoretical analysis of amplification characteristics of the proposed three-terminal device, and showed that power amplification up to several terahertz is possible. Necessary structures for these characteristics were also designed. Less

Report

(3 results)
  • 2000 Annual Research Report   Final Research Report Summary
  • 1999 Annual Research Report
  • Research Products

    (46 results)

All Other

All Publications (46 results)

  • [Publications] M.Asada,: "Estimation of interwell terahertz gain by photon-assisted tunneling measurement in triple-barrier resonant tunneling diodes"Applied Physics Letters. 77. 618-622 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] N.Sashinaka: "Observation of terahertz photon-assisted tunneling in triple-barrier resonant tunneling diodes integrated with patch antenna"Japanese Journal of Applied Physics. 39. 4899-4903 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] A.Itoh: "A 25-nm-long channel metal-gate p-type Schottky source/drain metal-oxide-semiconductor field effect transitor on separation-by-implanted-oxygen substrate"Japanese Journal of Applied Physics. 39. 4757-4758 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] M.Watanabe: "Epitaxial growth and electrical characteristics of CaF_2/Si/CaF_2 resonant tunneling diode structures grown on Si(111) 1° off substrate"Japanese Journal of Applied Physics. 39. L964-L967 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] M.Watanabe: "CaF_2/CdF_2 Double-Barrier Resonant Tunneling Diode with High Room-Temperature Peak-to-Valley Ratio"Japanese Journal of Applied Physics. 39. L716-L719 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] M.Watanabe: "Epitaxial Growth and Ultraviolet Photoluminescence of CaF_2/ZnO/CaF_2 Heterostructures on Si(111)"Japanese Journal of Applied Physics. 39. L500-L502 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Maruyama: "Improvement of the Visible Electroluminescence from Nanocrystalline Silicon Embedded in CaF_2 on Si(111) Substrate Prepared by Rapid Thermal Annealling"Japanese Journal of Applied Physics. 39. 1996-2000 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] W.Saitoh: "Analysis of short-channel Schottky source/drain metal-oxide-semiconductor field-effect transistor on silicon-on-insulator substrate and demonstration of sub-50nm n-type"Japanese Journal of Applied Physics. 38. 6226-6231 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] M.Tsutsui: "Resonant tunneling diodes in Si/CaF2 heterostructures grown by molecular beam epitaxy"Japanese Journal of Applied Physics. 38. L920-L922 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] W.Saitoh: "35nm metal gate p-type metal oxide semiconductor field-effect transistor with PtSi Schottky source/drain on separation by implanted oxygen substrate"Japanese Journal of Applied Physics. 38. L629-L631 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] Y.Oguma: "Terahertz response with dradual change from square-law detection to photon-assisted tunneling in tripple-barrier resonant tunneling diodes"Japanese Journal of Applied Physics. 38. L717-L719 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] N.Kikegawa: "Detection Time Shortening for Observation of Hot Electron Spatial Distribution by Scanning Hot Electron Microscope"Japanese Journal of Applied Physics. 38. 2108-2113 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] M.Watanabe: "Light emission from Si nanocrystals embedded in CaF_2 epilayers on Si(111) : effect of rapid thermal annealing"J.Luminescence. 80. 253-256 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Maruyama: "Visible Electroluminescence from Nanocrystalline Silicon Embedded in Single-Crystalline CaF_2/Si(111) with Rapid Thermal Anneal"Japanese Journal of Applied Physics. 38. L904-L906 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] M.Watanabe: "Negative Differential Resistance of CdF_2/CaF_2 Resonant Tunneling Diode on Si(111) Grown by Partially Ionized Beam Epitaxy"Japanese Journal of Applied Physics. 38. L116-L118 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] A.Itoh: "Very short channel metal-gate Schottky source/drain SOI-PMOSFETs and their short channel effect"Annual Device Research Conference (DRC'00). III-16 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] Y.Iketani: "Characteristics of epitaxial Si/CaF_2 resonant tunneling diodes grown on Si(111)1-degree-off substrate"Silicon Nanoelectronics Workshop. S5-6 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] N.Sashinaka: "Terahertz photon-assisted tunneling in resonant tunneling diode integrated with patch antenna"Topical Workshop on Heterostructure Microelectronics (TWHM'00). Mon-28 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] M.Watanabe, Y.Iketani, and M.Asada: "Epitaxial growth and electrical characteristics of CaF_2/Si/CaF_2 resonant tunneling diode structures grown on Si(111)1°off substrate"Japan.J.Appl.Phys.. vol.39, no.10A. L964-L967 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] M.Asada, Y.Oguma, and N.Sashinaka: "Estimation of interwell terahertz gain by photon-assisted tunneling measurement in triple-barrier resonant tunneling diodes"Appl.Phys.Lett.. vol.77, no.5. 618-620 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] N.Sashinaka, Y.Oguma, and M.Asada: "Observation of terahertz photon-assisted tunneling in triple-barrier resonant tunneling diodes integrated with patch antenna"Japan.J.Appl.Phys.. vol.39, no.8. 4899-4903 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] A.Itoh, M.Saitoh, and M.Asada: "A 25-nm-long channel metal-gate p-type Schottky source/drain metal-oxide-semiconductor field effect transitor on separation-by-implanted-oxygen substrate"Japan.J.Appl.Phys.. vol.39, no.8. 4757-4758 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Maruyama, N.Nakamura, and M.Watanabe: "Improvement of the Visible Electroluminescence form Nanocrystalline Silicon Embedded in CaF_2 on Si (111) Substrate Prepared by Rapid Thermal Annealling"Japan.J.Appl.Phys.. vol.39. 1996-2000 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] W.Saitoh, A.Itoh, S.Yamagami, and M.Asada: "Analysis of short-channel Schottky source/drain metal-oxide-semiconductor field-effect transistor on silicon-on-insulator substrate and demonstration of sub-50nm n-type devices with metal gate"Japan.J.Appl.Phys.. vol.38, no.11. 6226-6231 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] M.Tsutsui, M.Watanabe, and M.Asada: "Resonant tunneling diodes in Si/CaF_2 heterostructures grown by molecular beam epitaxy"Japan.J.Appl.Phys.. vol.38, no.8B. L920-L922 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] W.Saitoh, S.Yamagami, A.Itoh, and M.Asada: "35nm metal gate p-type metal oxide semiconductor field-effect transistor with PtSi Schottky source/drain on separation by implanted oxygen substrate"Japan.J.Appl.Phys.. vol.38, no.6A. L629-L631 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] Y.Oguma, N.Sashinaka, and M.Asada: "Terahertz response with dradual change from square-law detection to photon-assisted tunneling in tripple-barrier resonant tunneling diodes"Japan.J.Appl.Phys.. vol.38, no.7A. L717-L719 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] N.Kikegawa, B.Zhang, Y.Ikeda, N.Sakai, K.Furuya, M.Asada, M.Watanabe, and W.Saitoh: "Detection Time Shortening for Observation of Hot Electron Spatial Distribution by Scanning Hot Electron Microscope"Japan.J.Appl.Phys.. vol.38, no.4A. 2108-2113 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] M.Watanabe, T.Maruyama, S.Ikeda: "Light emission from Si nanocrystals embedded in CaF_2 epilayers on Si(111) : effect of rapid thermal annealing"J.Luminescence. vol.80. 253-256 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] T.Maruyama, N.Nakamura, and M.Watanabe: "Visible Electroluminescence from Nanocrystalline Silicon Embedded in Single-Crystalline CaF_2/Si(111) with Rapid Thermal Anneal"Japan.J.Appl.Phys.. vol.38. L904-L906 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] M.Watanabe, Y.Aoki, W.Saitoh and M.Tsuganezawa: "Negative Differential Resistance of CdF_2/CaF_2 Resonant Tunneling Diode on Si(111) Grown by Partially Ionized Beam Epitaxy"Japan.J.Appl.Phys.. vol.38. L116-L118 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] A.Itoh, M.Saitoh, and M.Asada: "Very short channel metal-gate Schottky source/drain SOI-PMOSFETs and their short channel effect"Annual Devive Research Conf (DRC'00), Dencer, USA. III-16 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] Y.Iketani, M.Watanabe, and M.Asada: "Characteristics of epitaxial Si/CaF_2 resonant tunneling diodes grown on Si(111) 1-degree-off substrate"Silicon Nanoelectronics Workshop, Honolulu, USA. S5-6 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] N.Sashinaka, Y.Oguma, and M.Asada: "Terahertz photon-assisted tunneling in resonant tunneling diode integrated with patch antenna"Topical Workshop on Heterostructure Microelectronics (TWHM'00), Kyoto. Mon-28 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] M.Asada,Y.Oguma,and N.Sashinaka: "Estimation of interwell terahertz gain by photon-assisted tunneling measurement in triple-barrier resonant tunneling diodes"Applied Physics Letters. 77. 618-622 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] N.Sashinaka,Y.Oguma,and M.Asada: "Observation of terahertz photon-assisted tunneling in triple-barrier resonant tunneling diodes integrated with patch antenna"Japanese Journal of Applied Physics. 39. 4899-4903 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] A.Itoh,M.Saitoh,and M.Asada: "A 25-nm-long channel metal-gate p-type Schottky source/drain metal-oxide-semiconductor field effect transitor on separation-by-implanted-oxygen substrate"Japanese Journal of Applied Physics. 39. 4757-4758 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] M.Watanabe,Y.Iketani,and M.Asada: "Epitaxial growth and electrical characteristics of CaF_2/Si/CaF_2 resonant tunneling diode structures grown on Si(111)1° off substrate"Japanese Journal of Applied Physics. 39. L964-L967 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] M.Watanabe,T.Funayama,T.Teraji,N.Sakamaki: "CaF_2/CdF_2 Double-Barrier Resonant Tunneling Diode with High Room-Temperature Peak-to-Valley Ratio"Japanese Journal of Applied Physics. 39. L716-L719 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] M.Watanabe,Y.Maeda,S.Okano: "Epitaxial Growth and Ultraviolet Photoluminescence of CaF_2/ZnO/CaF_2 Heterostructures on Si(111)"Japanese Journal of Applied Physics. 39. L500-L502 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] W.Saitoh: "Analysis of short-channel schottky source/drain metal- oxide-semiconductor field-effect transistor on silicon-on-insulator substrate and demonstration of sub-50nm n-type"Japanese Journal of Applied Physics. 38. 6226-6231 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] M.Tsutsui: "Resonant tunneling diodes in Si/CaF2 heterostructures grown by molecular beam epitaxy"Japanese Journal of Applied Physics. 38. L920-L922 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] W.Saitoh: ""35nm metal gate p-type metal oxide semiconductor field-effect transistor with PtSi Schottky source/drain on separation by implanted oxygen substrate""Japanese Journal of Applied Physics. 38. L629-L631 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] Y.Oguma: ""Terahertz response with dradual change from square-law detection to photon-assisted tunneling in tripple-barrier resnant tunneling diodes""Japanese Journal of Applied Physics. 38. L717-L719 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] M.Asada: ""Estimation of THz gain due to interwell transition by the measurement of detection properties of triple-barrier resonant tunneling diodes""Int.Conf.On Nonequilibrium Carrier Dynamics in Semiconductors (HCIS-11). MoB-1 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] Y.Oguma: ""Observation of gradual change from square-law detection to photon-assisted tunneling in THz response of triple-barrier resonant tunneling diodes""Int.Conf.on Modulated Semiconductor Structures (MSS9). G03 (1999)

    • Related Report
      1999 Annual Research Report

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Published: 1999-04-01   Modified: 2016-04-21  

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