| Project/Area Number |
11480106
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| Research Category |
Grant-in-Aid for Scientific Research (B).
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
プラズマ理工学
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| Research Institution | Nagoya University |
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Principal Investigator |
NAGATSU Masaaki Graduate School of Eng., Nagoya University, Associate Professor, 工学研究科, 助教授 (20155948)
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| Co-Investigator(Kenkyū-buntansha) |
SUGAI Hideo Graduate School of Eng., Nagoya University, Professor, 工学研究科, 教授 (40005517)
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| Project Period (FY) |
1999 – 2000
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| Project Status |
Completed (Fiscal Year 2000)
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| Budget Amount *help |
¥4,800,000 (Direct Cost: ¥4,800,000)
Fiscal Year 2000: ¥1,600,000 (Direct Cost: ¥1,600,000)
Fiscal Year 1999: ¥3,200,000 (Direct Cost: ¥3,200,000)
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| Keywords | plasma CVD / surface wave plasma / microwave plasma / diamond film / field emission / diamond-like carbon film / アモルファスカーボン膜 / ダイヤモンド薄膜 / 電子エミッター / 電子電界放出 |
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| Research Abstract |
We have been carried out the research associated with the deposition performance of large-area diamond-like carbon (DLC) films using planar surface-wave plasma and the film diagnostics, aiming at establishing the large-area thin film deposition technique using the plasma CVD method. Main results are listed in the following.
1. Installation of experimental setup : First, we have prepared the 40cm-diameter planar surface wave plasma excited by 2.45 GHz microwaves for DLC thin film deposition. Substrate stage with a temperature-control equipment has been installed inside the chamber.
2. Diagnostics of plasma for film deposition : We have carried out the measurements of spatial distribution of plasma parameters in the 2.45 GHz microwave excited surface-wave plasmas in Ar or He. We found that the spatial uniformity within ±5% was obtained over a radius of 10 cm above the substrate stage in the plasma down-streaming region.
3. Performance of diamond-like carbon film deposition : We found that t
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he uniform DLC film over a diameter of 10 cm was deposited on the silicon substrate at room temperature in a surface-wave plasma filled with He and methane gas. Deposition rate depends on the gas flow rates of He and methane. When the gas flow rates wre 280 sccm in He and 6 sccm in methane, we obtained the film deposition rate of 16 nm/min.
4. Field emission characteristics and other film performances : From the field emission measurements of hydrogenated DLC films, a threshold field of 4 V/μm at 1 μA/cm2 was obtained, which is comparable to that of crystalline diamond film. Effects of surface processing by plasma ion bombardments, nitrogen doping, substrate biasing and gas mixture ratio on field emission and film characteristics have been also investigated.
5. Results of the present research : We have published the present results in 9 journal papers and have reported 11 papers in the international conferences and 34 papers (2 symposium papers) in the domestic symposium and meetings in 1999-2000. Less
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