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Applied Study on Ion Absorption Pump for Oxygen by a Reactive Cathode Sputter Discharge

Research Project

Project/Area Number 11555008
Research Category

Grant-in-Aid for Scientific Research (B).

Allocation TypeSingle-year Grants
Section展開研究
Research Field 表面界面物性
Research InstitutionSuzuka National College of Technology

Principal Investigator

FUNATO Yasuyuki  Suzuka National College of Technology Dep.Of Electric and Information Engineering. Professor, 電子情報工学科, 教授 (10005358)

Co-Investigator(Kenkyū-buntansha) HIRANO Takenori  Suzuka National College of Technology Dep.Of Electric and Information Engineering. Asst.Professor, 電子情報工学科, 講師 (80249804)
NAGASHIMA Takayoshi  Suzuka National College of Technology Dep.Of Electric and Information Engineering. Assoc.Professor, 電子情報工学科, 助教授 (30237515)
KUWABARA Hirofumi  Suzuka National College of Technology Dep.Of Electric and Information Engineering. Professor, 電子情報工学科, 教授 (30043326)
虫明 基  川崎医科大学, 情報科学2, 講師 (50122453)
AKAISHI Kenya  Suzuka National College of Technology Dep.Of Electric and Information Engineering. Assoc.Professor, 大型ヘリカル研究部, 助教授 (90023720)
ITOH Akira  Suzuka National College of Technology Dep.Of Electric and Information Engineering. Asst.Professor (40259883)
Project Period (FY) 1999 – 2000
Project Status Completed (Fiscal Year 2000)
Budget Amount *help
¥4,400,000 (Direct Cost: ¥4,400,000)
Fiscal Year 2000: ¥2,200,000 (Direct Cost: ¥2,200,000)
Fiscal Year 1999: ¥2,200,000 (Direct Cost: ¥2,200,000)
KeywordsIon Pump / Reactive Cathode / LaB6 / Sputter Discharge / Oxygen / Partial Pressure / Plasma Parameter / Out Gases
Research Abstract

1. Basic experiment for production and improvement of the LaB6 cathode sputtering ion pump was carried out. In pump container of diameter of 6 cm and made of SUS-304 of the 200mm length, LaB6 disk of 5 mm thickness and 50mm diameter is installed as a cathode electrode.
2. The experimental device consists of trial manufacture LaB6 ion pump, traditional-model titanium pump, and differential evacuation pump sysytem. The measurement system was made to be satisfactory by using ultrahigh-vacuum ionization gauge, mass filter type analyzer and Pirani vacuum system.
3. The detailed experiment was carried out on the correlation of discharge parameters and pumping characteristic (Pump-down characteristics, exhaust velocity, partial pressure dynamics), and the experimental verification of high exhaust speed of oxygen and water for boron and LaB6 film was got.
4. The measurement of plasma parameters. In respect of electron density, electron temperature and space potential of glow-discharge plasma, Langmuir probe was used. The relation of pump exhaust characteristic and sputter discharge became the evidence, and the condition for getting the more high-efficient exhaust was pursued Gas release, absorption behavior during the discharge, recycling behavior with the wall, partial pressure characteristics were analyzed numerically and the results were repored everywhere in the conferences.
5. Image diagnostic. The shape of the sputter plasma column was pursued by photographing of the cross sectional photograph and the image processing. These are necessary for the optimization of the plasma production condition for application of the plasma.
6. The precise measurement of the residual gas analysis. Especially, each exhaust speed for the partial pressure was measured, and the relation between partial pressure pattern and arrival degree of vacuum was pursued.

Report

(3 results)
  • 2000 Annual Research Report   Final Research Report Summary
  • 1999 Annual Research Report
  • Research Products

    (11 results)

All Other

All Publications (11 results)

  • [Publications] Y.Funato, et al.: "Effects of Particle Wall Interaction on a Sputter Glow Discharge"Proc.XVth Europhysics Conf.on Atomic and Molecular Physics of Ionized Gases. August 26 30. 412-413 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] K.Akaishi,Y.Funato, et al.: "True and measured outgassing rates of a vacuum chamber with a reversibly absorbed phase"Journal of Vacuum Science & Technology A. Vol.19,No.1. 365-371 (2001)

    • Related Report
      2000 Annual Research Report
  • [Publications] Y.Funato, et al.: "Effects of Cathode Material on DC-Glow Discharge in N2/O2 Mixtures"Proc.Int.Conf.Phenomena in Ionized Gases.July,Warsaw. VOL.III. 27-28 (1999)

    • Related Report
      2000 Annual Research Report
  • [Publications] Y.Funato, et al.: "Dynamics of NOx Gases during a Glow Discharge with a Sputter Discharge"BULLETIN OF THE AMERICAN PHYSICAL SOCIETY. Vol.44,No.1,Part II. 1096 (1999)

    • Related Report
      2000 Annual Research Report
  • [Publications] Y.Funato: "Studies on a Magnetic Field Configuration for Plasma Processing"MEMOIRS of Suzuka National College of Technology. Vol.32. 43-48 (1999)

    • Related Report
      2000 Annual Research Report
  • [Publications] Y.Funato and C.Kiyooka: "Experiments on Plasma Parmeter Control for Processing"MEMOIRS of Suzuka National College of Technology. Vol.31. 65-70 (1998)

    • Related Report
      2000 Annual Research Report
  • [Publications] 南条徹: "ボロン化合物陰極を用いたN2/O2混合ガスグロー放電プラズマの特性"鈴鹿工業高等専門学校紀要. 33. 63-66 (2000)

    • Related Report
      1999 Annual Research Report
  • [Publications] Y. FUNATO: "Effects of Cathode Material on DC-Glow Discharge in N2/O2 Mixtures"Proc. Int. Conference Phenomena in Ionized Gases; 11-16, July, Warsaw. III. 27-28 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] Y. Funato: "Dynamics of Nox Gases during a Glow Discharge with Sputter Discharge"BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, Vol. 44. 1・II. 1096-1096 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] Y. Funato: "Studies on a Magnetic Field Configuration for Plasma Processing"MEMOIRS of Suzuka National College of Technology. 32. 43-48 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 清岡千晶: "スパッタ放電のプラズマ密度、電位分布の測定"鈴鹿工業高等専門学校紀要. 31. 65-70 (1998)

    • Related Report
      1999 Annual Research Report

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Published: 1999-04-01   Modified: 2016-04-21  

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