Applied Study on Ion Absorption Pump for Oxygen by a Reactive Cathode Sputter Discharge
| Project/Area Number |
11555008
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| Research Category |
Grant-in-Aid for Scientific Research (B).
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| Allocation Type | Single-year Grants |
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| Section | 展開研究 |
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| Research Field |
表面界面物性
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| Research Institution | Suzuka National College of Technology |
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Principal Investigator |
FUNATO Yasuyuki Suzuka National College of Technology Dep.Of Electric and Information Engineering. Professor, 電子情報工学科, 教授 (10005358)
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| Co-Investigator(Kenkyū-buntansha) |
HIRANO Takenori Suzuka National College of Technology Dep.Of Electric and Information Engineering. Asst.Professor, 電子情報工学科, 講師 (80249804)
NAGASHIMA Takayoshi Suzuka National College of Technology Dep.Of Electric and Information Engineering. Assoc.Professor, 電子情報工学科, 助教授 (30237515)
KUWABARA Hirofumi Suzuka National College of Technology Dep.Of Electric and Information Engineering. Professor, 電子情報工学科, 教授 (30043326)
虫明 基 川崎医科大学, 情報科学2, 講師 (50122453)
AKAISHI Kenya Suzuka National College of Technology Dep.Of Electric and Information Engineering. Assoc.Professor, 大型ヘリカル研究部, 助教授 (90023720)
ITOH Akira Suzuka National College of Technology Dep.Of Electric and Information Engineering. Asst.Professor (40259883)
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| Project Period (FY) |
1999 – 2000
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| Project Status |
Completed (Fiscal Year 2000)
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| Budget Amount *help |
¥4,400,000 (Direct Cost: ¥4,400,000)
Fiscal Year 2000: ¥2,200,000 (Direct Cost: ¥2,200,000)
Fiscal Year 1999: ¥2,200,000 (Direct Cost: ¥2,200,000)
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| Keywords | Ion Pump / Reactive Cathode / LaB6 / Sputter Discharge / Oxygen / Partial Pressure / Plasma Parameter / Out Gases |
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| Research Abstract |
1. Basic experiment for production and improvement of the LaB6 cathode sputtering ion pump was carried out. In pump container of diameter of 6 cm and made of SUS-304 of the 200mm length, LaB6 disk of 5 mm thickness and 50mm diameter is installed as a cathode electrode.
2. The experimental device consists of trial manufacture LaB6 ion pump, traditional-model titanium pump, and differential evacuation pump sysytem. The measurement system was made to be satisfactory by using ultrahigh-vacuum ionization gauge, mass filter type analyzer and Pirani vacuum system.
3. The detailed experiment was carried out on the correlation of discharge parameters and pumping characteristic (Pump-down characteristics, exhaust velocity, partial pressure dynamics), and the experimental verification of high exhaust speed of oxygen and water for boron and LaB6 film was got.
4. The measurement of plasma parameters. In respect of electron density, electron temperature and space potential of glow-discharge plasma, Langmuir probe was used. The relation of pump exhaust characteristic and sputter discharge became the evidence, and the condition for getting the more high-efficient exhaust was pursued Gas release, absorption behavior during the discharge, recycling behavior with the wall, partial pressure characteristics were analyzed numerically and the results were repored everywhere in the conferences.
5. Image diagnostic. The shape of the sputter plasma column was pursued by photographing of the cross sectional photograph and the image processing. These are necessary for the optimization of the plasma production condition for application of the plasma.
6. The precise measurement of the residual gas analysis. Especially, each exhaust speed for the partial pressure was measured, and the relation between partial pressure pattern and arrival degree of vacuum was pursued.
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Report
(3 results)
Research Products
(11 results)
