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New Technique for measuring electron density under soiled conditions and its application for precise process control

Research Project

Project/Area Number 11558052
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section展開研究
Research Field プラズマ理工学
Research InstitutionChubu University

Principal Investigator

NAKAMURA Keiji  Chubu University, Department of Electrical Engineering, Associate Professor, 工学部, 助教授 (20227888)

Co-Investigator(Kenkyū-buntansha) SUGAI Hideo  Nagoya University, Department of Electrical Engineering, Professor, 大学院・工学研究科, 教授 (40005517)
MATSUOKA Ryosuke  Chubu University, Department of Electrical Engineering, Associate Professor, 工学部, 教授 (10308819)
IKEZAWA Shunjiro  Chubu University, Department of Electrical Engineering, Associate Professor, 工学部, 教授 (60065282)
TAKASUKA Seiichi  Nissin Inc., Manager, Researcher, 技術部・次長(研究職)
TOYODA Hirotaka  Nagoya University, Department of Electrical Engineering, Associate Professor (70207653)
TOYODA Naoki  Nissin Inc., Researcher
Project Period (FY) 1999 – 2001
Project Status Completed (Fiscal Year 2001)
Budget Amount *help
¥8,900,000 (Direct Cost: ¥8,900,000)
Fiscal Year 2001: ¥1,000,000 (Direct Cost: ¥1,000,000)
Fiscal Year 2000: ¥3,500,000 (Direct Cost: ¥3,500,000)
Fiscal Year 1999: ¥4,400,000 (Direct Cost: ¥4,400,000)
KeywordsPlasma absorption probe / Surface wave resonance / Dielectric tube / Sheath / Dispersion relation / Debye length / Fluorocarbon plasma / 膜堆積 / フロンプラズマ / パワー吸収スペクトル
Research Abstract

In a fabrication of sub micron struction for next-generation ULSI devices, extremely stable and controlled plasma sources for various processing such as etching should be developed in order to improve fabrication accuracy. To achieve that, feed-back control of the plasma by monitoring the plasma condition is preferable. In the present reseach, as a conventional but powerful tool for electron density monitoring, we have, developed the "Plasma Absorption Probe" usable even in the process plasma of soiled conditions.
In the probe, surface waves are excited at the probe tip, and a part of RF powers supplied to the probe tip is resonantly absorbed to the plasma through the surface waves at several frequencies. The absorption frequencies directly gives resonant frequency of the surface wave, in turn electron density. Considering the sheath formed around the probe, the probe enables us to measure the electron density in the wide electron density range from 10^<14> m^<-3> to over 10^<18> m^<-3> in actual fluorocarbon etching plasmas.

Report

(4 results)
  • 2001 Annual Research Report   Final Research Report Summary
  • 2000 Annual Research Report
  • 1999 Annual Research Report
  • Research Products

    (30 results)

All Other

All Publications (30 results)

  • [Publications] H.Sugai 他7名: "Electron Energy Distribution Functions and the Influence on Fluorocarbon Plasma Chemistry"Plasma Sources Sience and Technology. 10. 378-385 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K.Nakamura 他1名: "Control of Wall Polymer Deposition and Stabilization of Radical Density in Fluorocarbon Inductively-Coupled Plasmas"Int Symp.Dry Process 2001. 213-218 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K.Nakamura 他4名: "Application of Plasma Absorption Probe to Electron Density Measurements in Magnetized Plasmas"25th Int.Conf Phenomena in Ionized Gases. 273-275 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] M.Ohata 他3名: "Monitoring Electron Density by Plasma Absorption Probe"25th Int Conf.Phenomena in Ionized Gases. 275-277 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K.Nakamura 他3名: "Alternating Ion Bombardment Technique for Wall Surface Control in Depositive Plasma Processing"J.Vac.Sci.Tech A. 137-142 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H.Kokura 他3名: "Plasma Absorption Probe for Measuring Electron Density in an Environment Soiled with Processing Plasma"Jpn J.Appl.Phys). 38. 5262-5266 (1999)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H.Sugai, I.Ghanasheve, M.Hosokawa, K.Mizuno, K.Nakamura, H.Toyoda, K.Yamauchi: "Electron Energy Distribution Functions and the Influence on Fluorocarbon Plasma Chemistry"Plasma Sources Science and Technology. Vol.10. 378-385 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K.Nakamura, N.Kasuya: "Control of Wall Plymer Deposition and Stabilization of Radical Density in Fluorocarbon Inductively-Coupled Plasmas"Int.Symp.Dry Process 2001. 213-218 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K.Nakamura, M.Ohwaki, S.Yoneda, H.Sugai: "Alternating Ion Bombardment Technique for Wall Surface Control in Depositive Plasma Processing"J.Vac.Sci.Tech.A. Vol.18,No.1. 137-142 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K.Nakamura, M.Ohwaki, H.Sugai: "Suppression of Plasma Potential Oscillation and Time-Variation of Radical Density in Alternating Ion Bombardment Method"Dry Process Symp.. 2000. 210 (2005)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H.Kokura, K.Nakamura, I.Ghanashe, H.Sugai: "Plasma Absorption Probe for Measuring Electron Density in an Environment Soiled with Processing Plasma"Jpn J.Appl Phys.. Vol.38. 5262-5266 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K.Nakamura, N.Kasuya, s.Nanko, N.Toyoda, H.Sugai: "Application of Plasma Absorption Probe to Electron Density Measurements in Magnetized Plasmas"Proc.25th Int.Conf.Phenomena in Ionized Gases. Vol.4. 273-275 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] M.Ohta, K.Mizuno, K.Nakamura, H.Sugai: "Monitoring Electron Density by Plasma Absorption Probe"Proc.25th Int.Conf.Phenomena in Ionized Gases. Vol.4. 275-277 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K.Kinoshita, H.Kokura, N.Toyoda, S.Nanko, N.Ozawa, T.Tasumi, M.Matsui, S.Noda, K.Nakamura, H.Sugai: "Spatial Plasma Structure of Dual-Frequency Narrow-Gap RIE Systems Measured by Plasma Absorption Probe"Proc.25th Inc.Conf.Phenomena in Ionized Gases. Vol.2. 77-78 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H.Sugai他7名: "Electron Energy Distribution Functions and the Influence on Fluorocarbon Plasma Chemistry"Plasma Sources Sience and Technology. 10. 378-385 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] K.Nakamura他4名: "Application of Plasma Absorption Probe to Electron Density Measurements in Magnetized Plasmas"Proc. 25th int. Conf. Phenomena in Ionized Gases (July 2001, Japan). 4. 273-275 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] M.Ohata他3名: "Monitoring Electron Density by Plasma Absorption Probe"Proc. 25th Int. Conf. Phenomena in Ionized Gases (July 2001, Japan). 4. 275-277 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] K.Nakamura他1名: "Control of Wall Plymer Deposition and Stabilization of Radical Density in Fluorocarbon Inductively-Coupled Plasmas"Int. Symp. Dry Process 2001 (November 2001, Japan). 213-218 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] 大畑光弘他2名: "プラズマ吸収プローブにおけるシースの影響"電気関係学会東海支部連合大会(2001年11月豊橋). 3 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] 大畑光弘他2名: "プラズマ吸収プローブによる電子密度の高感度・簡易モニタリング"第62回応用物理学会学術講演会(2001年9月豊田). 81 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] 中村圭二 他: "高周波バイアスを用いた高密度プラズマエッチャー内壁における膜堆積抑制"プラズマ・核融合学会誌. 76巻9号. 922-928 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] K.Nakamura 他3名: "High-Energy Secondary Electron Measurement and Its Application to In-situ Ion Flux Monitoring in Plasma Immersion Ion Implantation"XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases(August 2000,Hungary). 350-351 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] 糟谷,中村 他1名: "プラズマ吸収プローブを用いた有磁場プラズマの密度測定"プラズマ科学シンポジウム2001/第18回プラズマプロセシング研究会. 131-132 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] 中村 他2名: "プラズマ吸収プローブを用いた有磁場プラズマの密度測定"第17回プラズマ・核融合学会年会. 63 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] 糟谷,中村 他7名: "プラズマ吸収プローブを用いた有磁場プラズマの電子密度測定"電気関係学会東海支部連合大会. 63 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] 大畑,中村 他1名: "プラズマ吸収プローブを用いた時分解電子密度測定"プラズマ科学シンポジウム2001/第18回プラズマプロセシング研究会. 129-130 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] 中村圭二 他3名: "Plasma Absorption Probe for Measuring Electron Density in an Environment Soiled with Processing Plasmas"Japanese Journal of Applied Physics. 38巻9号. 5262 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 中村圭二 他5名: "Diagnostic of Surface Wave Plasma for Oxide Etching in Comparison with Inductive RF Plasma"Japanese Journal of Applied Physics. 38巻9号. 5256 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 中村圭二 他5名: "High Energy Electrons and Etching Performance in SWP and ICP"24th International Conference on Phenomena in Ionizzed Gases. 1巻. 137 (1999)

    • Related Report
      1999 Annual Research Report
  • [Publications] 中村圭二 他5名: "Wave Modes and EEDF Diagnostics of SWP for Oxide Etching"21st Dry Process Symposium. 1巻. 211 (1999)

    • Related Report
      1999 Annual Research Report

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Published: 1999-04-01   Modified: 2016-04-21  

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