| Project/Area Number |
11558053
|
|---|
| Research Category |
Grant-in-Aid for Scientific Research (B).
|
| Allocation Type | Single-year Grants |
|---|
| Section | 展開研究 |
|---|
| Research Field |
プラズマ理工学
|
|---|
| Research Institution | Osaka University |
|---|
Principal Investigator |
GOTO Seiichi Graduate School of Engineering, Professor, 大学院・工学研究科, 教授 (90029140)
|
|---|
| Co-Investigator(Kenkyū-buntansha) |
KIUCHI Masato Osaka National Research Institute, Senior Researcher, 材料物理部, 主任研究官
YOSHIMURA Satoru Graduate School of Engineering, Osaka University Research Associate, 大学院・工学研究科, 助手 (40294029)
SUGIMOTO Satoshi Graduate School of Engineering, Osaka University, Associate Professor, 大学院・工学研究科, 助教授 (70187665)
NAKAJIMA Yuji Nippon Aluminium, Assistant Manager, 技術研究所, 主任
KIDA Takehisa Koyo Seiko Co., Ltd., Research, 総合技術研究所, 研究員
|
|---|
| Project Period (FY) |
1999 – 2000
|
| Project Status |
Completed (Fiscal Year 2000)
|
| Budget Amount *help |
¥9,300,000 (Direct Cost: ¥9,300,000)
Fiscal Year 2000: ¥3,100,000 (Direct Cost: ¥3,100,000)
Fiscal Year 1999: ¥6,200,000 (Direct Cost: ¥6,200,000)
|
|---|
| Keywords | surface treatment / process plasma / low friction film / inverter / diamond thin films / tribology / pulsed glow plasma / ion assist / ダイヤモンド薄膜 / イオンアシスト |
|---|
| Research Abstract |
An inverter-direct-driving technique has been introduced to a dc glow discharge system in a middle background pressure resion (10^1〜10^3 Pa) obtained with rotary pumps. Because the plasma produced with the developed system has the similar properties as those of dc plasmas basically, we can utilize simple discharge electrodes such as parallel plates that would be extended for large area processing in a low cost. In addition, the plasma driven by the bipolar pulses from the inverter circuit has a charge-up cancellation function that is advantageous to isolated surface treatments.
We have obtained the following results from this research.
1.We produced an Ar plasma at a pressure of 100 Pa between a pair of parallel-plate electrodes. The peak plasma density and temperature were 1〜6×10^<10> cm^<-1> and 2〜6 eV, which indicates that this discharge can be applicable to practical surface treatment and film deposition.
2.Using an asynchronous high-voltage alternating pulsing mode, we have improved the adhesion property of a sputtering thin film under the above middle pressure region.
Next, a diamond-like carbon (DLC) film deposition experiment has been performed. The DLC films have deposited on SUS304 and Si (100) substrates under a pressure of 100〜600Pa (methane) at a deposition rate of 1.5μm/h. The basic characteristics of the DLC films have been estimated with film thickness measurement, micro Vickers hardness test, AFM, FTIR, and Raman Scattering Spectroscopy. As a practical result of a sliding test, we have also observed the decrease of the kinetic friction coefficient between metal parts coated with the DLC films.
|
