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Investigation of Compositional Inhomogeneity in InAlGaN and Realization of Lattice-Matched Quantum Structure by Group-III Nitrides

Research Project

Project/Area Number 11650013
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Applied materials science/Crystal engineering
Research InstitutionToyohashi University of Technology

Principal Investigator

WAKAHARA Akihiro  Toyohashi University of Technology, Faculty of Engineering, Associate Professor, 工学部, 助教授 (00230912)

Co-Investigator(Kenkyū-buntansha) YOSHIDA Akira  Toyohashi University of Technology, Faculty of Engineering, Professor, 工学部, 教授 (20023145)
Project Period (FY) 1999 – 2001
Project Status Completed (Fiscal Year 2001)
Budget Amount *help
¥3,600,000 (Direct Cost: ¥3,600,000)
Fiscal Year 2001: ¥800,000 (Direct Cost: ¥800,000)
Fiscal Year 2000: ¥800,000 (Direct Cost: ¥800,000)
Fiscal Year 1999: ¥2,000,000 (Direct Cost: ¥2,000,000)
KeywordsGroup-III Nitride Alloy / Organometallic Vapor Phase Epitaxy / Compositional Inhomogeneity / 組成不均一 / リモートプラズマ / 有機金属気相エピタキシー
Research Abstract

In order to clarify the compositional inhomogeneity in InAlGaN alloy semiconductor, AlInN layers with various In composition have been grown on GaN epilayer on (0001) oriented sapphire substrate. The composition inhomogeneity was investigated by x-ray diffraction, optical absorption, photoconductivity, and cathodoluminescence measurements. Obtained results are summarized as follows,
1) In solid composition is proportional to the TMIn vapor composition for relatively low In composition, but seems to saturate when the In composition exceeds 0.2.
2) XRD measurements show that the both the linewidth of (0002) and (30-30) diffractions become wider when the In composition exceeds 0.2, and the diffraction peak indicates large tail in low diffraction side meaning the large dispersion of In composition in the AlInN layer.
3) From the photoconductivity measurement, two additional structures are observed at 3.3eV and 3.6eV, suggesting that the layer composed of the at least two kinds of domains with different In composition.
4) From the CL measurements, there are two major luminescence peaks from AlInN layers are observed at 3.0eV and 3.8eV and dependent on the In composition.

Report

(4 results)
  • 2001 Annual Research Report   Final Research Report Summary
  • 2000 Annual Research Report
  • 1999 Annual Research Report
  • Research Products

    (7 results)

All Other

All Publications (7 results)

  • [Publications] A.Wakahara, K.Pak, A.Yoshida, A.Sasaki, S.Harada, S.Sakai: "Growth Temperature and Luminescence Properties of Al_<1-x>In_x(x〜0.1)"Extended Abstract of the 19th Electronic Materials Symposium. 187-189 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] A.Wakahara, H.Saiki, J.Genba, , A.Yoshida: "Low-temperature growth of GaN by remote-plasma enhanced organometallic vapor phase epitaxy"Workbook of the 10th Int. Conf. on Metalorganic Vapor Phase Epitaxy (June 5-9, Sapporo, 2000). 268-269 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] S.I.Kim, M.Nakajima, A.Wakahara, A.Yoshida: "Optical Properties of AlInN Ternary Alloys on GaN Grown by Matelorganic Vapor Phase Epitaxy"Extended Abstract of the 20th Electronic Materials Symposium. 67-68 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] A. Wakahara, K. Pak, A. Yoshida, A. Sasaki, S. Harada, and S. Sakai: "Growth Temperature and Luminescence Properties of Al_<1-x>In_xN (x 〜 0.1)"19th Electronic Materials Symposium (June 28-30, Izu-Nagaoka, 2000) H19, Extended Abstract of the 19th Electronic Materials Symposium. 187-189 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] A. Wakahara, H. Saiki, J. Genba, and A. Yoshida: "Low-temperature growth of GaN by remote-plasma enhanced organometallic vapor phase epitaxy"10th Int. Conf. on Metalorganic Vapor Phase Epitaxy (June 5-9, Sapporo, 2000) P1-37. Workbook of the 10th Int. Conf. on Metalorganic Vapor Phase Epitaxy. 268-269 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] S.I. Kim, M. Nakajima, A. Wakahara, and A. Yoshida: "Optical Properties of AlInN Ternary Alloys on GaN Grown by Matelorganic Vapor Phase Epitaxy"20th Electronic Materials Symposium (June 20-22, Nara, 2001) C12, Extended Abstract of the 20th Electronic Materials Symposium. 67-68 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] A.Wakahara,H.Saiki,J.Genba,and A.Yoshida: "Low-temperature growth of GaN by remote-plasma enhanced organometallic vapor phase epitaxy"J.Crystal Growth. 221. 305-310 (2000)

    • Related Report
      2000 Annual Research Report

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Published: 1999-04-01   Modified: 2016-04-21  

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