Crystal growth and contral of nano-level zinc alloy electrodeposits
| Project/Area Number |
11650745
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Material processing/treatments
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| Research Institution | OKAYAMA UNIVERSITY |
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Principal Investigator |
KONDO Kazuo Engineering, OKAYAMA UNIVERSITY, Associate Professor, 工学部, 助教授 (50250478)
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| Project Period (FY) |
1999 – 2000
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| Project Status |
Completed (Fiscal Year 2000)
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| Budget Amount *help |
¥3,300,000 (Direct Cost: ¥3,300,000)
Fiscal Year 2000: ¥800,000 (Direct Cost: ¥800,000)
Fiscal Year 1999: ¥2,500,000 (Direct Cost: ¥2,500,000)
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| Keywords | Zinc / Electrodeposition / Surface treatment / Crystal growth / nano level |
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| Research Abstract |
Atomic level composite electrodeposition has been investigated with Titania, Silica and chained Silica particles.
1.Incorporation mechanism with Silica ; The author has been investigated the macrostep lateral growth on (00 1)η of zinc electrodepoists. In this investigation, an incorporation mechanism of Silica particles of 50nm on (00 1)η of zinc electrodepoistsis is reported. Silica particles can be classified with random precipitates on the (00 l)η and ordered precipitates at the macrostep edge. The random precipitates are trapped form their bottom by single atomic height steps at the initial absorbed sites. The ordered precipitates at the macrostep edges are trapped from sidewall of macrosteps. Also, we observed many Silica particles on fractured surfaces which are inside of the electrodeposits.
2.Incorporation mechanism with Titania ; The titania particles consist of 10nm diameter smaller particles and 50nm larger particles. 50nm larger particles can be classified with random precipitates on the (00 1)η and ordered precipitates at the macrostep edge. 10nm smaller particles randomly precipitates on the (00 1)η. These smaller particles are trapped form their bottom by the single atomic height steps at their initial absorbed sites. At the initial stage of electrodeposition, only smaller particles are trapped.
3.Incorporation mechanism with chained Silica particles ; Incorporation mechanism of chained Silica particles, multiple Silica particle forming chain, is discussed. The chained particles can be classified with random precipitates on the (00 1)η and ordered precipitates at the macrostep edge. The random chained preoipitates are trapped form their bottom by the single atomic height steps at their initial absorbed sites. The ordered chained precipitates at the macrostep edges are trapped from sidewall of macrosteps. Also, we observed chained particles randomly sticking on the (10 0)η.
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Report
(3 results)
Research Products
(18 results)
