| Project/Area Number |
11650834
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
工業分析化学
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| Research Institution | Seikei University |
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Principal Investigator |
KUDO Masahiro Seikei University, Faculty of Engeineeing, Professor, 工学部, 教授 (10114464)
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| Co-Investigator(Kenkyū-buntansha) |
ICHINOHE Yuji Seikei University, Faculty of Engeineeing, Research Associate, 工学部, 助手 (50286902)
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| Project Period (FY) |
1999 – 2001
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| Project Status |
Completed (Fiscal Year 2001)
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| Budget Amount *help |
¥3,800,000 (Direct Cost: ¥3,800,000)
Fiscal Year 2001: ¥500,000 (Direct Cost: ¥500,000)
Fiscal Year 2000: ¥600,000 (Direct Cost: ¥600,000)
Fiscal Year 1999: ¥2,700,000 (Direct Cost: ¥2,700,000)
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| Keywords | TOF-SIMS / Time-of-Flight SIMS / Polyatomic Ion Source / SF _5^+ / 飛行時間型SIMS |
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| Research Abstract |
In this research project we investigated on the development of the Time-of-Flight SIMS(ToF-SIMS) utilizing a polyatomic ion gun as the primary ion source.
Polyatomic ion sources are regarded quite promising as primary ion gun or sputtering ion gun in secondary ion mass spectrometry since they may increase the secondary ion intensities as well as to decrease the damage caused by the atomic mixing on the sample surface layer. This leads to the expectation of substituting this kind of ion sources to the conventional ion sources such as O_2^+ and Cs^+ In this research project, basic studies were carried out as to the interaction of these polyatomic ions with the sample surfaces, paying special attentions to sputtering phenomena, secondary ion emission and surface chemical changes. As a polyatomic ion source, SF_5^+ was used with such samples as silver films coated on silicon substrates, polycarbonate and polyethyleneterephthalate thin films coated on the silver film, Rohdamine B applied on the silicon substrate and C_<60> powders dispersed on the Indium film. The secondary ion intensities obtained from each sample showed distinct enhancement due to the usage of the SF_5^+ polyatomic primary ion source, compared with the conventional O_2^+ and Ar^+ ion sources. The degree of intensity enhancement, however, could not be explained in a simple manner, but turned out to be significantly dependent on the chemical structures of the sample molecules. It was also confirmed that the surface sensitivity was enhanced when using the polyatomic ion source. It was shown that polyatomic ion sources are quite useful as a primary ion source of the practical secondary ion mass spectrometry through the strict evaluation of the intensity enhancement at tie higher mass region and the negative secondary ion measurement.
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