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Unique optical and electrical properties of silicon-containing heteronanocluster which has three dimensional superlattice structure

Research Project

Project/Area Number 11650917
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field 高分子構造・物性(含繊維)
Research InstitutionTohoku University

Principal Investigator

WATANABE Akira  Tohoku University, Institute for Chemical Reaction Science, Associate Professor, 反応化学研究所, 助教授 (40182901)

Project Period (FY) 1999 – 2000
Project Status Completed (Fiscal Year 2000)
Budget Amount *help
¥2,900,000 (Direct Cost: ¥2,900,000)
Fiscal Year 2000: ¥900,000 (Direct Cost: ¥900,000)
Fiscal Year 1999: ¥2,000,000 (Direct Cost: ¥2,000,000)
Keywordssilicon nanocluster / germanium / organosilicon polymer / quantum size effect / optical and electrical property / emission spectrum
Research Abstract

The novel synthesis and the electrical and optical properties of Si and Ge nanoclusters which have nanometer sized core and organic side chains have been studied. Such clusters are soluble in common organic solvents due to the organic side chains and show semiconducting properties due to the Si and Ge lattices of the nanoclusters. The studies of the new materials designed from the organo-silicon and germanium nanoclusters using a basic unit. The quantum size effect of the organo-silicon and germanium nanoclusters and the formation of Si/Ge heterojunction between Si and Ge nanoclusters are investigated. After the formation of Si and Ge core dispersed in THF, an alkylbromide was added to substituted the SiMgCl and GeMgCl, respectively. The formation of Si-Si, Si-Ge, and Ge-Ge bonds by copolymerization were observed by Raman spectroscopy. By the time-resolved emission spectroscopy, significant quantum size effects were observed in the measurements of emission maxima and emission lifetimes. The organo-silicon and germanium cluster showed a broad emission bands in visible region. The origin of the emission band was discussed based on the time-resolved emission spectra and molecular orbital calculations. The distorted excited state formed around the branching point was assigned as the emission site and the origin the large stokes shift. The decay analysis suggests the energy migration in the Si/Ge nanocluster. The thin film of the organo-silicon and germanium clusters were prepared by spin-coating technique. By heat treatment, plasma irradiation, laser annealing, and so on, the organo-silicon and germanium cluster films can be converted to inorganic Si and Ge films, respectively. Such a technique provides the formation of c-Si, c-Ge, and c-Si/Ge films by coating.

Report

(3 results)
  • 2000 Annual Research Report   Final Research Report Summary
  • 1999 Annual Research Report
  • Research Products

    (13 results)

All Other

All Publications (13 results)

  • [Publications] 渡辺明: "有機・無機の枠を越えた材料設計"高分子加工. 49(6). 251-258 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] Akira Watanabe: "Effect of Hydrogen Plasma Treatment on Formation of Amorphous Silicon Film Using Oragnosoluble Silicon Cluster as a Precursor"Jpn.J.Appl.Phys.. 39. L961-L963 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] Akira Watanabe: "Silicon-Germanium Alloys Prepared by the Heat-Treatment of Silicon Substrate Spin-Coated with Prgano-Soluble Germanium Cluster"Materials Letters. 89. 89-94 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] Akira Watanabe: "Germanium Thin Film by Coating Technique using a Soluble Organogermanium Cluster as a Precursor"Journal of Materials Science Letters. (印刷中). (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] A.Watanabe: "Material Design beyond the border between Organics and Inorganics"Koubunshi Kakou. 49 (6). 251-258 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] A.Watanabe, M.Unno, F.Hojo, and T.Miwa: "Effect of Hydrogen Plasma Treatment on Formation of Amorphous Silicon Film Using Oragnosoluble Silicon Cluster as a Precursor"Jpn.J.Appl.Phys.. 30. L961-L963 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] A.Watanabe, M.Unno, F.Hojo, and T.Miwa: "Silicon-Germanium Alloys Prepared by the Heat-Treatment of Silicon Substrate Spin-Coated with Prgano-Soluble Germanium Cluster"Materials Letters. 89. 89-94 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] A.Watanabe, M.Unno, F.Hojo, and T.Miwa: "Germanium Thin Film by Coating Technique using a Soluble Organogermanium Cluster as a Precursor"J.Materials Sci., Lett. (in press). (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2000 Final Research Report Summary
  • [Publications] 渡辺明: "有機・無機の枠を越えた材料設計"高分子加工. 49(6). 251-258 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] Akira Watanabe: "Effect of Hydrogen Plasma Treatment on Formation of Amorphous Silicon Film Using Oragnosoluble Silicon Cluster as a Precursor"Jpn.J.Appl.Phys.. 39. L961-L963 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] Akira Watanabe: "Silicon-Germanium Alloys Prepared by the Heat-Treatment of Silicon Substrate Spin-Coated with Prgano-Soluble Germanium Cluster"Materials Letters. 89. 89-94 (2001)

    • Related Report
      2000 Annual Research Report
  • [Publications] Akira Watanabe: "Germanium Thin Film by Coating Technique using a Soluble Organogermanium Cluster as a Precursor"Journal of Materials Science Letters. (印刷中). (2001)

    • Related Report
      2000 Annual Research Report
  • [Publications] Akira Watanabe: "Micropatterning of SiO_2 Film using Organosilicon Nanocluster as a Precursor"Thin Solid Film. 354. 13-18 (1999)

    • Related Report
      1999 Annual Research Report

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Published: 1999-04-01   Modified: 2016-04-21  

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