• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to previous page

Unidirectional Solidification of Solar Grade Silicon and lmpurities and Themal Stress Control of the Cast

Research Project

Project/Area Number 11694128
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Metal making engineering
Research InstitutionThe University of Tokyo

Principal Investigator

KAGAWA Yutaka  The University of Tokyo, Institute of industrial Science, Professor (50152591)

Co-Investigator(Kenkyū-buntansha) MAEDA Masahumi  東京大学, Institute of industrial Science, Professor (70143386)
OKABE Tooru  東京大学, Institute of industrial Science, Associate Professor (00280884)
SHIMADA Takehiko  (株)アイアイエスマテリアル, Chief Researcher
池田 貴  東京大学, 生産技術研究所, 助手 (30212773)
Project Period (FY) 1999 – 2001
Project Status Completed (Fiscal Year 2001)
Budget Amount *help
¥8,800,000 (Direct Cost: ¥8,800,000)
Fiscal Year 2001: ¥2,900,000 (Direct Cost: ¥2,900,000)
Fiscal Year 2000: ¥2,700,000 (Direct Cost: ¥2,700,000)
Fiscal Year 1999: ¥3,200,000 (Direct Cost: ¥3,200,000)
Keywordssilicon / solar cell / electron beam melting / vacuum melting / coagulation refinement / simulation / continuous casting / residual stress / 電子b-ム / 応力 / シュミレーション
Research Abstract

It is known that the quality of the silicon ingot made by the casting method is greatly influenced by the residual stress which exists in the material after solidification. However, the correct measuring method for the residual stress and the evaluating method of the result has not been established enough. The object of this research is to examine the measurement of the residual stress and the relation between the generation situation and the casting process in detail by international cooperation. Silicon was continuously cast with a equipment device that was installed in the Institute of Industrial Science, The University of Tokyo. Samples were made with different casting conditions and the residual stress of these silicon ingots were measured by mean of the neutron diffraction in the Canadian National Atomic Energy Research Institute, Chalk River, Canada. Because of the larger size of the crystal grains in the continuous cast silicon ingots, the measurement of the amount of the strai … More n was difficult with the conventional technique. New measurement technique was developed on the Canadian side, in which isotropy was given with rotating the sample while the neutron diffraction was measuring and was applied to the silicon ingot The model for the estimation of the residual stress of the silicon after continuous cast was developed on The University of Tokyo side. With this model, based on the heat conduction equation and the heat of coagulation, the analysis was done with actual process condition as the boundary condition. This result was compared with the experimental result mentioned above and discussed. In addition, for the shortening the calculation time and further establishment of general calculation technique, new version of the analytical approximation method is developing When the new version is completed, it will be possible to apply it for the online process monitoring of the manufacturing of the silicon continuous cast ingot Furthermore, a larger scale equipment were completed, that was not only the scale improvement of the smaller electron-beam equipment, but a number of improvements were made. By the large scaled electron-beam dissolution equipment, which has two electron beams generators and a large size water-cooled copper hearth, the experiments of silicon refining was performed. The experimental result was success of making 30kg class large-scale silicon ingots Less

Report

(4 results)
  • 2001 Annual Research Report   Final Research Report Summary
  • 2000 Annual Research Report
  • 1999 Annual Research Report
  • Research Products

    (23 results)

All 2001 2000 Other

All Journal Article (11 results) Publications (12 results)

  • [Journal Article] Recycling and Material Flow of the World2001

    • Author(s)
      M.Maeda, T.Ikeda
    • Journal Title

      Polymers for Advanced Technologies

      Pages: 388-391

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Journal Article] セラミック-金属接合の自由端近傍の界面に生じる応刀特異性と界面破壊挙動2001

    • Author(s)
      川添敏, 香川豊
    • Journal Title

      431

      Pages: 431-431

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Journal Article] 金属接合体の自由端近傍の界面に生じる応力特異性界面破壊挙動2001

    • Author(s)
      川添敏, 香川豊
    • Journal Title

      日本金属学会第128回金属学会講演概要

      Pages: 431-431

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Journal Article] シリコン中アンチモンの除去2000

    • Author(s)
      池田貴, 西川直樹, 山内則近, 宮崎浩太, 前田正史
    • Journal Title

      日本金属学会講演概要

      Pages: 407-407

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Journal Article] The EB Purification of Silicon2000

    • Author(s)
      T.Ikeda, N.Nishikawa, N.Yamauchi, K.Miyazaki, H.Hattori, Y.Shinoda
    • Journal Title

      Abstract of Electron Beam Melting and refining-state of the art 2000 millennium conference

      Pages: 17-17

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Journal Article] Thermodynamic Study of Molten Si-Ti Alloys2000

    • Author(s)
      S.H.Tabaian, M.Maeda, T.Ikeoa, Y.Ogasawara
    • Journal Title

      Ternperature Materials and Processes, Freund Publishing House vol.19, Nos.3&4

      Pages: 257-264

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Journal Article] Silicon in the World2000

    • Author(s)
      M.Maeda
    • Journal Title

      Proceedings of The Second International Conference on rrocessing materials for Properties (PMP2000) Nov.5-8

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Journal Article] The EB Purification of Silicon2000

    • Author(s)
      Takashi Ikeda, Naoki Nishikawa, Norichika Yamauchi, Kouta Miyazaki, Hiroyasu Hattori, Yoneshige Shinoda, Takehiko Shimada, Masafumi Maeda
    • Journal Title

      Abstract of Electron Beam Melting and refining-state of the art 2000 millennium conference

      Pages: 17-17

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Journal Article] シリコン中アンチモンの除去2000

    • Author(s)
      池田貴, 西川直樹, 山内則近, 宮崎浩太, 前田正史
    • Journal Title

      日本金属学会講演概要,日本金属学会 409

      Pages: 264-264

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Journal Article] Thermodynamic Study of Molten Si-Ti Alloys2000

    • Author(s)
      S.H.Tabaian, M.Maeda, T.Ikeda, Y.Ogasawara
    • Journal Title

      Temperature Materials and Processes(Freund Publishing House) vol.19, Nos.3&4

      Pages: 257-264

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Journal Article] Silicon in the World2000

    • Author(s)
      M.Maeda
    • Journal Title

      Proceedings of The Second International Conference on Processing materials for Properties, Nov.5-8

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] 池田貴, 西川直樹, 山内則近, 宮崎浩太, 前田正史: "シリコン中アンチモンの除去"日本金属学会講演概要. 409 (2000)

    • Related Report
      2001 Annual Research Report
  • [Publications] T.Ikeda, N.Nishikawa, N.Yamauchi, K.Miyazaki, H.Hattori, Y.Shinoda, T.Shimada, M.Maeda: "The EB Purification of Silicon"T.Ikeda, N.Nishikawa, N.Yamauchi, K.Miyazaki, H.Hattori, Y.Shinoda, T.Shimada and M.Maeda. 17 (2000)

    • Related Report
      2001 Annual Research Report
  • [Publications] M.Maeda, T.Ikeda: "Recycling and Material Flow of the World"Polymers for Advanced Technologies, Wiley. 388-391 (2000)

    • Related Report
      2001 Annual Research Report
  • [Publications] S.H.Tabaian, M.Maeda, T.Ikeda, Y.Ogasawara: "Thermodynamic Study of Molten Si-Ti Alloys"High Temperature Materials and Processes. Vol.19, Nos.3&4. 257-264 (2000)

    • Related Report
      2001 Annual Research Report
  • [Publications] M.Maeda: "Silicon in the World"Proceedings of The Second International Conference on Processing materials for Properties. Nov.5-8. (2000)

    • Related Report
      2001 Annual Research Report
  • [Publications] 川添 敏, 香川 豊: "セラミック-金属接合体の自由端近傍の界面に生じる応力特異性と界面破壊挙動"日本金属学会第128回金属学会講演概要. 431 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] 池田貴,西川直樹,山内則近,宮崎浩太,前田正史: "シリコン中アンチモンの除去"日本金属学会講演概要. 409 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] T.Ikeda,N.Nishikawa,N.Yamauchi,K.Miyazaki,H.Hattori,Y.Shinoda,T.Shimada and M.Maeda: "The EB Purification of Silicon"T.Ikeda,N.Nishikawa,N.Yamauchi,K.Miyazaki,H.Hattori,Y.Shinoda,T.Shimada and M.Maeda. 17 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] M.Maeda and T.Ikeda: "Recycling and Material Flow of the World"Polymers for Advanced Technologies,Wiley. 388-391 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] S.H.Tabaian,M.Maeda,T.Ikeda and Y.Ogasawara: "Thermodynamic Study of Molten Si-Ti Alloys"High Temperature Materials and Processes. vol.19,Nos.3&4. 257-264 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] M.Maeda: "Silicon in the World"Proceedings of The Second International Conference on Processing materials for Properties. Nov.5-8. (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] T.Ikeda,T.Shimada.S.L.Cockcroft and M.Maeda: "Refining and Solidification of Silicon"4^<th> Symposium on Advanced Technologies and Process for Metals and Alloys. 98-101 (1999)

    • Related Report
      1999 Annual Research Report

URL: 

Published: 1999-04-01   Modified: 2016-04-21  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi