皮膜内に自然形成するシリカの濃度傾斜構造−表面処理用金属電極の長寿命化への応用−

• Project/Area Number: 11875154
• Research Category: Grant-in-Aid for Exploratory Research
• Allocation Type: Single-year Grants
• Research Field: Material processing/treatments
• Research Institution: The University of Tokyo
• Principal Investigator: 虫明 克彦 東大, 生産技術研究所, 助手 (10092347)
• Project Period (FY): 1999
• Project Status: Completed (Fiscal Year 1999)
• Budget Amount: ¥2,200,000 (Direct Cost: ¥2,200,000); Fiscal Year 1999: ¥2,200,000 (Direct Cost: ¥2,200,000)