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Research on Three Dimensional Micro Structure Fabrication System by Moving X-ray Mask Lithography

Research Project

Project/Area Number 12355008
Research Category

Grant-in-Aid for Scientific Research (A)

Allocation TypeSingle-year Grants
Section展開研究
Research Field 機械工作・生産工学
Research InstitutionRitsumeikan University

Principal Investigator

SUGIYAMA Susumu  Ritsumeikan Univ., Fac. Science and Engineering, Professor, 理工学部, 教授 (20278493)

Co-Investigator(Kenkyū-buntansha) YAMAMOTO Kouji  Minolta Co. Ltd., Dept. of Measuremen Deputy Director, 計測機器事業企画部, 次長
TABATA Osamu  Ritsumeikan Univ., Fac. Science and Engineering, Professor, 理工学部, 教授 (20288624)
山元 廣冶  ミノルタ株式会社, 像情報技術部, 課長(研究職)
小西 聡  立命館大学, 理工学部, 助教授 (50288627)
Project Period (FY) 2000 – 2002
Project Status Completed (Fiscal Year 2002)
Budget Amount *help
¥36,880,000 (Direct Cost: ¥30,100,000、Indirect Cost: ¥6,780,000)
Fiscal Year 2002: ¥6,240,000 (Direct Cost: ¥4,800,000、Indirect Cost: ¥1,440,000)
Fiscal Year 2001: ¥23,140,000 (Direct Cost: ¥17,800,000、Indirect Cost: ¥5,340,000)
Fiscal Year 2000: ¥7,500,000 (Direct Cost: ¥7,500,000)
KeywordsX-Ray / Microfabrication / Three Dimensional / Moving Mask / Micro Lens / LIGA / PTFE / 3次元 / マイクロ / 加工 / 露光 / マイクロプリズム / マイクロノズル
Research Abstract

The purpose of this research is the construction of a microfabrication system and processing technology that realizes the 3-dimensional microstructure with free shaped wall that was not able to realize with the conventional technology. The research project has two objectives ; (1) Construction of the new moving mask X-rays processing system which can produce the 3-dimensional microstructure, and (2) Establishment of the technology to processes the microstructure with submicron order accuracy which has free shaped wall.
The 3-dimensional micro structure processing system with the exposure area of 50 mm x 50 mm and substrate heating capability up to 200 ℃ under the vacuum of 10-^<-4> Pa were developed. Also the control device and program to realize the complicated stage movement by simultaneous control of the multi-stage was developed.
The validity of the system was confirmed by fabricating several microstructures such as a micro lens array with diameter of 100 μm and focal length of 200 μm and a PTFE plate with projection array of 50 μm height and 50 μm pitch.

Report

(4 results)
  • 2002 Annual Research Report   Final Research Report Summary
  • 2001 Annual Research Report
  • 2000 Annual Research Report
  • Research Products

    (79 results)

All Other

All Publications (79 results)

  • [Publications] Osamu Tabata et al.: "Deep X-ray Exposure System with Multistage for 3-D Microfabrication"Transactions of The Institute Electrical Engineers of Japan. 120-E. 321-32+6 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Osamu Tabata et al.: "Moving mask deep X-ray lithography system with multi stage for 3-D Microfabrication"Microsystem Technologies. 8. 93-93 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Osamu Tabata et al.: "Ciliary Motion Actuator using Self-Oscillating Gel"Sensors and Actuators A. 95. 234-238 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Hui You et al.: "Deep X-ray Exposure System with Multistage for 3-D Microfabrication"Journal of Micromechatronics. JMM01-JS001(To be published). (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Osamu Tabata et al.: "μ-CE Chip Fabricated by Moving Mask Deep X-ray Lithography Technology"μ-TAS 2000. 143-146 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Hui You et al.: "Deep X-ray Exposure System with Multistage for 3-D Microfabrication"2000 International Symposium on Micromechatronics and Human Science. 53-58 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Osamu Tabata et al.: "Fabrication of 3 Dimensional Microstructures using Moving Mask Deep X-cay Lithography (M^2LIGA)"IEEE The Fourteenth International Conference on Micro Electro Mechanical Systems. 94-97 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Osamu Tabata et al.: "Ciliary Motion Actuator using Self-Oscillating Gel"IEEE The Fourteenth International Conference on Micro Electro Mechanical Systems. 405-408 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Hui You et al.: "Moving Mask Deep X-ray Lithography System with Multi Stage for 3-D Microfabrication"Fourth International Workshop on High-Aspect-Ratio Micro-Structure Technology. 13-14 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Osamu Tabata et al.: "3D Fabrication by Moving Mask Deep X-ray Lithography (M^2DXL) with Multiple Stages"The Fifteenth IEEE International Conference on Micro Electro Mechanical Systems. 180-183 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Osamu Tabata et al.: "MEMS Research and Education at Ritsumeikan University and 3-D Micro Fabrication Technology using Deep X-ray Lithography"The 4^<th> Korean MEMS Conference. 297-302 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Naoki Matsuzuka et al.: "Algorithm for Analyzing Optimal Mask Movement Pattern in Moving Mask Deep X-ray Lithography"2002 International Symposium on Micromechatronics and Human Science. 159-164 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Osamu Tabata et al.: "Chemo-Mechanical Actuator using Self-Oscillating Gel for Artificial Cilia"IEEE The Sixteenth International Conference on Micro Electro Mechanical Systems. 12-15 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Sadik Hafizovic et al.: "3D X-Ray Lithography and Development Simulation for MEMS"Proc. of the 12^<th> Int. Conf. On Solid-State Sensors, Actuators and Microsystems. (To be presented). (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Naoki Matsuzuka et al.: "Effect of Development Process in Moving Mask Deep X-ray Lithography for 3D Microfabrication"Proc. of the High Aspect Ratio Micro Structures. (To be presented). (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Yoshikazu Hirai et al.: "Measurement of PMMA Dissolution Rate and System Calibration for Predictive 3-D Simulation of Moving Mask Deep X-Ray Lithography"Proc. of the High Aspect Ratio Micro Structures. (To be presented). (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Yushi Nakamura et al.: "Moving Mask Direct Photo-Etching (M^2DPE) for 3-D Micromachining of Polytetrafluoroethylene"Proc. of the High Aspect Ratio Micro Structures. (To be presented). (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Kenichi Enami et al.: "μ-CAE Chip Fabricated by Moving Mask Deep X-ray Lithography, Electroplating, Hot Embossing and UV Adhesive Bonding"The 17th Sensor Symposium. 101-106 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] 松塚直樹他: "移動マスクX線露光法を用いた3次元マイクロ加工"レーザー学会第279回研究会. 6-11 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Hui You et al.: "Moving Mask Deep X-ray Lithography System with Multi Stage for 3D Microfabrication"The 18th Sensor Symposium. 73-76 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] 田畑 修: "シンクロトロン放射X線を用いた三次元マイクロ加工"日本機械学会東海支部第92回講演会. 31-37 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] 杉山 進: "放射光リソグラフィーによる三次元マイクロマシンの製作"第20回メカトロニクスフォーラム/IEEE四国フォラム. 14-23 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] 杉山 進: "放射光リソグラフィーによる三次元マイクロマシンの製作"「商業化を目指した微細加工のキーテクノロジーとテクノリンケージ」精密工学会他共催. 6-15 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] 杉山 進: "SR光を用いた三次元マイクロ加工(SMILE)とマイクロマシニング・試作サービス(MICS)"日本機械学会関西支部・東海支部合同企画第34回座談会資料. 33-40 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Naoki Matsuzuka et al.: "Determination of Optimal Mask Movement Pattern for Moving Mask Deep X-cay Lithography"The 19th Sensor Symposium. 257-261 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] 杉山 進: "シンクロトロン放射(SR)光リソグラフィーによる三次元微細構造の製作と応用"化学とマイクロシステム研究会. 1-6 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] 杉山 進: "シンクロトロン放射光リソグラフィを用いたマイクロファプリケーション技術"第78回ラドテック研究会講演会. 1-10 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] 平井義和他: "X線応用3次元加工用シミュレーションシステムの開発"マイクロマシン・センサシステム研究会. 65-70 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] 田畑 修: "LIGAプロセス-X線応用3次元微細加工プロセス-"ナノテクノロジーのすべて. 70-73 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] 田畑 修: "X線を利用したマイクロ・ナノ加工技術とその応用"砥粒加工学会学会誌. 278-281 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Osamu Tabata et al.: "Deep X-ray Exposure System with Multistage for 3-D Microfabrication"Transactions of The Institute Electrical Engineers of Japan. Vol. 120-E. 321-326 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] O. Tabata, H. You, N. Matsuzuka, T. Yamaji, S. Uemura, I. Dama: "Moving Mask Deep X-ray Lithography System with Multi Stage for 3-D Microfabrication"Microsystem Technologies. Vol.8. 93-98 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Tabata, H. Hirasawa, S. Aoki, R. Yoshida, E. Kokufuta: "Ciliary Motion Actuator using Self-Oscillating Gel"Sensors and Actuators A. Vol.95. 234-238 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Hui You et al.: "Deep X-ray Exposure System with Multistage for 3-D Microfabrication"Journal of Micromechatronics. Vol. JMM01-JS001, (to be published). (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Osamu Tabata et al.: "μ-CE chip Fabricated by Moving Mask Deep X-ray Lithography Technology"μ-TAS 2000 (Nara, November). 143-146 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Hui You et al.: "Deep X-ray Exposure System with Multistage for 3-D Microfabrication"2000 International Symposium on Micromechatronics and Human Science (Nagoya, August). 53-58 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Osamu Tabata et al.: "Fabrication of 3-Dimensional Microstructures using Moving Mask Deep X-ray Lithography (M^2LIGA)"IEEE The Fourteenth International Conference Micro Electro Mechanical Systems (Interlaken, January). 94-97 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Osamu Tabata et al.: "Ciliary Motion Actuator using Self-Oscillating Gel"IEEE The Fourteenth International Conference on Micro Electro Mechanical Systems (Interlaken, January). 405-408 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Hui You et al.: "Moving Mask Deep X-ray Lithography System with Multi Stage for 3-D Microfabrication"Fourth International Workshop on High-Aspect-Ratio Micro-Structure Technology (Baden-Baden, June). 13-14 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Osamu Tabata et al.: "3D Fabrication by Moving Mask Deep X-ray Lithography (M^2DXL) with Multiple Stages"The Fifteenth IEEE International Conference on Micro Electro Mechanical Systems, (Las Vegas, January). 180-183 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] O. Tabata: "MEMS Research and Education at Ritsumeika University and 3-D Micro Fabrication Technology using Deep X-ray Lithography"The 4^<th> Korean MEMS Conference (Kyongju, April). 297-302 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] N. Matsuzuka and O. Tabata: "Algorithm for Analyzing Optimal Mask Movement Pattern in Moving Mask Deep X-ray Lithography"International Symposium on Micromechatronics and Human Science (Nagoya, October). 159-164 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] O. Tabata, H. Kojima, T. Kasatani, Y. Isono and R. Yoshida: "Chemo-Mechanical Actuator using Self-Oscillating Gel for Artificial Cilia"IEEE The Sixteenth International Conference on Micro Electro Mechanical Systems (Kyoto, January). 12-15 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] S. Hafizovi, Y. Hirai, O. Tabata and J. G. Korvink: "X3D : 3D X-Ray Lithography and Development Simulation for MEMS"Proc. Of the 12^<the> Int. Conf. On Solid-State Sensors, Actuators and Microsystems. (to be presented). (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] N. Matsuzuka, Y. Hirai, O. Tabata, S. Hafizovic and J. G. Korvink: "Effect of Development Process in Moving Mask Deep X-ray Lithography for 3D Microfabrication"Proc. Of the High Aspect Ratio Micro Structures. (to be presented). (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Y. Hirai, O. Tabata, S. Hafizovic and J. G. Korvink: "Measurement of PMMA Dissolution Rate and System Calibration for Predictive 3-D Simulation of Moving Mask Deep X-Ray Lithography"Proc of the High Aspect Ratio Micro Structures. (to be presented). (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Y. Nakamura, S. Uemura, K. Okajima and O. Tabata: "Moving Mask Direct Photo-Etching (M2DPE) for 3-D Micromachining of Polytetrafluoroethylene"Proc. Of the High Aspect Ratio Micro Structures. (to be presented). (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Kenichi Enami et al.: "μ-CAE Chip Fabricated by Moving Mask Deep X-ray Lithography, Electroplating, Hot Embossing and UV Adhesive Bonding"The 17th Sensor Symposium, (Tokyo, June). 101-106 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Naoki Matuzuka et al.: "3-D Microfabrication technology using Moving Mask Deep X-ray Lithography"The 279^<th> meeting, Institute of Laser, (Tokyo, June). 6-11 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Hui You et al.: "Moving Mask Deep X-ray Lithography System with Multi Stage for 3-D Microfabrication"The 18th Sensor Symposium, (Tokyo, June). 73-76 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Osamu Tabata: "3-D Microfabrication Technology using Synchrotron Radiated Deep X-ray Lithography"The 92th Seminar, ASME Tokai-branch, (Nagoya). 31-37 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Susumu Sugiyama: "3-D Micromachine Fabrication using Synchrotron Radiated X-ray Lithography"The 20th Mechatronics Forum. 14-23 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Susumu Sugiyama: "3-D Micromachie Fabrication using Synchrotron Radiated X-ray Lithography"Japan Society for Precision Engineering et al.. 6-15 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Susumu Sugiyama: "3-D Microfabrication using Synchrotron Radiated X-ray (SMILE) and Micromachining Prototyping service (MICS)"Joint Seminar of JSME Kansai & Tokai. 33-40 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Naoki Matsuzuka et al.: "Determination of Optimal Mask Movement Pattern for Moving Mask Deep X-ray Lithography"The 19th Sensor Symposium, (Kyoto, June). 257-261 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Susumu Sugiyama: "3-D Microfabrication using Synchrotrons Radiated X-ray Lithography and its Application"Chemistry and Microsystem, (Kyoto). 1-6 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Susumu Sugiyama: "Microfabrication Technology using Synchrotron Radiated X-ray Lithography and its Application"The 789th Radotech Meeting, (Kyoto). 1-6 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Yoshikazu Hirai et al.: "Development of Simulation System for 3-D Microfabrication using Synchrotron Radiated X-ray Lithography"The IEEJ Meeting of Micromachine and Sensor System, (Tokyo, November). 65-70 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Osamu Tabata: "LIGA Process -3-D Microfabrication using Synchrotron Radiated X-ray Lithography-"Nanotechnology. 70-73 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Osamu Tabata: "Micro/Nano Fabrication Technology using Synchrotron Radiated X-ray and its Application"The Japan Society for Abrasive Technology. 278-281 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Hui You et al.: "Deep X-ray Exposure System with Multistage for 3-D Microfabrication"Journal of Micromechatronics. JMM01-JS001 (To be published). (2003)

    • Related Report
      2002 Annual Research Report
  • [Publications] Osamu Tabata et al.: "Moving mask deep X-ray lithography system with multi stage for 3-D Microfabrication"Microsystem Technologies. 8. 93-98 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] Naoki Matsuzuka et al.: "Algorithm for Analyzing Optimal Mask Movement Pattern in Moving Mask Deep X-ray lithography"Micromechatronics and Human Science. 159-164 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] Osamu Tabata et al.: "3-D Micro Fabrication Technology using Deep X-Ray Lithography"Proc. of the Korea Micro Electro Mechanical Systems Workshop. 297-302 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] Naoki Matsuzuka et al.: "3D Fabrication by Moving Mask Deep X-ray lithography (M^2DXL) with Multiple Stages"Proc. of the 15th IEEE International Conference on Micro Electro Mechanical Systems. 180-183 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] Osamu Tabata et al.: "Chemo-Mechanical Actuator using Self-Oscillating Gel for Artificial Cilia"Proc. of the 16th Annual Int. Conf. on Micro Electro Mechanical Systems. 12-15 (2003)

    • Related Report
      2002 Annual Research Report
  • [Publications] Yushi Nakamura et al.: "Oving Mask Direct Photo-Etchning (M2DPE) for 3-D Micromachining of Polytetrafluoroethylene"Proc. of the High Aspect Ratio Micro Structures. (To be presented). (2003)

    • Related Report
      2002 Annual Research Report
  • [Publications] Yoshikazu Hirai et al.: "Measurement of PMMA Dissolution Rate and System Calibration for Predictive 3-D Simulation of Moving Mask Deep X-Ray Lithography"Proc. of the High Aspect Ratio Micro Structures. (To be presented). (2003)

    • Related Report
      2002 Annual Research Report
  • [Publications] Naoki Matsuzuka et al.: "Effect of Development Process in Moving Mask Deep X-ray Lithography for 3D Microfabrication"Proc. of the High Aspect Ratio Micro Structures. (To be presented). (2003)

    • Related Report
      2002 Annual Research Report
  • [Publications] Sadik Hafizovic et al.: "X3D:3D X-Ray Lithography and Development Simulation for MEMS"Proc. of the 12^<th> Int. Conf. On Solid-State Sensors, Actuators and Microsystems. (To be presented). (2003)

    • Related Report
      2002 Annual Research Report
  • [Publications] 田畑 修: "砥粒加工学会学会誌"X線を利用したマイクロ・ナノ加工技術とその応用. 278-281 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] Osamu Tabata: "Ciliary Motion Actuator using Self-Oscillating Gel"Sensors and Actuators. 95. 234-238 (2001)

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  • [Publications] Osamu Tabata: "3D Fabrication By Moving Mask Deep X-ray Lithography (M^2DXL) with Multiple Stages"The 15th Annual Int. Conf. On Micro Electro Mechinical Systems. 180-183 (2002)

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  • [Publications] Hui You: "Moving Mask Deep X-ray Lithography System with Multi Stage for 3-D Microfabrication"High Aspect Ratio Micro Structures Technology. 13-14 (2001)

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  • [Publications] Hui You: "Moving Mask Deep X-ray Lithography System with Multi Stage for 3-D Microfabrication"18th Sensor Symposium. 73-76 (2001)

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  • [Publications] 工業調査会: "LIGAプロセス -X線応用3次元微細加工プロセス-"図解ナノテクノロジーの全て. 70-73 (2001)

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  • [Publications] Osamu Tabata et al.: "3-Dimensional Microstructure Fabrication Using Multiple Moving Mask Deep X-Ray Lithography"The Transaction E of The Institute of Electrical Engineering of Japan. Vol.120E No.7. 321-326 (2000)

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  • [Publications] Hui You et al.: "Deep X-ray Exposure System with Multistage for 3-D Microfabrication"Micromechatronics and Human Science. 53-58 (2000)

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  • [Publications] Osamu Tabata et al.: "Fabrication of 3-Dimensional Microstructures using Moving Mask Deep X-ray Lithography(M^2DXL)"The 14th Annual Int.Conf.On Micro ElectroMechinical Systems. 94-97 (2000)

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Published: 2000-04-01   Modified: 2016-04-21  

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