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Development of silica glass for 157nm photolithography

Research Project

Project/Area Number 12355025
Research Category

Grant-in-Aid for Scientific Research (A)

Allocation TypeSingle-year Grants
Section展開研究
Research Field Inorganic materials/Physical properties
Research InstitutionToyota Technological Institute

Principal Investigator

IKUSHIMA Akira J.  Graduated School of Engineering, Toyota Technological Institute, Professor, 大学院・工学研究科, 教授 (10029415)

Co-Investigator(Kenkyū-buntansha) SHIMODAIRA Akinori  Semiconductor Devices and Material Division, Asahi Glass Co. Ltd., Researcher, 材料解析グループ, 主任研究員
MATSUMOTO Kiyoshi  Semiconductor Devices and Material Division, Asahi Glass Co. Ltd., Group Leader, 材料解析グループ, グループリーダー
SAITO Kazuya  Graduated School of Engineering, Toyota Technological Institute, Associate Professor, 大学院・工学研究科, 助教授 (20278394)
Project Period (FY) 2000 – 2001
Project Status Completed (Fiscal Year 2001)
Budget Amount *help
¥20,120,000 (Direct Cost: ¥19,400,000、Indirect Cost: ¥720,000)
Fiscal Year 2001: ¥3,120,000 (Direct Cost: ¥2,400,000、Indirect Cost: ¥720,000)
Fiscal Year 2000: ¥17,000,000 (Direct Cost: ¥17,000,000)
KeywordsGlass materials / 2nd-order optical nonlinearity / Poling / Optical wave guide / Optical fiber / Photonics
Research Abstract

The purpose of this research project is to develop silica glass for 157 nm photolithography, which is a promising process for ULSI in the next generation. The results are summarized as follows:
(1) Remarkable advances have been achieved in the understanding of the absorption edge of silica glass. This knowledge is very useful to develop silica glass with wide transparent VUV region.
(2) Effects of F on the transparency in VUV region have been revealed.
(3) Inner transmittance at 157 nm could be increased over 93%.
(4) The effect of F2 laser irradiation on increasing temperature and hence decreasing transparency can be estimated from a model calculation.
(5) A method for measuring accurate VUV absorption edge in silica glass has been established.

Report

(3 results)
  • 2001 Annual Research Report   Final Research Report Summary
  • 2000 Annual Research Report
  • Research Products

    (22 results)

All Other

All Publications (22 results)

  • [Publications] K.Saito, A.J.Ikushima: "Absorption edge in silica glass"Phys.Rev.B. 62. 8584-8587 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] A.J.Ikushima, T.Fujiwara, K.Saito: "Silica glass: A material for photonics"J.Appl.Phys.(Appl.Phys.Rev.). 88. 1201-1213 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K.Saito, N.Ogawa, A.J.Ikushima, Y.Tsurita, K.Yamahara: "Effects of aluminum impurity on the structural relaxation I silica glass"J.Non-Cryst, Solids. 270. 60-65 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K.Saito, A.J.Ikushima: "Effects of fluorine on structure, structural relaxation, and absorption edge in silica glass"J.Appl.Phys.. 91. 4886-4890 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] N.Shimodaira, K.Saito, A.J.Ikushima: "Raman Spectra of fluorine-doped silica glasses with various fictive"J.Appl.Phys.. 91. 3522-3525 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H.Kakiuchida, K.Saito, A.J.Ikushima: "Local structural relaxation around OH in silica glass"Jpn.J.Appl.Phys.. 41(Accepted). (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] M.Yamaguchi, K.Saito, A.J.Ikushima: "Formation and relaxation processes of photo-induced defects in a Ge-doped SiO_2 glass"Phys.Rev.B. (submitted). (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K. Saito and A. J. Ikushima: "Absorption edge in silica glass"Phys. Rev.. B62. 8584-8587 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] A. J. Ikushima, T. Fujiwara and K. Saito: "Silica glass: A material for photonics"J. Appl. Phys. (Appl. Phys. Rev.). 88. 1201-1213 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K. Saito, N. Ogawa, A. J. Ikushima, Y. Tsurita, K. Yamahara: "Effects of aluminum impurity on the structural relaxation in silica glass"J. Non-Cryst. Solids. 270. 60-65 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K. Saito and A. J. Ikushima: "Effects of fluorine on structure, structural relaxation, and absorption edge in silica glass"J. Appl. Phys.. 91. 4886-4890 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] N. Shimodaira, K. Saito and A. J. Ikushima: "Raman Spectra of fluorine-doped silica glasses with various fictive"J. Appl. Phys.. 91. 3522-3525 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] H. Kakiuchida, K. Saito and A. J. Ikushima: "Local structural relaxation around OH in silica glass"Jpn. J. Appl. Phys.. 41 (accepted). (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] M. Yamaguchi, K. Saito and A. J. Ikushima: "Formation and relaxation processes of photo-induced defects in Ge-doped Si_2a glass"Phys. Rev. B. (submitted). (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] N.Shimodaira, K.Saito, A.J.Ikushima: "Raman Spectra of fluorine-doped silica glasses with various fictive"J. Appl. Phys.. 91. 3522-3525 (2002)

    • Related Report
      2001 Annual Research Report
  • [Publications] K.Saito, A.J.Ikushima: "Effects of Flourince on Structure, Structural Relaxation and Absorption Edge in Silica Glass"J. Appl. Phys.. 91. 4886-4890 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] H.Kakiuchida, K.Saito, A.J.Ikushima: "Local structural relaxation around OH in silica glass"Jpn. J. Appl. Phys.. (Accepted). (2002)

    • Related Report
      2001 Annual Research Report
  • [Publications] K.Saito: "Absorption edge in silica glass"Phys.Rev.B. 62・13. 8584-8587 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] A.J.Ikushima: "Silica Glass-A material for photonics-"J.Appl.Phys.. 88・3. 1201-1213 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] K.Saito: "Effects of Alions on the Structural Relaxation in Silica Glass"J.Non-Cryst.Solids. 270. 60-65 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] N.Shimodaira: "VUV transmittance of fused silica glass influenced by thermal disorder"SPIE Proceedings on Optical Microlithography XIII. 1553-1559 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] K.Saito: "Structural disorder and optical properties in silica glass"Proceedings of 25th Australian Conference on Optical Fiber Technology. 57-58 (2000)

    • Related Report
      2000 Annual Research Report

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Published: 2000-04-01   Modified: 2016-04-21  

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