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Systematic survey and property control of high-dielectric-constant thin films for gate insulators of next generation MOSFETs

Research Project

Project/Area Number 12450121
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionTOHOKU UNIVERSITY (2002)
Tokyo Institute of Technology (2000-2001)

Principal Investigator

TOKUMITSU Eisuke  Tohoku University, Research Institute of Electrical Communication, Associate Professor, 電気通信研究所, 助教授 (10197882)

Co-Investigator(Kenkyū-buntansha) OHMI Shun-ichiro  Tokyo Institute of Technology, Interdisciplinary Graduate School of Science and Engineering, Associate Professor, 大学院・総合理工学研究科, 助教授 (30282859)
Project Period (FY) 2000 – 2002
Project Status Completed (Fiscal Year 2002)
Budget Amount *help
¥15,900,000 (Direct Cost: ¥15,900,000)
Fiscal Year 2002: ¥4,600,000 (Direct Cost: ¥4,600,000)
Fiscal Year 2001: ¥4,600,000 (Direct Cost: ¥4,600,000)
Fiscal Year 2000: ¥6,700,000 (Direct Cost: ¥6,700,000)
Keywordshigh-dielectric-constant (high-K) material / gate insulator / MOSFET / metalorganic chemical vapor deposition (MOCVD) / molecular beam deposition (MBD) / HfO_2 / La_2O_3 / ゾルゲル法 / HfO_2 / La_2O_3 / ZrO_2 / SrZrO_3
Research Abstract

The objective of this study is to obtain high-dielectric-constant (high-k) thin films on Si which have an SiO_2 equivalent oxide thickness (EOT) of less than 2 nm for gate insulator application of next generation MOSFETs. First, various high-k thin films, such as ZrO_2, HfO_2, CeO_2, Y_2O_3, La_2O_3, Pr_2O_3, Sm_2O_3 and so on, were fabricated on Si substrate by the molecular beam deposition (MBD) technique and characterized. For HfO_2 and La_2O_3 thin films, EOT values of 0.88 nm and 1.5 nm were obtained, respectively. It was also found that the La_2O_3 film was easily damaged by the humidity in the air. Hence, to suppress this damage, gate electrodes were fabricated as soon as the La_2O_3 film was deposited. With this technique, we fabricated MOSFETs using a La_2O_3 gate insulator which had an EOT of 0.88 nm. Normal transistor operation was confirmed for the fabricated devices. Next, metalorganic chemical vapor deposition (MOCVD) technique was developed for HfO_2 thin films growth on Si substrates. Hf[N(CH_3)_2]_4 and Hf[N(C_2H_5)_2)]_4 which contain no oxygen nor chlorine as well as conventional Hf(O-t-C_4H_9)_4 were used as Hf precursors. Either O_2 or H_2O was used as an oxidant gas. We fabricated HfO_2 thin films on Si substrates by alternatively introducing Hf precursor and oxidant gas and found that the residual impurity concentrations and leakage current density are much lower for the HfO_2 films fabricated with H_2O than HfO_2 films fabricated with O_2. An EOT of the HfO_2 films grown with Hf[N(C_2H_5)_2]_4 and H_2O was as small as 1.8 nm and the leakage current density of the films at 1 V is less than 10^<-5> A/cm^2.

Report

(4 results)
  • 2002 Annual Research Report   Final Research Report Summary
  • 2001 Annual Research Report
  • 2000 Annual Research Report
  • Research Products

    (29 results)

All Other

All Publications (29 results)

  • [Publications] Kenji Takahashi: "Characterization of HfO_2 Films Grown on Silicon Substrates by Metal-Organic Chemical Vapor Deposition"Applied Surface Science. (印刷中). (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Takuya SUZUKI: "Characterization of Metal-Ferroclectric-Metal-lnsulator-Semiconductor (MFMIS) Structures Using (Bi, La)_4Ti_3O_<12> and HfO_2 Buffer Layers"Jpn.J.Appl.Phys.. Vol.41 Part 1,No.11B. 6886-6889 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Eisuke Tokumitsu: "Ferroelectric-Gate Structures and Field-Effect Transistors Using (Bi, La)_4Ti_3O_<12> Films"Materials Research Society Symp.Proc.. Vol.688 Paper C4.1. 67-72 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Eisuke Tokumitsu: "Low Voltage Operation of Nonvolatile Metal-Ferroelectric-Metal-Insulator-Semiconductor(MFMIS)-Field-Effect-Transistors(FETs) Using Pt/SrBi_2Ta_2O_9/Pt/SrTa_2O_6SiON/Si Structures"Jpn.J.Appl.Phys.. Vol.40 Part 1,No.4B. 2917-2922 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Shogo Imada: "Ferroelectricity of YMnO_3 Thin Films on Pt(111)/AL_2O_3(0001) and Pt(111)/Y_2O_3(111)/Si(111)_structures_grown by Molecular Beam Epitaxy"Jpn.J.Appl.Phys.. Vol.40 Part 1,No.2A. 666-671 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Eisuke Tokumitsu: "Characterization of Metal-Ferroeletric-(Metal-)Insulator-Semiconductor(MF(M)IS)Structures Using (Pb, La)(Zr,Ti)O_3 and Y_2O_3 Films"Jpn.J.Appl.Phys.. Vol.39 Part 1,No.9B. 5456-5459 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Kenji Takahashi: "Characterization of HFO_2 Films Grown on Silicon Substrates by Metal-Organic Chemical Vapor Deposition"Applied Surface Science. to be published. (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Takuya SUZUKI: "Characterization of Metal-Ferroelectric-Metal-Insulator-Semiconductor(MFMIS) Structures Using(Bi, La)_4Ti_3O_<13> and HfO_2 Buffer Layers"Jpn. J. Appl. Phys.. Vol.41, Part 1, No.11B. 6886-6889 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Eisuke Tokumitsu: "Ferroelectric-Gate Structures and Field-Effect Transistors Using (Bi,La)_4Ti_3O_<12> Films"Materials Research Society Symp. Proc.. Vol.688, Paper C4.1. 67-72 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Eisuke Tokumitsu: "Low Voltage Operation of Nonvolatile Metal-Ferroelectric-Metal-Insulator-Semiconductor (MFMIS)-Field-Effect-Transistors(FETs)Using Pt/SrBi_2Ta_2O_9/Pt/SrTa_2O_6/SiON/Si Structures"Jpn. J. Appl. Phys.. Vol.40, Part 1, No.4B. 2917-2922 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Shogo Imada: "Ferroelectricity of YMnO_3 Thin Films on Pt(111)/AL_2O_3(0001) and Pt(111)/Y_2O_3(111)/Si(111) structures grown by Molecular Beam Epitaxy"Jpn. J. Appl. Phys.. Vol.40, Part 1, No.2A. 666-671 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Eisuke Tokumitsu: "Characterization of Metal-Ferroelectric-(Metal-)Insulator-Semiconductor(MF(M)IS) Structures Using (Pb,La)(Zr,Ti)O_3 and Y_2O_3 Films"Jpn. J. Appl. Phys.. Vol.39, Part 1, No.9B. 5456-5459 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Takuya SUZUKI: "Characterization of Metal-Ferroelectric-Metal-Insulator-Semiconductor (MFMIS) Structures Using (Bi, La)_4Ti_3O_<12> and HfO_2 Buffer Layers"Jpn. J. Appl. Phys.. Vol.41 Part1, No.11B. 6886-6889 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] Naoki SUGITA: "Characterization of Sol-gel Derived Bi_<4-1>LaxTi_3O_<12> Films"Jpn. J. Appl. Phys.. Vol.41 Part1, No.11B. 6810-6813 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] Eisuke Tokumitsu: "Ferroelecric-Gate Structures and Field-Effect Transistors Using (Bi, La)_4Ti_3O_<12> Films"Materials Research Society Symp. Proc.. Vol.688 Paper C4.1. 67-72 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] Eisuke Tokumitsu: "Characterization of HfO_2 Films Grown on Silicon Substrates by Metal-Organic Chemical Vapor Deposition"Applied Surface Science. (印刷中). (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] E.Tokumitsu: "Sm DOPING EFFECTS ON ELECTRICAL PROPERTIES OF SOL-GEL DERIVED SrBi_2Ta_2O_9 FILMS"Materials Research Society Symp. Proc.. (印刷中). (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] EISUKE TOKUMITSU: "PREPARATION OF Sr_2(Ta, Nb)_2O_7 FILMS BY THE SOL-GEL TECHNIQUE FOR FERROELECTRIC-GATE STRUCTURES s"Ferroelectrics. Vol.271. 105-110 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] E.Tokumtsu, T.Suzuki: "Use of High-k La_2O_3 Layers in the MFMIS Applications"Materials Research Society, Fall Meetings. Paper C2.4.. (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] S.Ohmi, C.Kobayashi, K.Aizawa, S.Yamamoto, E.Tokumitsu, H.Ishiwara, H.Iwai: "High quality Ultrathin Lg_2O_3 Films for High-k Gate Insulator"31st European Solid-State Device Research Conference. (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] S.Ohmi, C.Kobayashi, E.Tokumitsu, H.Ishiwara, H.Iwai: "Low Leakage Lg_2O_3 Gate Insulator Film with EOTs of 0.8-1.2nm"2001 International conference on Solid State Devices and Materials. (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] E.Tokumitsu, K.Okamoto, H.Ishiwara: "Low Voltage Operation of Nonvolatile Metal-Ferroelectric-Metal-Insulator-Semiconductor (MFMIS)-Field-Effect-Transistors(FETs) Using Pt/SrBi_2Ta_2O_9/Pt/SrTa_2O_6/SiON/Si Structures"Jpn. J. Appl. Phys.. Vol.40 Part 1, No.4B. (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] 徳光永輔: "酸化物エレクトロニクス(分担):アドバンスト エレクトロニクスI-22"培風館. 43 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] E.Tokumitsu,D.Takahashi and H.Ishiwara: "Characterization of Metal-Ferroelectic-(Metal-)Insulator-Semiconductor(MF(M)IS)Structures Using(Pb,La)(Zr,Ti)O_3 and Y_2O_3Films"Jpn.J.Appl.Phys.. Vol.39 Part1,No.9B. 5456-5459 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] S.M.Yoon,E.Tokumitsu and H.Ishiwara: "Ferroelectric Neuron Integrated Circuits using SrBi_2Ta_2O_9-Gate FET's and CMOS Schmitt-Trigger Oscillators"IEEE Transactions on Electron Devices. Vol.47 No.8. 1630-1635 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] E.Tokumitsu,G.Fujii and H.Ishiwara: "Electrical Properties of Metal-Ferroelectric-Insulator-Semiconductor(MFIS)-and Metal-Ferroelectric-Metal-Insulator Semiconductor(MFMIS)-FETs"Jpn.J.Appl.Phys.. Vol.39 Part1,No.4B. 2125-2130 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] S.Yoon,E.Tokumitsu and H.Ishiwara: "Improvement of Memory Retention Characteristics in Ferroelectric Neuron Circuits Using a Pt/SrBi_2Ta_2O_9/Pt/Ti/SiO_2/Si Structure"Jpn.J.Appl.Phys.. Vol.39 Part1,No.4B. 2119-2124 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] 大島享介,徳光永輔: "ゾルゲル法によるZrO_2、SrZrO_3薄膜の作製と評価"電子情報通信学会技報. SDM2000-179. 79-84 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] E.Tokumitsu,K.Okamoto and H.Ishiwara: "Low Voltage Operation of Nonvolatile Metal-Ferroelectric-Metal-Insulator-Semiconductor(MFMIS)-FETs Using Pt/SrBi2Ta2O9/Pt/SrTa2O6/SiON/Se Structures"Jpn.J.Appl.Phys.. April. (2001)

    • Related Report
      2000 Annual Research Report

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Published: 2000-04-01   Modified: 2016-04-21  

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