| Budget Amount *help |
¥15,000,000 (Direct Cost: ¥15,000,000)
Fiscal Year 2001: ¥7,100,000 (Direct Cost: ¥7,100,000)
Fiscal Year 2000: ¥7,900,000 (Direct Cost: ¥7,900,000)
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| Research Abstract |
In this project, we performed an establishment of novel microscale surface treatment/processing technology with ultrta-small plasma beam as followed.
(1) We generated various type small beam plasmas ranging from 2mm to 25μmφusing dc, ac, and VHF plasma generator. Especially, thermoelectron enhancede micrometer-scale plasma (TEMP), which had been proposed and developed by our group made it easy to generate a small size plasma. Examples of typical performances were as follows: (A) small size (from 2mm to 25μmφ). (B) multi probes (six). (C) low sustain power (1W).
(2) The various plasmas (gas : N2, O2, Ar, power : 0.1-30W, gas flow : 0-1000sccm, preasure : 7600-40torr) were characterized by optical emission spectroscopy, which shows the various plasma conditions, such as typical plasma temperatures of three plasmas, namely as thermal, cold, and interface plasma. For instance, the gas temperature of Ar gas at 760torr was about 4000-5000K.
(3) Using these ultra-small plasma beam, we succeeded various micro-processing as follows : (A) melting of metal (Fe, Al, Cu). (B) oxidization. (C) deposition (C-system).
Especially, due to the advance of matching performance, far from the plasma generating electric source, we could generate such small plasma and performe surface-treatment as mentioned above.
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