| Project/Area Number |
12554030
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 展開研究 |
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| Research Field |
分離・精製・検出法
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| Research Institution | OSAKA CITY UNIVERSITY (2002)
Tohoku University (2000-2001) |
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Principal Investigator |
TSUJI Kouichi OSAKA CITY UNIVERSITY, GRADUATE SCHOOL OF ENGINEERING, ASSOCIATE PROFESSOR, 大学院・工学研究科, 助教授 (30241566)
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| Co-Investigator(Kenkyū-buntansha) |
WAGATSUMA Kazuaki TOHOKU UNIVERSITY, INSTITUTE FOR MATERIALS RESEARCH, PROFESSOR, 金属材料研究所, 教授 (30158597)
KOMETANI Noritsugu OSAKA CITY UNIVERSITY, GRADUATE SCHOOL OF ENGINEERING, LECTURER, 大学院・工学研究科, 講師 (80295683)
YONEZAWA Yoshirou OSAKA CITY UNIVERSITY, GRADUATE SCHOOL OF ENGINEERING, PROFESSOR, 大学院・工学研究科, 教授 (10026346)
TAKAHASHI Hideyuki JEOL, RESEARCHER, 電子光学機器技術本部・応用研究センター, 主任研究員(研究職)
ASAMI Kazuhiko TOHOKU UNIVERSITY, INSTITUTE FOR MATERIALS RESEARCH, ASSOCIATE PROFESSOR, 金属材料研究所, 助教授 (20005929)
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| Project Period (FY) |
2000 – 2002
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| Project Status |
Completed (Fiscal Year 2002)
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| Budget Amount *help |
¥13,700,000 (Direct Cost: ¥13,700,000)
Fiscal Year 2002: ¥800,000 (Direct Cost: ¥800,000)
Fiscal Year 2001: ¥5,300,000 (Direct Cost: ¥5,300,000)
Fiscal Year 2000: ¥7,600,000 (Direct Cost: ¥7,600,000)
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| Keywords | GRAZING EXIT X-RAY MEASUREMENT / ELECTRON PROBE MICRO ANALYSIS / MICRO ANALYSIS / SURFACE ANALYSIS / PARTICLE ANALYSIS / AEROSOLS / 表面分析 / 微粒子分析 |
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| Research Abstract |
We have studied EPMA under grazing-exit conditions, which is called GE-EPMA. We developed a GE-EPMA apparatus based on a commericial EPMA. We evaluated the analytical characterization of GE-EPMA. It was foue analysis and single-particle analysis are possible by GE-EPMA with extremely low background. By analyzing exit-angle dependence of EPMA intensity, we can evaluate thickness and density of him films. The advantage of GE-EPMA is the use of an electron beam with a small diameter at an incident angle of 90 degrees, which makes it possible to perform localized analysis. Element mapping is possible by scanning the electron beam or the sample stage. In addition, depth analysis is possible by varying the exit angle, which could finally result in 3-dimensional EPMA
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