| Project/Area Number |
12555196
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 展開研究 |
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| Research Field |
Material processing/treatments
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| Research Institution | Tokyo Institute of Technology |
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Principal Investigator |
OHTAKE Naoto Tokyo Institute of Technology, Faculty of Science and Engineering, Associate Professor, 大学院・理工学研究科, 助教授 (40213756)
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| Co-Investigator(Kenkyū-buntansha) |
YASUOKA Manabu Fujikoshi Ltd. Clean Thermo Div. Manager, クリーンサーモ部, 室長(研究職)
YASUHARA Toshiyuki Tokyo Institute of Technology, Faculty of Science and Engineering, Research Associate, 大学院・理工学研究科, 助手 (70282829)
KATO Kazunori Shonan Institute of Technology, Faculty of Science and Engineering, Professor, 工学部, 教授 (80016419)
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| Project Period (FY) |
2000 – 2002
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| Project Status |
Completed (Fiscal Year 2002)
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| Budget Amount *help |
¥10,800,000 (Direct Cost: ¥10,800,000)
Fiscal Year 2002: ¥1,500,000 (Direct Cost: ¥1,500,000)
Fiscal Year 2001: ¥3,700,000 (Direct Cost: ¥3,700,000)
Fiscal Year 2000: ¥5,600,000 (Direct Cost: ¥5,600,000)
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| Keywords | Coating / Wear / CVD / Plasma spraying / Diamond-like Carbon / Hybrid film / BCN |
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| Research Abstract |
This study presents fabrication of nano-structured Ti-DLC films using are-glow hybrid plasma. A deposition apparatus consists of a DC plasma torch, a substrate holder and a vacuum chamber. An orifice of 10mm diameter mounted at the exit of the torch can generate pressure difference between the torch and the chamber. The chamber is evacuated by a dry pump of 5,000 L/min. The orifice and the large-scale vacuum pump enable to keep the pressure in chamber at 20-100 Pa, even if the pressure in the torch is 1 atm. The torch employs hollow cathode made of Ti, the Ti is evaporated by the arc discharge, and then sprayed onto the substrate with a plasma jet. The pressure in chamber is low enough to generate a slow discharge. The 13.56MHz RF power supply is connected to the substrate holder to generate a glow discharge plasma as well as to add a negative bias on the substrate.
Deposition of Ti-DLC films were performed using C_2H_2 and CH_4 as the reactant gases. Typical deposition condition was as
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follows : DC voltage and current : 13-15 V,30-150 A ; Ar for torch : 0.5-1.6 L/min ; CH_4 and C_2H_2 flow rate : 0.02-1 L/min ; RF power : 100-150W : negative biasing voltage : 100-400V. SEM observation and EDAX analysis results suggest that the film includes not only nano-size (I.e. l-50nm) Ti particles but also large droplets in carbon matrix. The carbon matrix was assured as DLC according to Raman spectrascopy. The swirl now generator was adopted to reduce the droplets, it was found that most of droplets were eliminated when C_2H_2, was supplied into the plasma torch together with Ar in the swirl flow. The hardness of the deposited film increased from 13 to 30GPa with decreasing the Ti content in the film from 0 to 30 vol.%. The thickness of the film was approximately 5 um in l h deposition and the friction coefficient was 0.3 against stainless steel ball. The residual stress seems to be decreased by the dispersed Ti nano-particle. These results lead to the conclusion that thick Ti-DLC film can be fabricated at high growth rate by the arc-glow hybrid plasma CVD. Less
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