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Research of "vacancy epitaxy"

Research Project

Project/Area Number 12650006
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Applied materials science/Crystal engineering
Research InstitutionThe University of Tokyo

Principal Investigator

UENO Keiji  The University of Tokyo, Graduate School of Science, 大学院・理学系研究科, 助手 (40223482)

Project Period (FY) 2000 – 2001
Project Status Completed (Fiscal Year 2001)
Budget Amount *help
¥3,600,000 (Direct Cost: ¥3,600,000)
Fiscal Year 2001: ¥1,100,000 (Direct Cost: ¥1,100,000)
Fiscal Year 2000: ¥2,500,000 (Direct Cost: ¥2,500,000)
Keywords空孔 / 空孔規則配列 / Ga_2Se_3 / エピタキシャル成長 / C_<60> / bilayer-GaSe終端Si(111) / 多孔性物質 / フォトルミネッセンス / Ga2Se3 / C60
Research Abstract

(1) I tried to grow Ga vacancy-ordered Ga_2Se_3 epitaxial films on Si (100) substrates. In order to obtain a single-domain epitaxial film I used a vicinal Si (001) substrare, whose clean surface has the 2×1 single-domain reconstruction. In addition, the lattice constant of the Si is almost same with that of Ga_2Se_3. It has been found that Ga vacancy-ordered single-domain Ga_2Se_3 films can be grown on the vicinal Si (001) substrates with the growth condisions ; substrate temperature = 480℃, VI/III ratio > 100. At the substrate temperature higher than 500℃, no Ga vacancy ordering was observed. At lower substrate temperature than 420 ℃, polycrystalline growth occurred. At the VI/III ratio of 10, no Ga vacancy-ordering was found, too. Photoluminescence spectra taken at 6.5K showed very btoad luminescence peak around 650 〜 1000 nm. No polarized photoluminescence was observed from the Ga vacancy-ordered Ga2Se3 film, which suggests that the grown film on the vicinal Si (001) substrate has the monoclinic crystal structure.

Report

(3 results)
  • 2001 Annual Research Report   Final Research Report Summary
  • 2000 Annual Research Report
  • Research Products

    (22 results)

All Other

All Publications (22 results)

  • [Publications] T.Shimada et al.: "Epitaxial growth and electronic structure of a C_<60> derivative prepared by using a solution spray technique"J. Appl. Phys.. 90. 209-212 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K.Ueno et al.: "Highly-stable passivation of a Si (111) surface using bilayer-GaSe"Appl. Surf. Sci.. (印刷中). (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K.Ueno et al.: "Epitaxial growth of a vacancy-ordered Ga_2Se_3 thin film on a vicinal Si (OO1) substrate"J. Cryst. Growth. (印刷中). (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K.Ueno et al.: "Nanoscale anodic oxidation on a Si (111) surface terminated by bilayer-GaSe"Surf. Sci.. (印刷中). (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] 上野啓司, 小間 篤: "表面不活性基板を利用した有機・無機ナノ構造の形成"日本結晶成長学会誌. 第28巻. 46-55 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K.Ueno et al.: "Fabrication of GaAs Quantum Dots on a Bilayer-GaSe Terminated Si (111) substrate"Japanese Journal of Applied Physics. 40. 1888-1891 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] T. Shimada, et al: ""Epitaxial growth and electronic structure of a C_<(x)> derivative prepared by using a solution spray technique ""J. Apple. Phys. 90. 209-212 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K. Ueno, et al: ""Highly-stable passivation of a Si (111) surface using bilayer-GaSe""Apple. Surf. Sci. (to be published). (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K. Ueno, et al: ""Epitaxial growth of a vacancy-ordered Ga_2Se_3 thin film on a vicinal Si (001) substrate""J. Cryst. Growth. (to be published). (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K. Ueno, et al: ""Nannoscale anodic oxidation on a Si (111) surface terminated by bylayer-GaSe""Surf. Sci. (to be published). (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K. Ueno, and A. Koma: ""Fabrication of organic and inorganic nanostructures by using inactive substrate surfaces""Journal of the Japanese Association for Crystal Growth. 28. 46-55 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K. Ueno, et al: ""Fabrication of GaAs Quantum Dots on a Bilayer-GaSe Terminated Si (111) substrate""Japanese Journal of Applied Physics. 40. 1888-1891 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] T.Shimada, et al.: "Epitaxial growth and electronic structure of a C_<60> derivative prepared by using a solution spray technique"J. Appl. Phys.. 90. 209-212 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] K.Ueno, et al.: "Highly-stable passivations of a Si(111) surface using bilayer-GaSe"Appl. Surf. Sci.. (印刷中). (2002)

    • Related Report
      2001 Annual Research Report
  • [Publications] K.Uno, et al.: "Epitaxial growth of a vacancy-ordered Ga_2Se_3 thin film on a vicinal Si(001) substrate"j. Cryst. Growth. (印刷中). (2002)

    • Related Report
      2001 Annual Research Report
  • [Publications] K.Ueno, et al.: "Nanoscale anodic oxidation on a Si(111) surface terminated by bilayer-GaSe"Surf. Sci.. (印刷中). (2002)

    • Related Report
      2001 Annual Research Report
  • [Publications] 上野啓司, 小間 篤: "表面不活性基板を利用した有機・無機ナノ構造の形成"日本結晶成長学会誌. 第28巻. 46-55 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] K.Iizumi et al.: "Investigation of epitaxial arrangement and electronic structure of a La@C_<82> film grown on a Mo_2 surface"Physical Review B. 62. 8281-8285 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] 上野啓司: "異種原子終端Si基板上でのフラーレン分子のエピタキシー"信学技報. 100巻245号. 51-56 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] 飯泉謙一,小間篤: "金属内包フラーレンのエピタキシャル成長と電子状態"信学技報. 100巻245号. 45-50 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] 上野啓司: "層状物質基板"表面科学. 21巻11号. 716-723 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] K.Ueno et al.: "Fabrication of GaAs Quantum Dots on a Bilayer-GaSe Terminated Si (111) substrate"Japanese Journal of Applied Physics. (印刷中). (2001)

    • Related Report
      2000 Annual Research Report

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Published: 2000-04-01   Modified: 2016-04-21  

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