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Band Engineering on Alloy of Fluorides for Heterodevices

Research Project

Project/Area Number 12650304
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionTOKYO INSTITUTE OF TECHNOLOGY

Principal Investigator

TSUTSUI Kazuo  Tokyo Institute of Technology, Interdisciplinary Graduate School of Science and Engineering, Associate Professor, 大学院・総合理工学研究科, 助教授 (60188589)

Project Period (FY) 2000 – 2001
Project Status Completed (Fiscal Year 2001)
Budget Amount *help
¥3,500,000 (Direct Cost: ¥3,500,000)
Fiscal Year 2001: ¥1,600,000 (Direct Cost: ¥1,600,000)
Fiscal Year 2000: ¥1,900,000 (Direct Cost: ¥1,900,000)
Keywordsfluoride alloy system / band enginnering / heterosutructures / CaF2 / CdF2 / resonant tunneling / band discontinuity / CaF_2 / CdF_2 / 弗化物 / 混晶 / 超薄膜ヘテル / 弗化カルシウム / 弗化カドミウム
Research Abstract

The purpose of this research was the artificial control of energy level of conduction band on fluoride alloys of composed of CaF_2 and CdF_2 which were epitaxially grown on Si substrates, and demonstrate feasibility of the technique to be applied for quantum effect hetero devices.
First, the CaF_2 buffer layer which was expected to be necessary to obtain good Ca_xCd_<1-x>F_2 alloy on Si was investigated. It was found that the CaF_2 buffer layer was able to be thin down to two mono-layers keeping good crystallinity and morphology of overgrown Ca_xCd_<1-x>F_2 layers. The minimum thickness was fond to fit applications of various tunnel devices since electrons can tunnel the layers.
The internal photon emission(IPE) analysis was carried out on the Au/Ca_xCd_<1-x>F_2/Si(111) diode structures, where photo emission current depending on wave length ofexiting light. As a result, it was shown that energy level of conduction bad edge of Ca_xCd_<1-x>F_2 was lineally changed depending on the composit … More ion of Ca_xCd_<1-x>F_2, for the first time. It was also confimied that the energy barrier of conduction bad edge of CaF2 for that of Si was 2.3 eV through the IPE measurement, and that the value was consistent with those obtained by X-ray photoelectron spectroscopy in the previous work From these results, it was indicated that band engineering on the fluoride alloy system, Ca_xCd_<1-x>F_2, was promising.
Finally, double barrier resonant tunneling diodes (RTDs) in which the Ca_xCd_<1-x>F_2 was employed in the barrier layers were fabricated, and they were compared to the conventional diodes in which pure CaF2 was employed in the barrier layers. The RTDs using Ca_xCd_<1-x>F_2 barrier exhibited good negative differential current-voltage characteristics. Furthermore, higher current density in spite of thicker barrier kyer on the RTD using Ca_xCd_<1-x>F_2 barrier than those using pure CaF2 was observed, which indicated controllability of barrier height on the RTDs by composition of the fluoride alloy system. Less

Report

(3 results)
  • 2001 Annual Research Report   Final Research Report Summary
  • 2000 Annual Research Report
  • Research Products

    (15 results)

All 2002 2001 Other

All Journal Article (10 results) Publications (5 results)

  • [Journal Article] Fluoride Resonant Tunneling Diodes Co-Integrated with Si-MOSFETs2002

    • Author(s)
      Toshiaki Terayama, Hiroshi Sekine, Kazuo Tsutsui
    • Journal Title

      Japanese J. Applied Physics 41(4B)

      Pages: 2598-2601

    • NAID

      110006341219

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Journal Article] Growth Characteristics of Ca_xCd_<1-x>F_2 Films on Si Substrates Using CaF_2 Buffer Layer2002

    • Author(s)
      H.Kanibayashi, T.Gotoh, H.Maeda, K.Tsutsui
    • Journal Title

      J. of Crystal Growth 237-239

      Pages: 2061-2064

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Journal Article] Cd-rich Ca_xCd_<1-x>F_2混晶のSi(111)基板上へのエピタキシャル成長2002

    • Author(s)
      前田元輝, 神林宏, 筒井一生
    • Journal Title

      第49回応用物理学関係連合講演会予稿集(講演番号27p-YH-2)

      Pages: 1374-1374

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Journal Article] Si基板上の活性層埋め込み型弗化物共鳴トンネルダイオードの製作2002

    • Author(s)
      渡邊聡, 神林宏, 関根広志, 筒井一生
    • Journal Title

      第49回応用物理学関係連合講演会予稿集(講演番号28a-K-1)

      Pages: 933-933

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Journal Article] Fluoride Resonant Tunneling Diodes Co-Integrated with Si-MOSFETs2002

    • Author(s)
      Toshiaki Terayama, Hiroshi Sekine, Kazuo Tsutsui
    • Journal Title

      Jpn.J.Applied Physics 41(4B)

      Pages: 2598-2601

    • NAID

      110006341219

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Journal Article] Growth Characteristics of Ca_xCd_<1-x>F_2 Films on Si Substrates Using CaF_2 Buffer Layer2002

    • Author(s)
      H.Kambayashi, T.Gotoh, H.Maeda, K.Tsutsui
    • Journal Title

      J.of Crystal Growth vol.237-239

      Pages: 2061-2064

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Journal Article] Epitaxial growth of Cd-rich Ca_xCd_<1-x>F_2 on Si (111) Substrates2002

    • Author(s)
      M.Maeda, H.Kambayashi, K.Tsutsui
    • Journal Title

      Domestic Conf.of Japan Soc.Applied Physics, Spring Meeting, [in Japanese] (27p-YH-2)

      Pages: 1374-1374

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Journal Article] Fabrication of Buried Active Layer Type Fluoride Resonant Tunneling Diodes on Si Substrates2002

    • Author(s)
      S.Watanabe, H.Kambayashi, H.Sekine, K.Tsutsui
    • Journal Title

      Domestic Conf.of Japan Soc.Applied Physics, Spring Meeting, [in Japanese] (28a-K-1)

      Pages: 933-933

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Journal Article] Si基板上のエピタキシャルCaCdF_2混晶層の電気的特性2001

    • Author(s)
      神林宏, 前田寛, 筒井一生
    • Journal Title

      第62回応用物理学会学術講演会予稿集(講演番号14a-YB-7)

      Pages: 1052-1052

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Journal Article] Electrical Characteristics of CaCdF_2 Films grown on Si(111) substrates2001

    • Author(s)
      H.Kambayashi, H.Maeda, K.Tsutsui
    • Journal Title

      Domestic Conf.of Japan Soc.Applied Physics, Spring Meeting, [in Japanese] (14a-YB-7)

      Pages: 1052-1052

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] T.Teramura, H.Sekine, K.Tsutsui: "Fluoride Resonant Tunneling Diodes Co-integrated with Si-MOSFETs"Jpn. J. Appl. Phys.. 41・4B(発表予定). (2002)

    • Related Report
      2001 Annual Research Report
  • [Publications] H.Kambayashi, T.Gotoh, H.Maeda, K.Tsutsui: "Growth Characteristics of Ca_xCd_<1-x>F_2 Films on Si Substrates Using CaF_2 Buffer Layen"J, Crystal Growth. (発表予定). (2002)

    • Related Report
      2001 Annual Research Report
  • [Publications] 前田元輝, 神林宏, 筒井一生: "Cd-rich Ca_xCd_<1-x>F_2の混晶のSi(111)基板上へのエピタキシャル成長"第49回応用物理学関係連合講演会予稿集. (発表予定). (2002)

    • Related Report
      2001 Annual Research Report
  • [Publications] 神林宏, 前田寛, 筒井一生: "Si基板上でのエピタキシャルCaCdF_2混晶層の電気的特性"第62回応用物理学会学術講演会予稿集. 1052-1052 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] T.Gotoh,H.Kambayashi and K.Tsutsui: "Epitaxial Growth of Ca_xCd_<1-x>F_2 Mixed Crystal Films on Si Substrates"Jpn.J.Appl.Phys.. 39(5B). L476-L478 (2000)

    • Related Report
      2000 Annual Research Report

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Published: 2000-04-01   Modified: 2016-04-21  

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