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Influences of Inserted Layers and Extra Impurities for Nucleation Enhancement on Film Properties of Transparent Conductive Oxides

Research Project

Project/Area Number 12650317
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionThe University of Tokushima

Principal Investigator

TOMINAGA Kikuo  Fac. of Engineering, The University of Tokushima, Associate Prof., 工学部, 助教授 (10035660)

Co-Investigator(Kenkyū-buntansha) NAKABAYASHI Ichiro  Fac. of Engineering, The University of Tokushima, Professor, 工学部, 助教授 (70035624)
Project Period (FY) 2000 – 2001
Project Status Completed (Fiscal Year 2001)
Budget Amount *help
¥3,700,000 (Direct Cost: ¥3,700,000)
Fiscal Year 2001: ¥500,000 (Direct Cost: ¥500,000)
Fiscal Year 2000: ¥3,200,000 (Direct Cost: ¥3,200,000)
KeywordsZnO:Al / transparent film / TCR Film / Transparent electrode / sputtering / sputtered film / Amorphous conductive film / ZnO : Al / amorphous conductive film / ZnO / 透明導電膜 / スパッタリング / 不純物添加効果
Research Abstract

We investigated mainly the following 3 thema : (1) What effect can we obtain by the insertion of ZnO layers into ZnO : Al film. (2) What effect can we find in mixing impurities such as Mn, Co and Cr into ZnO : A1 film under the codeposition of Zri. (3) What kind of film can we prepare under the simultaneous deposition of ZnO and In_2O_3.
For the subject (1), extra addition of Zn was effective in decreasing the film resistivity of ZnO:Al. This was ascribed to enhanced nucleation in ZnO growth and the resultant increase of doping efficiency of Al donors, and the decrease of potential height at the grain boundaries of ZnO:Al micro crystals. The influence of Mn, Co and Cr impurities appeared as the increase of film resistivity of ZnO:Al. The grain size of micro crystal was improved by impurity adding, but the decrease of carrier concentration cancelled the increase in carrier mobility due to the increased grain size. The impurity oxidization at the grain boundaries influenced severely on the ZnO:Al film resisitivity. In (3), we deposited ternary compounds of ZnO-In2O3 system. Amorphous phase appeared in wide range of Zn/In ratio. Amorphous films showed lower resistivity than homologous crystallized phase film. The doping effect was noticed in the amorphous phase for Al. This result suggests the extrinsic doping in amorphous phase of ternary compounds.

Report

(3 results)
  • 2001 Annual Research Report   Final Research Report Summary
  • 2000 Annual Research Report
  • Research Products

    (22 results)

All Other

All Publications (22 results)

  • [Publications] Kikuo Tominaga, Ichiro Nakabayashi et al.: "Amorphous Zno-In_2O_3 transparent conductive films by simultaneous sputtering method of ZnO and In_2O_3 targets"Vacuum. (to be published). 5 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] Kikuo Tominaga, Ichiro Nakabayashi et al.: "Film properties of ZnO : Al films deposited by co-sputtering of ZnO : Al and contaminated Zn target with Co, Mn and Cr"Vacuum. (to be published). 5 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] Kikuo Tominaga, Ichiro Nakabayashi et al.: "Effect of insertion of thin ZnO layer in transparent conductive ZnO : Al film"Thin Solid Films. 386. 267-270 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] Tomoko Ushiro, K.Tominaga, I.Nakabayashi et al.: "Structural Variation of thin films deposited from Zn_3In_2O_6 target by rf-sputtering"Material Research Bulletin. 36. 1075-1082 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] Toshihiro Moriga, K.Tominaga, I.Nakabayashi et al.: "Crystallization Process of Transparent Conductive Oxides Zn_kIn_2Ok_<+3 >"J. Synchrotoron Radiation. 8. 785-787 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] Kikuo Tominaga, Ichiro Nakabayashi et al.: "Conductive transparent films deposited by simultaneous sputtering of zinc-oxide and indium-oxide targets"Vacuum. 59. 546-552 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] Kikuo Tominaga, Takao Toshimasa, Fukushima Akihiko, Toshihiro Moriga and Ichiro Nakabayashi: "Amorphous ZnO-In2O3 transparent conductive films by simultaneous sputtering method of ZnO and In2O3 targets"Vacuum. (to be published). 1-5 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] Kikuo Tominaga, Takao,Toshimasa, Fukushima Akihiko, Toshihiro Moriga and Ichiro Nakabayashi: "Film properties of ZnO:Al films deposited by cosputtering of ZnO:A1 and contaminated Zn targets with Co, Mn and Cr"Vacuum. (to be published). 1-5 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] Kikuo Tominaga, Kazutaka Murayama, Ichiro Mori, Tomoko Ushiro, Toshihiro Moriga and Ichiro Nakabayashi: "Effect of insertion of thin ZnO layer in transparent conductive ZnO:Al film"Thin Solid Films. Vol.386. 267-270 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] Tomoko, Ushiro, Daisuke Tsuji, Akihiko Fukushima, Toshihiro Moriga, Ichiro Nakabayashi, Kazutaka Murayama and Kikuo Tominaga: "Structural Variation of Thin Films Deposited from Zn3In2O6 Target by RF-Sputtering"Materials Research Bulletin. Vol.36. 1075-1082 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] Toshihiro Moriga, Akihiko Fukushima, Yozo Tomonari, Shoji Hosokawa, Kikuo Tominaga and Ichiro Nakabayashi: "Crystallization Process of Transparent Conductive Oxides ZnkIn2Ok+3"Journal of Synchrotron Radiation. Vol.8. 785-787 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] Kikuo Tominaga, Kazutaka Murayama, Ichiro Mori, Takashi Okamoto, Kazunori Hiruta, Toshihiro Moriga and Ichiro Nakabayashi: "Conductive transparent films deposited by simultaneous sputtering of zincoxide and indium-oxide targets"Vacuum. Vol.59. 546-552 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] Kikuo Tominaga, Ichiro Nakabayashi et al.: "Amorphous ZnO-In_2O_3 transparent conductive films by simultaneous sputtering method of ZnO and In_2O_3 targets"Vacuum. (to be published). 5 (2002)

    • Related Report
      2001 Annual Research Report
  • [Publications] Kikuo Tominaga, Ichiro Nakabayashi et al.: "Film properties of ZnO : Al films deposited by co-sputtering of ZnO : Al and contaminated Zn target with Co, Mn and Cr"Vacuum. (to be published). 5 (2002)

    • Related Report
      2001 Annual Research Report
  • [Publications] Kikuo Tominaga, Ichiro Nakabayashi et al.: "Effect of insertion of thin ZnO layer in transparent conductive ZnO : Al film"Thin Solid Films. 386. 267-270 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] Tomoko Ushiro, K.Tominaga, I.Nakabayashi et al.: "Structural Variation of thin films deposited from Zn_3In_2O_6 target by rf-sputtering"Material Research Bulletin. 36. 1075-1082 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] Toshihiro Moriga, K.Tominaga, I.Nakabayasi et al.: "Crystallization Process of Transparent Conductive Oxides Z_<nk>I_<n2>O_<R+3>"J. Synchrotoron Radiation. 8. 785-787 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] Kikuo Tominaga, Ichiro Nakabayashi et al.: "Conductive transparent films deposited by simultaneous sputtering of zinc-oxide and indium-oxide targets"Vacuum. 59. 546-552 (2000)

    • Related Report
      2001 Annual Research Report
  • [Publications] K.Tominaga.: "Conductive transparent films deposited by simultaneous sputtering of zinc-oxide and indium-oxide target"Vacuum. 59. 546-552 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] T.Moriga: "Structure and Physical Properties of Films Deposited by Simultaneous DC Sputtering of ZnO and In_2O_3 ITO Target"Journal of Solid State Chemistry. 155. 312-319 (2000)

    • Related Report
      2000 Annual Research Report
  • [Publications] T.Ushiro: "Structural Variation of Thin Films Deposited from Zn_3In_2O_6 Target by RF-Sputtering"Material Research Bulletin. (2001)

    • Related Report
      2000 Annual Research Report
  • [Publications] T.Moriga: "Crystallization Process of Transparent Conductive Oxides Zn_RIn_2O_<k+3>"Journal of Synchrotoron Radiation. 8. 785-787 (2001)

    • Related Report
      2000 Annual Research Report

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Published: 2000-04-01   Modified: 2016-04-21  

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