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Metal Deposition Process from Quaternary Ammonium Triflate-type Non-aluminate Room Temperature Molten Salts

Research Project

Project/Area Number 12650733
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Metal making engineering
Research InstitutionKYOTO UNIVERSITY

Principal Investigator

HIRATO Tetsuji  Kyoto University, Dept. Materials Science & Engineering, Associate Professor, 工学研究科, 助教授 (70208833)

Co-Investigator(Kenkyū-buntansha) HAYASHI Koichi  Institute for Materials Research, Tohoku University, Research Associate, 金属材料研究所, 助手 (20283632)
MURASE Kuniaki  Kyoto University, Dept. Materials Science & Engineering, Research Associate, 工学研究科, 助手 (30283633)
AWAKURA Yasuhiro  Kyoto University, Dept. Materials Science & Engineering, Professor, 工学研究科, 教授 (70109015)
Project Period (FY) 2000 – 2001
Project Status Completed (Fiscal Year 2001)
Budget Amount *help
¥3,600,000 (Direct Cost: ¥3,600,000)
Fiscal Year 2001: ¥1,300,000 (Direct Cost: ¥1,300,000)
Fiscal Year 2000: ¥2,300,000 (Direct Cost: ¥2,300,000)
Keywordsnon-aqueous solvents / room temperature molten salts / ionic liquid / electroplating / imide salt / base metals / alloy electrodeposition / magnesium / 非水溶媒 / 常温溶触塩 / 亜鉛めっき / ニッケルめっき / マグネシウム電析 / 室温溶融塩 / 金属電析 / 4級アンモニウムカチオン / イミドイオン / ニッケル / 亜鉛 / 銅
Research Abstract

The redox and/or electrodeposition behaviors of copper, nickel, zinc, titanium, magnesium, and Cu-Mg alloy were examined using an "ammonium imide" room temperature molten salt as a novel electrolytic medium in order to clarify the applicability of the salt to the electrochemical process. Trimethyl-n-hexylammonium bis((trifluoromethyl)sulfonyl)amide (TMHA-Tf_2N), having an electrochemical window of 5.6 V (50 ℃), and metal salts were used to prepare the electrolyte. In TMHA-Tf_2N media monovalent copper ion, Cu(I), was stable and Cu metal was oxidized, or corroded, in the presence of Cu(II) species as : Cu^2+ + Cu → 2Cu^+. Cathodic electrodeposition of copper metal and its anodic dissolution were, thus, one-electron reactions and their current efficiencies were almost 100%.
Nickel, zinc, and Cu-Mg alloy can also be electrodeposited from the TMHA-Tf_2N media at a certain potentiostatic condition. The nickel and zinc metals deposited appeared as a gray-colored film, while the magnesium was dendritic. In contrast, though the TMHA-Tf_2N salt containing titanium species gave the redox current of dissolving titanium species, titanium metal was not able to deposit electrochemically.
The TMHA-Tf_2N salt containing both Cu^+ and Mg^<2+> ions, provided an Cu-Mg alloy containing about 23 at. % Mg. X-ray diffraction of the alloy gave a set of reflection due to elemental copper, suggesting that the magnesium formed a solid solution with copper.

Report

(3 results)
  • 2001 Annual Research Report   Final Research Report Summary
  • 2000 Annual Research Report
  • Research Products

    (9 results)

All Other

All Publications (9 results)

  • [Publications] Kuniaki Murase: "Electrochemical Behavior of Copper in Trimethyl-n-hexylammonium Bis((trifluoromethyl)-sulfonyl)amide, an Ammonium Imide-type Room Temperature Molten Salt"Journal of Applied Electrochemistry. 31(10). 1089-1094 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] Tetsuji Hirato: "The Electrolytic Codeposition of Silica Particles with Alminium from AlCl_3-Dimethylsulfone Electrolytes"Journal of the Electrochemical Society. 148(4). C280-C283 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] Kuniaki Murase: "Electrochemical Behavior of Copper in Ammonium Imide Type Room Temperature Molten Salt"Proceeding of the 2nd International Conference on Processing Materials for Properties (ed. by B.Mishra and C.Yamauchi). 783-788 (2000)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K. Murase, K. Nitta, T. Hirato, and Y. Awakura: "Electrochemical Behavior of Copper in Trimethyl-n-hexylammonium Bis((trifluoromethyl)sulfonyl)amide, an Ammonium imide-type Room Temperature Molten Salt"Journal of Applied Electrochemistry. 31(10). 1089-1094 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] T. Hirato, J. Fransaer, and J.-P. Celis: "The Electrolytic Codeposition of Silica Particles with Alminium from AlCl_3-Dimethylsulfone Electrolytes"Journal of the Electrochemical Society. 148 (4). C280-C283 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K. Murase, K. Nitta, T. Hirato, and Y. Awakura: "Electrochemical Behavior of Copper in Ammonium Imide Type Room Temperature Molten Salt"Proseeding of the 2nd International Conference on Processing Materials for Properties, B. Mishra and C. Yamauchi (eds.). TMS, Warrendale. 783-788 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2001 Final Research Report Summary
  • [Publications] K.Murase: "Electrochemical Behavior of Copper in Trimethyl-n-hexylammonium Bis((trifluoromethyl)sulfonyl)amide, an Ammonium Imide Type RTMS"Journal of Applied Electrochemistry. 31・10. 1089-1094 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] T.Hirato: "The Electrolytic Codeposition of Silica Particles with Aluminum from AlCl_3-Dimethylsulfone Electrolytes"Journal of the Electrochemical Society. 148・4. C280-C283 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] K.Murase,K.Nitta,T.Hirato and Y.Awakura: "Elctrochemical Behavior of Copper in Ammonlum Imide Type Room Temperature Molten Salt"Proceedings of 2nd International Conference on Processing Materials for Properties, TMS. 783-788 (2000)

    • Related Report
      2000 Annual Research Report

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Published: 2000-04-01   Modified: 2016-04-21  

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