Project/Area Number |
13450141
|
Research Category |
Grant-in-Aid for Scientific Research (B)
|
Allocation Type | Single-year Grants |
Section | 一般 |
Research Field |
電子デバイス・機器工学
|
Research Institution | Nagoya University |
Principal Investigator |
MIZUTANI Takashi Nagoya University, Graduate School of Engineering, Professor, 工学研究科, 教授 (70273290)
|
Co-Investigator(Kenkyū-buntansha) |
OHNO Yutaka Nagoya University, Graduate School of Engineering, Research Associate, 工学研究科, 助手 (10324451)
KISHIMOTO Shigeru Nagoya University, Graduate School of Engineering, Research Associate, 工学研究科, 助手 (10186215)
MAEZAWA Koichi Nagoya University, Graduate School of Engineering, Associate Professor, 工学研究科, 助教授 (90301217)
|
Project Period (FY) |
2001 – 2002
|
Project Status |
Completed (Fiscal Year 2002)
|
Budget Amount *help |
¥3,900,000 (Direct Cost: ¥3,900,000)
Fiscal Year 2002: ¥3,900,000 (Direct Cost: ¥3,900,000)
|
Keywords | GaN HEMT / Si_3N_4 / current collapse / temperature distribution / miro-Raman / gate leakage current / GaN MISHEMT / T-shaped gate / 電流しゃ断周波数 / 実効電子速度 / 低周波雑音 / EL発光 / 電界集中 / 高温動作 |
Research Abstract |
Fabrication process of GaN HEMTs was studied to improve the device performance, and the fabricated device was characterized in detail. The main results are as follows. (i) Surfacepassivation of GaN HEMTs with Si_3N_4 film was effective in suppressing the current collapse that limit the output power. (ii) Temperature distribution in GaN HEMTs on a sapphire substrate was successfully measured by micro-Raman scattering spectroscopy. Temperature resolution better than 10K was obtained. The highest temperature was obtained at the edge on the drain side where high-field region was formed. (iii) A large gate leakage current was observed in the GaN HEMTs, which was suppressed by employing MISHEMT structure, where Si_3N_4 was used as a gate insulator. (iv) Measurement of I-V characteristics of micro-Schottky contacts revealed that the threading dislocation did not affect the gate leakage current. (v) Current gain cutoff frequency of 54GHz was obtained in the GaN HEMT with 0.2-μm-long T-shaped gate.
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