| Project/Area Number |
13450299
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Material processing/treatments
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| Research Institution | Himeji Institute of Technology |
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Principal Investigator |
HATTORI Tadashi Laboratory of Advanced Science and Technology for Industry Himeji Institute of Technology, 高度産業科学技術研究所, 教授 (70326297)
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| Co-Investigator(Kenkyū-buntansha) |
MEKARU Harutaka Laboratory of Advanced Science and Technology for Industry Himeji Institute of Technology, 高度産業科学技術研究所, 助手 (30321681)
UTSUMI Yuichi Laboratory of Advanced Science and Technology for Industry Himeji Institute of Technology, 高度産業科学技術研究所, 助教授 (80326298)
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| Project Period (FY) |
2001 – 2003
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| Project Status |
Completed (Fiscal Year 2003)
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| Budget Amount *help |
¥15,000,000 (Direct Cost: ¥15,000,000)
Fiscal Year 2003: ¥2,400,000 (Direct Cost: ¥2,400,000)
Fiscal Year 2002: ¥2,600,000 (Direct Cost: ¥2,600,000)
Fiscal Year 2001: ¥10,000,000 (Direct Cost: ¥10,000,000)
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| Keywords | Synchrotron orbit radiation / LIGA / Micromachine / X-ray mask / Microfabrication / Microsystems / MEMS / NEMS / Micro Mold / ナノ・マイクロファブリケーション / マイクロ・ナノファブリケイション |
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| Research Abstract |
LIGA (German acronym for Lithographite Galvanoformung and Abformung) process, that utilizes a useful industrial application of synchrotron radiation (SR), is one of the promising technologies for fabrication of extremely tall three-dimensional (3D) microstructures with a large aspect ratio. Because X ray mask used in the present LIGA process has the uniform thickness of an absorber, the fabrication with flexibility in vertical-directions is very restricted.
In this research, we proposed the new LIGA process using the X-ray mask absorbers with thickness variation in vertical direction. Moreover, this process is verified to give the fabrication with having flexibility in vertical-directions.
10.The lighting-Panel (LP) for liquid crystal display (LCD) with the accurate 3D microstructures were designed simulation tool and actually they were fabricated using the X mask developed by this research The size of optical dot array conical patterns of the height 60μm formed on LP, for achieving high and uniform luminosity has to be less than several hundred and aspect ratio must be optimized
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