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Diagnostics of Gas-Phase and Surface Reactions of Atomic Radicals in Processing Plasmas by Vacuum Ultraviolet Laser Spectroscopy

Research Project

Project/Area Number 13480126
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field プラズマ理工学
Research InstitutionKYOTO UNIVERSITY

Principal Investigator

TACHIBANA Kunihide  Graduate School of Engineering, Professor, 工学研究科, 教授 (40027925)

Co-Investigator(Kenkyū-buntansha) NAKAMURA Toshihiro  Graduate School of Engineering, Lecturer, 工学研究科, 講師 (90293886)
YASAKA Yasuyoshi  Maizuru National College of Technology, professor, 教授 (30109037)
Project Period (FY) 2001 – 2002
Project Status Completed (Fiscal Year 2002)
Budget Amount *help
¥15,000,000 (Direct Cost: ¥15,000,000)
Fiscal Year 2002: ¥3,700,000 (Direct Cost: ¥3,700,000)
Fiscal Year 2001: ¥11,300,000 (Direct Cost: ¥11,300,000)
KeywordsAtomic radicals / VUV laser / Absorption spectroscopy / Processing plasma / Carbon atom / Oxygen atom / Hydrogen atom / Fluorine atom / 真空紫外レーザー / 誘導結合プラズマ / 絶対密度測定
Research Abstract

Atomic species such as H, C, N, F and Cl play important roles in gas-phase and surface reactions for various kinds of plasma material processing. In this project, we have developed a tunable VUV (vacuum ultra-violet) laser absorption spectroscopy system in the range from 800 to 1700 nm by using the two-photon resonant four-wave mixing method (ν_<VUV> = 2ν_1 + ν_2), and applied it to the diagnostics of those species in order to make clear the reaction mechanisms and obtain the guiding principles for the process control.
Following the quantitative measurement on F atoms, we applied the VUV absorption method Successfully to the measurement of C atoms in various kinds of fluorocarbon gas plasmas. The obtained results were analyzed for the role of C atoms in the etching of SiO_2 (see the paper published in J. Appl. Phys for more details). Then, we proceeded to the measurement of O atoms for better understandings of photo-resist ashing and Si oxidation processes.
For the measurements of H and N atoms, the wavelengths corresponding to ν_1 and ν_2 become 210 and 800 - 900 nm, respectively, for the VUV generation around 120 nm. Therefore, We have modified the laser system by substituting the pumping excimer laser with a YAG-laser for the better VUV conversion efficiency. As the result, we have succeeded in the measurement of H atoms in H_2 and CH_4 gases, and are continuing the quantitative measurement in the processing plasmas for the surface cleaning and diamond-like carbon deposition.

Report

(3 results)
  • 2002 Annual Research Report   Final Research Report Summary
  • 2001 Annual Research Report
  • Research Products

    (20 results)

All Other

All Publications (20 results)

  • [Publications] Kunihide Tachibana: "VUV to UV laser spectroscopy of atomic species in processing plasmas"Plasma Sources Science and Technology. 11・3A. A166-A172 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Kunihide Tachibana: "Measurements of atomic carbon density in processing plasmas by vacuum ultraviolet laser, absorption spectroscopy"Journal of Applied Physics. 92・10. 5684-5690 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Kunihide Tachibana: "VUV to UV laser spectroscopy of atomic species in processing plasmas"Proceedings of 25^<th> International Conference on Phenomena in Ionized Gases. Vol.1. 3-4 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Kunihide Tachibana: "Measurement of atomic carbon density in processing plasmas by vacuum ultraviolet laser absorption spectroscopy"Proceedings of 15^<th> International Symposium on Plasma Chemistry. Vol.5. 2256-2261 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Kunihide Tachibana: "Diagnostics of plasmas for surface treatment technologies"Joint International Plasma Symposium of 6^<th> APCPST,15^<th> SPSM, OS 2002 & 11^<th> KAPRA. 146 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Kunihide Tachibana: "Measurement of atomic oxygen density in processing plasmas by vacuum ultraviolet laser absorption spectroscopy"Proceedings of 16^<th> International Symposium on Plasma Chemistry. (to be published). (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Kunihide Tachibana: "VUV to UV laser spectroscopy of atomic species in processing plasmas"Plasma Sources Sci. Technol.. 11-3A. A166-A172 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Norifusa Tanaka and Kunihide Tachibana: "Measurements of atomic carbon density in processing plasmas by vacuum ultraviolet laser absorption spectroscopy"J. Appl. Phys.. 92-10. 684-5690 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Norifusa Tanaka and Kunihide Tachibana: "Measurement of atomic carbon density in processing plasmas by vacuum ultraviolet laser absorption spectroscopy"Proc. 15^<th> Int. Symp. on Plasma Chemistry. Vol.6. 2256-2261 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Kunihide Tachibana: "VUV to UV laser spectroscopy of atomic species in processing plasmas"Proc. 25^<th> Int. Conf. on Phenomena in Ionized Gases. Vol.1. 3-4 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Kunihide Tachibana: "Diagnostics of plasmas for surface treatment technologies"Abs. Joint Int. Plasma Symp. of 6^<th> APCPST, 15^<th> SPS** OS 2002 & 11^<th> KAPRA.

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Takashi Yokomizo and Kunihide Tachibana: "Measurement of atomic oxygen density in processing plasmas by vacuum ultraviolet laser absorption spectroscopy"Proc. 16th Int. Symp. on Plasma Chemistry. (to be published).

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] K.Tachibana: "VUV to UV laser spectroscopy of atomic species in processing plasmas"Plasma Sources Science and Technology. 11・3A. A116-A172 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] N.Tanaka: "Measurements of atomic carbon density in processing plasmas by vacuum ultraviolet laser absorption spectroscopy"Journal of Applied Physics. 92・10. 5684-5690 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] T.Yokomizo: "Measurement of atomic radicals using tunable VUV laser absorption spectroscopy"Proceedings of The 20^<th> Symposium on Plasma Processing. 239-240 (2003)

    • Related Report
      2002 Annual Research Report
  • [Publications] T.Yokomizo: "Measurement of atomic oxygen density in processing plasmas by vacuum ultraviolet laser absorption spectroscopy"Proceedings of The 16^<th> International Symposium on Plasma Chemistry. (to be published). (2003)

    • Related Report
      2002 Annual Research Report
  • [Publications] K.Tachibana: "Measurement of atomic carbon density in processing plasmas by Vacuum ultraviolet laser absorption spectroscopy"Proceedings of 15^<th> International Symposium on Plasma Chemistry. Vol.4. 2256-2261 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] K.Tachibana: "VUV to UV Laser Spectroscopy of Atomic Species in Processing Plasmas"Proceedings of 15^<th> International Conference on Phenomena in Ionized Gases. Vol.1. 3-4 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] T.Nakamura: "Ab initio calculations of the dissociative attachment resonance energies for an octafluorocyclopentene molecule with comparisons to electron attachment mass spectrometric measurements"Applied Physics Letters. Vol.80(to be published). (2002)

    • Related Report
      2001 Annual Research Report
  • [Publications] K.Tachibana: "VUV to UV Laser Spectroscopy of Atomic Species in Processing Plasmas"Plasma Sources Science and Technology. Vol.11(to be published). (2002)

    • Related Report
      2001 Annual Research Report

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Published: 2001-04-01   Modified: 2016-04-21  

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