| Project/Area Number |
13555199
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 展開研究 |
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| Research Field |
Material processing/treatments
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| Research Institution | KYOTO UNIVERSITY |
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Principal Investigator |
SETSUHARA Yuichi Kyoto Univ., Grad.Sch.Eng., Associate Professor, 工学研究科, 助教授 (80236108)
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| Co-Investigator(Kenkyū-buntansha) |
MIYAKE Shoji Osaka Univ., Joining & Welding Res.Inst., Professor, 接合科学研究所, 教授 (40029286)
TAKAHASHI Kazuo Kyoto Univ., Grad.Sch.Eng., Research Associate, 工学研究科, 助手 (50335189)
ONO Kouichi Kyoto Univ., Grad.Sch.Eng., Professor, 工学研究科, 教授 (30311731)
KUMAGAI Masao Kanagawa Industrial Tech.Res.Inst., Senior Researcher, 材料工学部, 専門研究員(研究職)
SHOJI Tatsuo Nagoya Univ., Grad.Sch.Eng., Associate Professor, 工学研究科, 助教授 (50115581)
緒方 潔 日新電機株式会社, 研究開発部, 先端技術研究室室長(研究職)
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| Project Period (FY) |
2001 – 2003
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| Project Status |
Completed (Fiscal Year 2003)
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| Budget Amount *help |
¥13,600,000 (Direct Cost: ¥13,600,000)
Fiscal Year 2003: ¥1,500,000 (Direct Cost: ¥1,500,000)
Fiscal Year 2002: ¥6,100,000 (Direct Cost: ¥6,100,000)
Fiscal Year 2001: ¥6,000,000 (Direct Cost: ¥6,000,000)
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| Keywords | inductively coupled plasmas / internal antenna / low inductance antenna / large-volume plasma source / plasma-based ion implantation |
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| Research Abstract |
Development of large-area and/or large-volume plasma sources with high plasma density is desired for a variety of plasma processes from microelectronics device fabrications to advanced PVD technologies including plasma-based ion implantation (PBII). The present investigations have been performed to develop meter-scale large-area RF plasma sources by inductive coupling of multiple low-inductance antenna (LIA) units, as a promising candidate for efficient high-density sources which can be applied to advanced PBII processes. Our new proposal of the unique source configuration is based on the principle of multiple and independent operation of ICP units, which allows the low-voltage plasma production with active control of power deposition profiles. 1) Discharge experiments with a meter-scale chamber resulted in high-density plasma production with densities as high as 5x10^<11>cm^<-3>. 2) It has been demonstrated that high plasma density can be obtained efficiently using the low-inductance internal antenna configuration with effectively suppressed electrostatic coupling. 3) Microstructures and properties of nanocomposite coatings have also been studied for applications to advanced surface modification processes with superhard-material coatings. 4) The LIA units are mounted on the wall of the discharge chamber and are coupled to a separated RF power source for independent and integrated control of power deposition profile, which exhibited significant improvements in the power control precision. 5) Design issues for large-area plasma sources were studied by developing numerical simulation codes (electromagnetic code, particle code and fluid code) and feasibility of novel large-area plasma sources with a scale size of 3m has been demonstrated to meet the requirements of the next-generation processes.
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