• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to previous page

Dynamic Scaling Study of Thin Films in electrodeposition Growth Using AFM

Research Project

Project/Area Number 13650029
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field 表面界面物性
Research InstitutionUniversity of the Ryukyus

Principal Investigator

SAITOU Masatoshi  Univ. of the Ryukyus, Engineering, Prof., 工学部, 教授 (00284951)

Co-Investigator(Kenkyū-buntansha) OSHIKAWA Wataru  Univ. of the Ryukyus, Engineering, Asst. Prof., 工学部, 助手 (80224228)
Project Period (FY) 2001 – 2002
Project Status Completed (Fiscal Year 2002)
Budget Amount *help
¥2,700,000 (Direct Cost: ¥2,700,000)
Fiscal Year 2002: ¥1,100,000 (Direct Cost: ¥1,100,000)
Fiscal Year 2001: ¥1,600,000 (Direct Cost: ¥1,600,000)
Keywordsscaling function / electrodeposition / pulse-current / three-dimensional growth / two-dimensional growth / universality class / scaling exponent / preferential growth direction / 動的スケーリング / ACインピーダンススペクトロスコピー / 電荷移動反応 / 表面成長 / 確率論的微分方程式 / ニッケル
Research Abstract

(1) Three-dimensional growth in electrodeposition
We have made investigation into scaling properties of nickel surfaces grown by pulse-current electrodeposition using atomic force microscopy. The surface growth exhibits an anomalous dynamic scaling behavior characterized by a local roughness exponent ζ_<loc>, global scaling exponent ζ and dynamic exponent z for an intermediate time regime I^z < L^z where I and L denote a window length and system size. The local interface width of the nickel surfaces leads to ζ_<loc>=1.0, global scaling exponent ζ=2.8 and dynamic exponent z=4.1. All the experimental data collapse on a plot of the anomalous scaling function.
(2) Two-dimensional growth in electrodeposition
Surface growth of Ni thin films electrodeposited on (100) Ni substrates has been investigated using atomic force microscopy. In the early stage of growth, islands nucleated on the (100) Ni substrates, which appear to be rectangular in cross section, grow laterally in the same crystallographic orientation. Growth surfaces are shown to display a normal scaling behavior characterized by the linear surface diffusion universality class. Along the time evolution, instability in growth occurs and a transition from two-dimensional growth to three-dimensional growth is observed. In this stage, surface growth obeys anomalous scaling characterized by a local roughness exponent ζ_<loc>=1.0, global scaling exponent ζ=2.1 and dynamic exponent z=1.0.

Report

(3 results)
  • 2002 Annual Research Report   Final Research Report Summary
  • 2001 Annual Research Report
  • Research Products

    (18 results)

All Other

All Publications (18 results)

  • [Publications] M.Saitou, W.Oshikawa, M.Mori, A.Makabe: "Surface Roughening in the Growth of Direct Current or Pulse Current Electrodeposited Nickel Thin Films"J.Electrochem.Soc.. 148. C780-C783 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] M.Saitou, W.Oshikawa, A.Makabe: "Characterization of electrodeposited nickel film surfaces using atomic force microscopy"J.Phys.Chem.Solids. 63. 1685-1689 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] M.Saitou: "Anomalous scaling of nickel surfaces in pulse-current electrodeposition growth"Phys.Rev.B. 66. 73416-73419 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] M.Saitou, K.Hamaguchi, K.Inoue: "A study of charge-transfer reactions on (110) single-crystal nickel surface"J.Phys.Chem.B. 106. 12253-12257 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] M.Saitou, K.Hamaguchi, W.Oshikawa: "Surface growth of Ni thin films electrodeposited on (100) Ni surfaces"J.Electrochem.Soc.. 150. C99-C103 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] M. Saitou, W. Oshikawa, M. Mori, and A. Makabe: "Surface Roughness in the Growth of Direct Current or Pulse Current Electrodeposited Nickel Thin Films"J. Electrochem. Soc.. 148. C780-C783 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] M. Saitou, W. Oshikawa and A. Makabe: "Characterization of electrodeposited nickel film surfaces using atomic force microscopy"J. Phys. Chem. Solids.. 63. 1685-1689 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] M. Saitou: "Anomalous scaling of nickel surfaces in pulse-current electrodeposition growth"Phys. Rev. B. 66. 073416-073419 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] M. Saitou, K. Hamaguchi and K. Inoue: "A study of charge-transfer reactions on (110) single-crystal nickel surfaces in nickel sulfamate electrolyte using electrochemical impedance spectroscopy"J. Phys. Chem. B. 106. 12253-12257 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] M. Saitou, K. Hamaguchi and W. Oshikawa: "Surface growth of Ni thin films electrodeposited on (100) Ni surfaces"J. Electrochem. Soc.. 150. C99-C103 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] M.Saitou: "Anomalous scaling of nickel surfaces in pulse-current electrodeposition growth"Phys.Rev.B. 66. 73416-73419 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] M.Saitou, K.Hamaguchi, K.Inoue: "A study of charge-transfer reactions on (110) single-crystal nickel surfaces in nickel sulfamate electrolyte using electrochemical impedance spectroscopy"J.Phys.Chem.B. 106. 12253-12257 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] M.Saitou, K.Hamaguchi, W.Oshikawa: "Surface growth of Ni thin films electrodeposited on (100) Ni surfaces"J.Electrochem.Soc.. 150. C99-C103 (2003)

    • Related Report
      2002 Annual Research Report
  • [Publications] K.Hamaguchi, W.Oshikawa, M.Saitou: "Electrochemical Impedance Spectroscopy Study of Electrochemical Reactions on Single-crytsalline Nickel Surfaces in Nickel Sulfamate"202th Electrochemical Society Meeting-SaltLake City, USA CDROM. 480 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] W.Oshikawa, K.Hamaguchi, M.Saito: "Anomalous Scaling of Nickel Surfaces Grown by Pulse-Current electrodeposition"202th Electrochemical Society Meeting-SaltLake City, USA CDROM. 471 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] M.Saitou, W.Oshikawa, M.Mori, A.Makabe: "Surfase Roughening in the Growth of Direct Current or Pulse Current Electrodeposited Nickel Thin Films"J. Electrochem. Soc.. 148. C780-C783 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] M.Saitou, W.Oshikawa, A.Makabe: "Characterization of electrodeposited nickel film surfaces using atomic force microscopy"J. Phys. Chem. Solids. (to be published). (2002)

    • Related Report
      2001 Annual Research Report
  • [Publications] 斉藤正敏, 真壁朝宏: "パルス電析により作成したニッケル薄膜の表面ラフニング"2001年日本機械学会学術講演論文集. 503-504 (2001)

    • Related Report
      2001 Annual Research Report

URL: 

Published: 2001-04-01   Modified: 2016-04-21  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi