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Development of soft magnetic thin films with large saturation magnetization for magnetic recording head by sputter-deposition at liquid nitrogen temperature

Research Project

Project/Area Number 13650357
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionTokyo Polytechnic University

Principal Investigator

HOSHI Yoichi  Tokyo Polytechnic University, Faculty of Engineering, Professor, 工学部, 教授 (20108228)

Co-Investigator(Kenkyū-buntansha) SUZUKI Eisuke  Tokyo Polytechnic University, Faculty of Engineering, Associate Professor, 工学部, 助教授 (60113007)
SHIMIZU Hidehiko  Niigata University, Faculty of Engineering, Associate Professor, 工学部, 助教授 (00313502)
Project Period (FY) 2001 – 2003
Project Status Completed (Fiscal Year 2003)
Budget Amount *help
¥1,000,000 (Direct Cost: ¥1,000,000)
Fiscal Year 2003: ¥300,000 (Direct Cost: ¥300,000)
Fiscal Year 2002: ¥700,000 (Direct Cost: ¥700,000)
KeywordsLow temperature deposition / Soft magnetic thin films / Fe-Co film / Fe film / Permalloy under layer / Low voltage sputtering / Pulse sputtering / Facing target sputtering / スパッタ / 軟磁性薄膜 / 高飽和磁化 / パルスプラズマ / 低温成膜 / 純鉄膜 / Fe-Co合金
Research Abstract

In this research, we proposed several kinds of new sputter-deposition techniques to improve soft magnetic properties of Fe, Fe-N, and Fe-Co thin films with large saturation magnetization above 2.2T.
1) Deposition of the film at liquid nitrogen temperature
It was found that the reduction of the substrate temperature from room temperature to liquid nitrogen temperature leads to a remarkable improvement in the (110) orientation of pure iron films. In addition, ion bombardment at such low temperature can reduce the crystallite size of the films significantly, which results in a remarkable improvement of soft magnetic properties of the film.
2) Low voltage sputtering technique
The reduction of sputtering voltage is thought to be effective to suppress the high energy particle bombardment of the film, which will lead to an improvement of the crystallinity of the film. In this study, we showed that the sputtering at a low sputtering voltage below 100V and a large plasma density above 10^<11>cm^<-3 … More > can be realized by using rf-dc coupled sputtering technique, although rf frequency of above 50MHz was necessary to produce a high density plasma at low self bias voltage below 100V. Sputter-deposition of pure iron and Fe-Co films were attempted by using this low voltage sputtering system. As a result, it became clear that the orientation of the film is improved by the reduction of sputtering voltages, along with the reduction of compressive film stress. The significant improvement of soft magnetic properties of the film, however, was not observed by the reduction of the sputtering voltage.
3) Pulse sputtering technique
In the sputtering at a very high plasma density, instability of the glow discharge due to arc discharge was an important problem to be solved. In this study, we used a dc pulse power source of 10 to 100kHz to suppress the instability and showed its effectiveness in the sputter deposition of the films. This pulse sputtering technique was also useful in the reactive sputtering of TiO_2,films, where instability of the discharge was more significant.
4) Dual sputtering technique with facing target arrangement
We proposed a new dual sputtering technique with facing target arrangement. In this sputtering system, two magnetron sputtering sources were arranged in an opposed position. Compared with the conventional dual sputtering system, sputter-deposition can be performed at lower sputtering voltages, and high energy particle bombardment to film surface can be reduced markedly.
5) Improvement of soft magnetic properties of Fe-Co films deposited on under layer
We confirmed that the crystallite size of the Fe-Co film was decreased significantly by depositing the films on permalloy under layer, which may result in the improvement of soft magnetic properties of the film. Permalloy under layer deposited on Ta seed layer led to a significant improvement of (110) orientation of Fe-Co films along with the reduction of the crystallite size of the film. Less

Report

(4 results)
  • 2003 Annual Research Report   Final Research Report Summary
  • 2002 Annual Research Report
  • 2001 Annual Research Report
  • Research Products

    (42 results)

All 2004 2003 2002 2001 Other

All Journal Article (28 results) Publications (14 results)

  • [Journal Article] "Suppression of substrate heating in the sputter-deposition of ITO films."2004

    • Author(s)
      Kentaro Funatsu, Hiro-omi Kato, Yoichi Hoshi
    • Journal Title

      Electrochemistry 72,No.6

      Pages: 418-420

    • NAID

      10012362597

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] スパッタ法により作成したパーマロイト薄膜の機会的特性2004

    • Author(s)
      清水英彦, 星 陽一
    • Journal Title

      電気学会 論文誌 124、NO.3

      Pages: 265-270

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] Low temperature deposition of ITO thin films by low voltage sputtering in various rare gases2004

    • Author(s)
      Y.Hoshi, H.Shimizu
    • Journal Title

      IEICE Trans.Electronics 87-C, No.2

      Pages: 212-217

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] High rate sputter-deposition of TiO_2 films using oxide target, IEICE,(2004)2004

    • Author(s)
      Y.Hoshi, T.Takahashi
    • Journal Title

      IEICE Trans.Electronics 87-C, No.2

      Pages: 227-231

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] Structure and electrical properties of ITO thin films deposited at high rate by facing target sputtering2004

    • Author(s)
      Youichi Hoshi, Hiro-omi Kato, Kentaro Funatsu
    • Journal Title

      Thin Solid Films 445

      Pages: 245-250

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] ITO透明導電膜の低温成膜における水蒸気の効果,(2004)2004

    • Author(s)
      加藤, 船津, 星
    • Journal Title

      電子情報通信学会論文誌C J87-C、No.1

      Pages: 160-165

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] Suppression of substrate heating in the sputter-deposition of ITO films.2004

    • Author(s)
      Kentaro Funatsu, Hiro-omi Kato, Yoichi Hoshi
    • Journal Title

      Electrochemistry 72,No.6

      Pages: 418-420

    • NAID

      10012362597

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] Mechanical Properties of Permalloy Thin Films Deposited by Sputtering. (in Japanese)2004

    • Author(s)
      H.Shimizu, Y.Hoshi
    • Journal Title

      IEEJ Trans.FM. Vol.124,No.3

      Pages: 265-270

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] Low temperature deposition of ITO thin films by low voltage sputtering in various rare gases.2004

    • Author(s)
      Y.Hoshi, H.Shimizu
    • Journal Title

      IEICE Transactions on Electronics E87-C, No.2

      Pages: 212-217

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] High rate sputter-deposition of TiO_2 films using oxide target.2004

    • Author(s)
      Y.Hoshi, T.Takahashi
    • Journal Title

      IEICE Transactions on Electronics E87-C, No.2

      Pages: 227-231

    • NAID

      110003214847

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] Structure and electrical properties of ITO thin films deposited at high rate by facing target sputtering.2004

    • Author(s)
      Yoichi Hoshi, Hiro-omi Kato, Kentaro Funatsu
    • Journal Title

      Thin Solid Films 445

      Pages: 245-250

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] Effect of Water Vapor in the Sputter-Deposition of ITO Thin Film at Low Temperature (In Japanese)2004

    • Author(s)
      Hiro-omi Kato, Kentaro Funatsu, Yoichi Hoshi
    • Journal Title

      IEICE J87-C, No.1

      Pages: 160-165

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] High Rate Deposition of ITO Thin Films on Plastic Substrates by Sputtering2003

    • Author(s)
      H.Kato, K.Funatsu, Y.Hoshi
    • Journal Title

      Trans.of the Materials Research Society of Japan 28[4]

      Pages: 1137-1140

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] Iron Thin Films Deposited by Low Voltage Sputtering2003

    • Author(s)
      Y.Kon, Y.Hoshi
    • Journal Title

      Trans.of the Materials Research Society of Japan 28[4]

      Pages: 1169-1172

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] High Rate Deposition of TiO_2 Thin Films using Sputtering Technique2003

    • Author(s)
      T.Takahashi, T.Nakano, Y.Hoshi, H.Shimizu
    • Journal Title

      Trans.of the Materials Research Society of Japan 28[4]

      Pages: 1129-1132

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] High Rate Deposition of ITO Thin Films on Plastic Substrates by Sputtering.2003

    • Author(s)
      H.Kato, K.Funatsu, Y.Hoshi
    • Journal Title

      Transactions of the Materials Research Society of Japan 28[4]

      Pages: 1137-1140

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] Iron Thin Films Deposited by Low Voltage Sputtering.2003

    • Author(s)
      Y.Kon, Y.Hoshi
    • Journal Title

      Transactions of the Materials Research Society of Japan 28[4]

      Pages: 1169-1172

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] High Rate Deposition of TiO_2 Thin Films using Sputtering Technique.2003

    • Author(s)
      T.Takahashi, T.Nakano, Y.Hoshi, H.Shimizu
    • Journal Title

      Transactions of the Materials Research Society of Japan 28[4]

      Pages: 1129-1132

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] ITO thin films deposited at a low temperature by using a kinetic energy controlled sputter-deposition technique2002

    • Author(s)
      Yoichi Hoshi, Takakazu Kiyomira
    • Journal Title

      Thin Solid Films 411

      Pages: 36-41

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] Evolution of water vapor from indium-tin-oxide thin films fablicated by various deposition processes2002

    • Author(s)
      S.Seki, T.Aoyama, Y.Sawada, O.Ogawa, M.Sano, N.Miyabayashi, Y.Yoshida, Y.Hoshi, M.Ide, A.Shida
    • Journal Title

      J.Thermal Analysis and Calorimetry Vol.69

      Pages: 1021-1029

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] ITO thin films deposited at a low temperature by using a kinetic energy controlled sputter-deposition technique.2002

    • Author(s)
      Yoichi Hoshi, Takakazu Kiyomira
    • Journal Title

      Thin Solid Films 411

      Pages: 36-41

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] The consideration on the Initial Growth stage of Sputtered Ag Thin Films Observed by Ellipsometry.2002

    • Author(s)
      H.Shimizu, Y.Hoshi, S.Kawabata
    • Journal Title

      IEEJ Trans.FM Vol.122,No.8

      Pages: 755-760

    • NAID

      10009584149

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] Evolution of water vapor from indium-tin-oxide thin films fablicated by various deposition processes.2002

    • Author(s)
      S.Seki, T.Aoyama, Y.Sawada, O.Ogawa, M.Sano, N.Miyabayashi, Y.Yoshida, Y.Hoshi, M.Ide, A.Shida
    • Journal Title

      J.Thermal Analysis and Calorimetry Vol.69

      Pages: 1021-1029

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] New sputter-deposition processes for the formation of thin films with desired structure for magnetic recording2001

    • Author(s)
      Y.Hoshi
    • Journal Title

      J.Mag.Mag.Mat. 235

      Pages: 347-353

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] Fe and Fe-N films sputter-deposited at liquid nitrogen temperature.2001

    • Author(s)
      Wataru Seiko, Yoichi Hoshi, Hidehiko Shimizu
    • Journal Title

      J.Mag.Mag.Mat. 235

      Pages: 196-200

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] New sputter-deposition processes for the formation of thin films with structure for magnetic recording.2001

    • Author(s)
      Y.Hoshi
    • Journal Title

      J.Mag.Mag.Mat. 235

      Pages: 347-353

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] 偏光解析法を用いたAgスパッタ薄膜の初期成長過程の考察

    • Author(s)
      清水, 星, 川畑
    • Journal Title

      電気学会論文誌A Vol.122-A、No.8

      Pages: 755-760

    • NAID

      10009584149

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Journal Article] Fe and Fe-N films sputter-deposited at liquid nitrogen temperature

    • Author(s)
      Wataru Seiko, Yoichi Hoshi, Hidehiko Shimizu
    • Journal Title

      J.Mag.Mag.Mat. 235

      Pages: 196-200

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Yoichi Hoshi, Hiro-omi Kato, Kentaro Funatsu: "Structure and electrical properties of ITO thin films deposited at high rate by facing target sputtering"Thin Solid Films. 445. 245-250 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] T.Takahashi, T.Nakano, Y.Hoshi, H.Shimizu: "High rate deposition of TiO2 thin films using pulse sputtering technique"Transaction of the Material Research Society of Japan. 28[4]. 1129-1132 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] Hiro-omi Kato, Kentaro Funatsu, Yoichi Hoshi: "High rate deposition of ITO thin films on plastic substrate"Transaction of the Material Research Society of Japan. 28[4]. 1137-1140 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] Yohei Kon, Yoichi Hoshi: "Iron thin films deposited by low voltage sputtering"Transaction of the Material Research Society of Japan. 28[4]. 1169-1172 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] Yoichi Hoshi, Hidehiko Shimizu: "Low temperature deposition of Indium tin oxide thin films by low voltage sputtering in various rare gases"IEICE Trans.Electron.. 87-C,(2). 212-217 (2004)

    • Related Report
      2003 Annual Research Report
  • [Publications] Yoichi Hoshi, Tomoki Takahashi: "High rate sputter-deposition of TiO_2 films using oxide target"IEICE Trans.Electron.. 87-C,(2). 227-231 (2004)

    • Related Report
      2003 Annual Research Report
  • [Publications] Y.Hoshi, T.Kiyotaka: "ITO thin films deposited at a low temperature by using a kinetic energy controlled sputter-deposition technique"Thin Solid Films. 411. 36-41 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] 清水英彦, 星陽一, 川畑州一: "偏光解析法を用いたAgスパッタ薄膜の初期成長過程の考察"電気学会論文誌A. 122巻8号. 755-760 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] Yohei Kon, Yoichi Hoshi: "Iron Thin Films Deposited by Low Voltage Sputtering"MRS Japan. (To be published). (2003)

    • Related Report
      2002 Annual Research Report
  • [Publications] T.Takahashi, T.Nakano, Y.Hoshi, H.Shmizu: "High Rate Deposition of TiO_2 Thin Films by Pulse Sputtering Technique"MRS Japan. (To be published). (2003)

    • Related Report
      2002 Annual Research Report
  • [Publications] Wataru Seiko, Yoichi Hoshi, Hidehiko Shimizu: "Fe and Fe-N films sputter deposited at liquid nitrogen temperature"Journal of Magnetism and Magnetic Materials. 235. 196-200 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] Yoichi Hoshi: "New sputter-deposited process for the formation of thin films with desired structure for magnetic recording"Journal of Magnetism and Magnetic Materials. 235. 347-353 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] Y.Hoshi, T.Kiyotaka: "ITO thin films deposited at a low temperature by using a kinetic energy controlled sputter-deposition technique"Thin Solid Films. (in print). (2002)

    • Related Report
      2001 Annual Research Report
  • [Publications] 清水英彦, 星陽一, 川畑州一: "偏光解析法を用いたAgスパッタ薄膜の初期成長過程の考察"電子情報通信学会誌. J85-C(印刷中). (2002)

    • Related Report
      2001 Annual Research Report

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Published: 2002-04-01   Modified: 2016-04-21  

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