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Research on the Semi-coherent Quantum Transport Simulation for Silicon Nanodevices.

Research Project

Project/Area Number 13650387
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field 電子デバイス・機器工学
Research InstitutionMeiji University

Principal Investigator

TOMIZAWA Kazutaka  Meiji University, School of Science and Technology, Professor, 理工学部, 教授 (80110980)

Co-Investigator(Kenkyū-buntansha) ISHII Kenichi  National Institute of Advanced Industrial Science and Technology (AIST), Nanoelectronics Research Institute (NeRI), Chief Researcher, エレクトロニクス研究部門, 主任研究員
SUZUKI Eiichi  National Institute of Advanced Industrial Science and Technology (AIST), Nanoelectronics Research Institute (NeRI), Deputy-Director, エレクトロニクス研究部門, 副部門長
TSUTSUMI Toshiyuki  Meiji University, School of Science and Technology, Assistant Professor, 理工学部, 講師 (60339570)
Project Period (FY) 2001 – 2003
Project Status Completed (Fiscal Year 2003)
Budget Amount *help
¥2,900,000 (Direct Cost: ¥2,900,000)
Fiscal Year 2003: ¥500,000 (Direct Cost: ¥500,000)
Fiscal Year 2002: ¥500,000 (Direct Cost: ¥500,000)
Fiscal Year 2001: ¥1,900,000 (Direct Cost: ¥1,900,000)
KeywordsDevice Simulation / Silicon Nanodevices / Double-Gate MOSFETs / Quantum Effect / Drift Diffusion Model / Balance Equations / Monte Calro Method / Compact Modeling / デバイスシュミレーション / 量子輸送 / 準コヒーレント状態 / 極微細シリコンデバイス
Research Abstract

During the research in the 2001 to 2003 fiscal year, the following research results were mainly obtained.
(1) The explicit solving method which used virtual time was employed for the analysis of a 1-dimensional bipolar transistor. It was demonstrated that the explicit solving method is effective for device analysis.
(2) The mixing method of drift diffusion and Monte Carlo method was developed for nanoscale semiconductor devices as the simulation technique.
(3) The Monte Carlo simulation method using the Bohm's quantum potential and Nelson's stochastic differential equation was developed. It succeeded in the analysis of a 1-dimensional double barrier resonance tunnel diode.
(4) Nanoscale 4-terminal FinFETs (XMOS) was successfully fabricated. Realization of Vth control was demonstrated from measurement of the electrical characteristics.
(5) The double charge sheet model for XMOS (the so-called double gate MOSFETs) with 4-terminal operations was proposed as the device model. The core portion of the compact model considering velocity saturation phenomenon was successfully developed. The validity of the compact model was confirmed in comparison to device simulation results.

Report

(4 results)
  • 2003 Annual Research Report   Final Research Report Summary
  • 2002 Annual Research Report
  • 2001 Annual Research Report
  • Research Products

    (69 results)

All Other

All Publications (69 results)

  • [Publications] T.Tsutsumi, K.Ishii, H.Hiroshima, S.Kanemaru, E.Suzuki, K.Tomizawa: "Electrical and Geometrical Properties of a Si Quantum Nanowire Device Fabricated by an Inorganic EB Resist Process"Proceedings of the 2001 International Micrprocesses and Nanotechnology Conference. 70-71 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] M.Abe, S.Madhavi, Y.Shimada, K.Hirakawa, K.Tomizawa: "Transient velocity of electrons in GaAs investigated by time-domain THz spectroscopy"Proceedings of the International Conference on Nonequilibrium Carrier Dynamics in Semiconductors (HCIS-12). (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] M.Abe, S.Madhavi, Y.Shimada, Y.Otsuka, K.Hirakawa, K.Tomizawa: "Transient carrier velocities in bulk GaAs : Quantitative comparison between terahertz data and ensemble Monte Carlo calculations"Applied Physics Letters. Volume 81,Number 4. 679-681 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Toshiyuki Tsutsumi, Kenichi Ishii, Hiroshi Hiroshima, Seigo KANEMARU, Eiichi SUZUKI, Kazutaka TOMIZAWA: "Close Observation of the Geometrical Features of an Ultranarrow Silicon Nanowire Device"Japanese Journal of Applied Physics. Part 1,Vol.41, No.6B. 4419-4422 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Kazutaka Tomizawa, Toshiyuki Tsutsumi: "A Monte Calro Method Based on Bohm's Quantum Potential and Nelson's Stochastic Equation"Program & Abstracts : The Second International Workshop on Quantum Nonplanar Nanostructures & Nanoelectronics '02 (QNN'02). 25-28 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.X.Liu, K.Ishii, T.Tsutsumi, M.Masahara, H.Takashima, E.Suzuki: "Fabrication of Fin-type Double-Gate MOSFET(FXMOS) Structure by Orientation-Dependent Etching and Electron Beam Lithography"Digest of Papers:2002 International Microprocess and Nanotechnology Conference. 122-123 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] T.Nakagawa, T.Sekigawa, T.Tsutsumi, E.Suzuki, H.Koike: "Primary Consideration on Compact Modeling of DG MOSFETs with Four-Terminal Operation Mode"Technical Proceedings of the 2003 Nanotechnology Conferech and Trade show. NANOTECH 2003 Volume 2. 330-333 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Yongxun Liu, Kenichi Ishii, Toshiyuki Tsutsumi, Meishoku Masahara, Eiichi Suzuki: "Ideal Rectangular Cross-Section Si-Fin Channel Double-Gate MOSFETs Fabricated Using Orientation-Dependent Wet Etching"IEEE Electron Devices Letter. Vol.24, No.7. 448-486 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.X.Liu, K.Ishii, T.Tsusumi, M.Masahara, T.Sekigawa, K.Sakamoto, H.Takashima, E.Suzuki: "Electrical Property of Ideal Rectangular Si-Fin Channel Double-Gate MOSFETS"Abstracts of 2003 Silicon Nanoelectronics Workshop.. 64-65 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Yongxun LIU, Kenichi ISHII, Toshiyuki TSUTSUMI, Meishoku MASAHARA, Hedenori TAKASHIMA, Eiichi SUZUKI: "Fin-Type Double-Gate Metal-Oxide-g and Semiconductor Field-Effect Transistors Fabricated by Orientation-Dependent Etching and Electron Beam Lithography"Japanese Journal of Applied Physics. Part 1, Vol.42, No.6B. 4142-4146 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Yongxun LIU, Kenichi ISHII, Toshiyuki TSUTSUMI, Meishoku MASAHARA, Toshihiro Sekigawa, Kunihiro Sakamoto, Hedenori TAKASHIMA, Hiromi Yamauchi, Eiichi SUZUKI: "Systematic Electrical Characteristics of Ideal Rectangular Cross Section Si-Fin Channel Double-Gate MOSFETs Fabricated by a Wet Process"IEEE Transactions of Nanotechnology. Vol.2, No.4. 198-204 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.Liu, K.Ishii, T.Tsutsumi, M.Masahara, H.Takashima, E.Suzuki: "Multi-Fin Double-Gate MOSFET Fabricated by Using (110)-Oriented SOI Wafers and Orientation-Dependent Etching"The Proceedings of the 203rd Meeting of the Electrochemical Society. 876 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.Liu, K.Ishii, T.Tsutsumi, M.Masahara, H.Takashima, E.Suzuki: "Multi-Fin Double-Gate MOSFET Fabricated by Using (110)-Oriented SOI Wafers and Orientation-Dependent Etching"Silicon-on-Insulator Technology and Devices XI, ECS. 255-260 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.X.Liu, K.Ishii, T.Tsutsumi, M.Masahara, T.Sekigawa, K.Sakamoto, H.Takashima, E.Suzuki: "Electrical Property of Ideal Rectangular Si-Fin Channel Double-Gate MOSFETs"Abstracts of 2003 Silicon Nanoelectronics Workshop, A Satellite Conference of the VLSI Symposium. 64-65 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.X.Liu, K.Ishii, M.Masahara, T.Tsutsumi, H.Takashima, E.Suzuki: "An Experimental Study of The Cross-Sectional Channel Shape Dependence of Shot-Channel Effects in Fin-Type Double-Gate MOSFETs"Extended Abstracts of the 2003 International Coferecnce on Solid State Deices and Materials. 284-285 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Liu, Y.X., Masahara, M., Ishii, K., Tsutsumi, T., Sekigawa, T., Takashima, H., Yamauchi, H., Suzuki, E.: "Flexible threshold voltage FinFETs with independent double gates and an ideal rectangular cross-section Si-Fin channel"IEDM'03 Technical Digest. 986-988 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Hanpei Koike, Tadashi Nakagawa, Toshihiro Sekigawa, Toshiyuki Tsutsumi, Masakazu Hioki, Takashi Kawanami, Eiichi Suzuki: "XMOS Compact Modeing and its Important Role in Vertically Integrated Novel Device Reseach"The Proceedings of ASP-DAC 2004 (Asia and South Pacific Design Automation Conference 2004). 14-17 (2004)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] T.Nakagawa, T.Sekigawa, T.Tsutsumi^*, M.Hioki, E.Suzuki, H.Koike: "Improved Compact Model for Four-Terminal DG MOSFETs"NANOTECH 2004 Proceedings of the 2004 Nanotechnology Conferech and Trade show. Volume 2. 159-162 (2004)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] 柳永勲, 石井賢一, 堤利幸, 昌原明植, 高嶋秀則, 鈴木栄一 (Y.X.Liu, K.Ishii, T.Tsutsumi, M.Masahara, H.Takashima, E.Suzuki): "結晶異方性エッチングを用いたFin型二重ゲートMOSFETの作製技術(Fin type double gate MOSFET fabrication technology using orientation-dependent etching)"第63回応用物理学会学術講演会 講演予稿集 (Extended Abstracts (The 63^<rd> Autumn Meeting, 2002); The Japan Society of Applied Physics). No.2, 25p-F-19. 798 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] 柳永員, 石井賢一, 堤利幸, 昌原明植, 高嶋秀則, 鈴木英一 (Y.X.Liu, K.Ishii, T.Tsutsumi, M.Masahara, H.Takashima, E.Suzuki): "理想的な矩形チャンネル断面をもつFin型二重ゲートMOSFET(FXMOSFET)の特性評価(Characterization of the Ideal Rectangular Si-Fin Channel Double-Gate MOSFET (FXMOSFET))"第50回応用物理学関係連合講演会 講演予稿集 (Extended Abstracts (The 50^<th> Spring Meeting, 2003); The Japan Society of Applied Physics). No.2, 28p-ZV-11. 964 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] 勝俣 真, 冨澤 一隆, (Shin KATSUMATA, Kazutaka TOMIZAWA): "ドリフト拡散・モンテカルロ結合モデルによるp-i-nフォトダイオードの解析(Analysis of the p-i-n photo-diode by the model combined Drift-Diffusion and Monte-Carlo)"日本シミュレーション学会大会 第21回シミュレーション・テクノロジー・コンファレンス 計算電気・電子工学シンポジウム 発表論文集 (Proceedings of the 21^<st> Simulation Technology Conference, Japan Society for Simulation Technology). 229-232 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] 鷹野 国男, 冨澤 一隆 (Kunio TAKANO Kazataka TOMIZAWA): "バランス方程式による半導体デバイスシミュレーション(Semiconductor device simulation based on balance equations)"日本シミュレーション学会大会 第21回シミュレーション・テクノロジー・コンファレンス 計算電気・電子工学シンポジウム 発表論文集 (Proceedings of the 21^<st> Simulation Technology Conference, Japan Society for Simulation Technology). 233-236 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] 冨澤 一隆 (Kazautaka TOMIZAWA): "マイクロ波半導体デバイスシミュレーション技術の現状と課題 (Semiconductor Device Simulation for Microwave Application)"電子情報通信学会 第6回マイクロ波シミュレータワークショップ 信学技報 ( The Institute of Electronics, Information and Comnication Engineers, The 6^<th> Microwave Simulator Workshop, Technical Report of IEICE). 1-8 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] 柳永員, 石井賢一, 堤利幸, 昌原明植, 高嶋秀則, 鈴木英一 (Y.X.Liu, K.Ishii, T.Tsutsumi, M.Masahara, H.Takashima, E.Suzuki): "13-nmの矩形Si-Finチャネル断面もつダブルゲートMOSFET (FXMOSFET)の特性評価(Characterization of the 13-nm thick Rectangular Si-Fin Channel Double-Gate MOSFET (FXMOSFET))"第64回応用物理学会学術講演会 講演予稿集 (Extended Abstracts (The 64^<th> Autumn Meeting, 2003);The Japan Society of Applied Physics). No.2,1p-YD-11/II. 797 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] 柳永員, 昌原明植, 石井賢一, 堤利幸, 関川敏弘, 高嶋秀則, 山内洋美, 鈴木英一, (Y.X.Liu, M.Masahara, K.Ishii, T.Tsutsumi, T.Sekigawa, H.Takashima, H.Yamauchi, E.Suzuki): "しきい値電圧制御可能な4端子FinFETの作製と電気特性(Fabrication of Threshold Voltage Controllable 4-Terminal FinFETs and Their Electrical Characteristics)"第51回応用物理学関係連合講演会 講演予稿集(Extended Abstracts (The 51^<th> Spring Meeting, 2004); The Japan Society of Applied Physics). No.2,30p-ZH-11. 977 (2004)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] 冨澤一隆, 山口憲(Kazutaka TOMIZAWA, Ken YAMAGUCHI): "セメスター大学講義 半導体デバイス-動作原理と応用-(Semester university lecture, Semiconductor devices - operation principles and applications -)"丸善株式会社(MARUZEN Corporation). 209 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] T.Tsutsumi, K.Ishii, H.Hiroshima, S.Kanemaru, E.Suzuki, K.Tomizawa: "Electrical and Geometrical Properties of a Si Quantum Nanowire Device Fabricated by an Inorganic EB Resist Process"Proceedings of the 2001 International Microprocesses and Nanotechnology Conference. 70-71 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] M.Abe, S.Madhavi, Y.Shimada, K.Hirakawa, K.Tomizawa: "Transient velocity of electrons in GaAs investigated by time-domain THz spectroscopy"Proceedings of the International Conference on Nonequilibrium Carrier Dynamics Semiconductors (HCIS-12). (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] M.Abe, S.Madhavi, Y.Shimada, Y.Otsuka, K.Hirakawa, K.Tomizawa: "Transient carrier velocities in bulk GaAs : quantitative comparison between terahertz data and emsemble Monte Carlo calculations"Applied Physics Letters. Volume 81,Number 4. 679-681 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Toshiyuki Tsutsumi, Kenichi Ishii, Hiroshi Hiroshima, Seigo KANEMARU, Eiichi SUZUKI, Kazutaka TOMIZAWA: "Close Observation of the Geometrical Features of an Ultranarrow Silicon Nanowire Device"Japanese Journal of Applied Physics. Part 1,Vol.41, No.6B. 4419-4422 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Kazutaka Tomizawa, Toshiyuki Tsutsumi: "A Monte Carlo method based on Bohm's quantum potential and Nelson's stochastic equation"Program & Abstracts : The Second International Workshop on Quantum Nonplanar Nanostructures & Nanoelectronics '02 (QNN'02). 25-28 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.X.Liu, K.Ishii, T.Tsutsumi, M.Masahara, H.Takashima, E.Suzuki: "Fabrication of Fin-type Double-Gate MOSFET(FXMOS) Structure by Orientation-Dependent Etching and Electron Beam Lithography"Digest of Papers: 2002 International Microprocess and Nanotechnology Conference. 122-123 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] T.Nakagawa, T.Sekigawa, T.Tsutsumi, E.Suzuki, H.Koike: "Primary Consideration on Compact Modeling of DG MOSFETs with Four-terminal Operation Mode"Technical Proceedings of the 2003 Nanotechnology Conferech and Trade show. NANOTECH 2003 VOLUME-NUMBER 2. 330-333 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Yongxun Liu, Kenichi Ishii, Toshiyuki Tsutsumi, Meishoku Masahara, Eiichi Suzuki: "Ideal Rectangular Cross-Section Si-FL Channel Double-Gate MOSFETs Fabricated Using Orientation-Dependent Wet Etching"IEEE Electron Devices Letter. Vol.24,No.7. 448-486 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.X.Liu, K.Ishii, T.Tsusumi, M.Masahara, T.Sekigawa, K.Sakamoto, H.Takashima, E.Suzuki: "Electrical Property of Ideal Rectangular Si-Fin Channel Double-Gate MOSFETS"Abstracts of 2003 Silicon Nanoelectronics Workshop. 64-65 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Yongxun LIU, Kenichi ISHII, Toshiyuki TSUTSUMI, Meishoku MASAHARA, Hedenori TAKASHIMA, Eiichi SUZUKI: "Fin-Type Double-Gate Metal-Oxide-g and Semiconductor Field-Effect Transistors Fabricated by Orientation-Dependent Etching and Electron Beam Lithography"Japanese Journal of Applied Physics. Part 1,Vol.42,No.6B. 4142-4146 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Yongxun LIU, Kenichi ISHII, Toshiyuki TSUTSUML, Meishoku MASAHARA, Toshihiro Sekigawa, Kunihiro Sakamoto, Hedenori TAKASHIMA, Hiromi Yamauchi, Eiichi SUZUKI: "Systematic Electrical Characteristics of Ideal Rectangular Cross Section Si-Fin Channel Double-Gate MOSFETh Fabricated by a Wet Process"IEEE Transactions of Nanotechnology. Vol.2,No.4. 198-204 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.Liu, K.Ishii, T.Tsutsumi, M.Masahara, H.Takashima, E.Suzuki: "Multi-Fin Double-Gate MOSFET Fabricated by Using (110)-Oriented SOI Wafers and Orientation-Dependent Etching"The Proceedings of the 203rd of the Electrochemical Society. 876 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.Liu, K.Ishii, T.Tsutsumi, M.Masahara, H.Takashima, E.Suzuki: "Multi-Fin Double-Gate MOSFET Fabricated by Using (110)-Oriented SOI Wafers and Orientation-Dependent Etching"Silicon-on-Insulator Technology and Devices XI, ECS. 255-260 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.X.Liu, K.Ishii, T.Tsutsumi, M.Masahara, T.Sekigawa, K.Sakamoto, H.Takashima, E.Suzuki: "Electrical Property of Ideal Rectangular Si-Fin Channel Double-Gate MOSFETs"Abstracts of 2003 Silicon Nanoelectronics Workshop, A Satellite Conference of the VLSI Symposium. 64-65 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.X.Liu, K.Ishii, M.Masahara, T.Tsutsumi, H.Takashima, E.Suzuki: "An Experimental Study of The Cross-Sectional Channel Shape Dependence of Shot-Channe Effects in Fin-Type Double-Gate MOSFETs"Extended Abstracts of the 2003 International Coference on Solid State Devices and Materials. 284-285 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Liu, Y.X.Masahara, M.Ishii, K.Tsutsumi, T.Sekigawa, T.Takashima, H.Yamauchi, H.Suzuki, E: "Flexible threshold voltage FinFETs with independent double gates and an ideal rectangular cross-section Si-Fin channel"IEDM '03 Technical Digest. 986-988 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Hanpei Koike, Tadashi Nakagawa, Toshihiro Sekigawa, Toshiyuki Tsutsumi, Masakazu Hioki, Takashi Kawanami, Eiichi Suzuki: "XMOS Compact Modeling and its Important Role in Vertically Integrated Novel Device Research"The Proceedings of ASP-DAC 2004 (Asia and South Pacific Design Automation Conference 2004). 14-17 (2004)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] T.Nakagawa, T.Sekigawa, T.Tsutsumi^*, M.Hioki, E.Suzuki, H.Koike: "Improved Compact Model for Four-Terminal DG MOSFETs"NANOTECH 2004 Proceedings of the 2004 Nanotechnology Conferech and Trade show. Volume 2. 159-162 (2004)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.X.Liu, K.Ishii, T.Tsutsumi, M.Masahara, H.Takashima, E.Suzuki: "Fin type double gate MOSFET fabrication technology using orientation-dependent etching"Extended Abstracts (The 63^<rd> Autumn Meeting, 2002); The Japan Society of Applied Physics. No.2,25p-F-19. 798 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.X.Liu, K.Ishii, T.Tsutsumi, M.Masahara, H.Takashima, E.Suzuki: "FXMOSFET)の特性評価」(Characterization of the Ideal Rectangular Si-Fin Channel Double-Gate MOSFET (FXMOSFET)"Extended Abstracts (The 50^<th> Spring Meeting, 2003); The Japan Society of Applied Physics. No.2,28p-ZV-11. 964 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Shin KATSUMATA, Kazutaka TOMIZAWA: "Analysis of the p-i-n photo-diode by the model combined Drift-Diffusion and Monte-Carlo"Proceedings of the 21^<st> Simulation Technology Conference, Japan Society for Simulation Technology. 229-232 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Kunio TAKANO, Kazataka TOMIZAWA: "Semiconductor device simulation based on balance equations"Proceedings of the 21^<st> Simulation Technology Conference, Japan Society for Simulation Technology. 233-236 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Kazautaka TOMIZAWA: "Semiconductor Device Simulation for Microwave Application"The Institute of Electronics, Information and Communication Engineers, The 6^<th> Microwave Simulator Workshop, Technical Report of IEICE. 1-8 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.X.Liu, K.Ishil, T.Tsutsumi, M.Masahara, H.Takashima, E.Suzuki: "Characterization of the 13-nm thick Rectangular Si-Fin Channel Double-Gate MOSFET (FXMOSFET)"Extended Abstracts (The 64^<th> Autumn Meeting,2003); The Japan Society of Applied Physics. No.2,1p-YD-11/II. 797 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.X.Liu, M.Masahara, K.Ishii, T.Tsutsumi, T.Sekigawa, H.Takashima, H.Yamauchi, E.Suzuki: "Fabrication of Threshold Voltage Controllable 4-Terminal FinFETs and Their Electrical Characteristics"Extended Abstracts (The 51^<th> Spring Meeting,2004); The Japan Society of Applied Physics. No.2,30p-ZH-11. 977 (2004)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Kazutaka TOMIZAWA: "Semester university lecture, Semiconductor devices -operation principles and applications"MARUZEN Corporation. 209 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Yongxun Liu, Kenichi Ishii, Toshiyuki Tsutsumi, Meishoku Masahara, Eiichi Suzuki: "Ideal Rectangular Cross-section Si-Fin Channel Double-Gate MOSFETs Fabricated Using Orientation-Dependent Wet Etching"IEEE Electron Devices Letter. Vol.24,No.7. 448-486 (2003)

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      2003 Annual Research Report
  • [Publications] Yongxun LIU, Kenichi ISHII, Toshiyuki TSUTSLTMI, Meishoku MASAHARA, Hedenori TAKASHIMA, Eiichi SUZUKI: "Fin-Type Double-Gate Metal-Oxide-g and Semiconductor Field-Effect Transistors Fabricated by Orientation-Dependent Etching and Electron Beam Lithography"Japanese Journal of Applied Physics. Part 1,Vol.42,No.6B. 4142-4146 (2003)

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      2003 Annual Research Report
  • [Publications] Yongxun LIU, Kenichi ISHII, Toshiyuki TSUTSUMI, Meishoku MASAHARA, Toshihuo Sekigawa, Kunihiro Sakamoto, Hedenori TAKASHIMA, Hiromi Yamauchi, Eiichi SUZUKI: "Systematic Electrical Characteristics of Ideal Rectangular Cross Section Si-Fin Channel Double-Gate MOSFETs Fabricated by a Wet Process"IEEE Transactions of Nanotechnology. Vol.2,No.4. 198-204 (2003)

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      2003 Annual Research Report
  • [Publications] Y.Liu, K.Ishii, T.Tsutsumi, M.Masahara, H.Takashima, E.Suzuki: "Multi-Fin Double-Gate MOSFET Fabricated by Using (110)-Oriented SOI Wafers and Orientation-Dependent Etching"The Proceedings of the 203rd Meeting of the Electrochemical Society. 876 (2004)

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      2003 Annual Research Report
  • [Publications] Y.Liu, K.Ishii, T.Tsutsumi, M.Masahara, H.Takashima, E.Suzuki: "Multi-Fin Double-Gate MOSFET Fabricated by Using (110)-Oriented Sol Wafers and Orientation-Dependent Etching"Silicon-on-Insulator Technology and Devices XI, ECS. 255-260 (2004)

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      2003 Annual Research Report
  • [Publications] Y.X.Liu, K.Ishii, T.Tsutsumi, M.Masabara, T.Sekigawa, K.Sakamoto, H.Takashima, E.Suzuki: "Electrical Property of Ideal Rectangular Si-Fin Channel Double-Gate MOSFETs"Abstracts of 2003 Silicon Nanoelectronics Workshop, A Satellite Conference of the VLSI Symposium. 64-65 (2003)

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      2003 Annual Research Report
  • [Publications] Toshiyuki Tsutsumi, Kenichi Ishii, Hiroshi Hiroshima, Seigo KANEMARU, Eiichi SUZUKI, Kazuraka TOMIZAWA: "Close Observation of the Geometrical Features of an Ultranarrow Silicon Nanowire Device"Japanese Journal of Applied Physics. Part 1, Vol.41, No.6B. 4419-4422 (2002)

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      2002 Annual Research Report
  • [Publications] Kazutaka Tomizawa, Toshiyuki Tsutsumi: "A Monte Calro Method Based on Bohm's Quantum Potential and Nelson's Stochastic Eauation"Program & Abstracts : The Second International Workshop on Quantum Nonplanar Nanostructures & Nanoelectronics '02 (QNN'02). 25-28 (2002)

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      2002 Annual Research Report
  • [Publications] Y.X.Liu, K.Ishii, T.Tsutsumi, M.Masahara, H.Takashima, E.Suzuki: "Fabrication of Fin-type Double-Gate MOSFET (FXMOS) Structure by Orientation-Dependent Etching and Electron Beam Lithography"Digest of Papers : 2002 International Microprocess and Nanotechnology Conference. 122-123 (2002)

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      2002 Annual Research Report
  • [Publications] T.Nakagawa, T.Sekigawa, T.Tsutsumi, E.Suzuki, H.Koike: "Primary Consideration on Compact Modeling of DG MOSFETs with Four-Terminal Operation Mode"Technical Proceedings of the 2003 Nanotechnology Conferech and Trade show. NANOTECH 2003 Volume 2. 330-333 (2003)

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      2002 Annual Research Report
  • [Publications] 柳永〓, 石井賢一, 堤利幸, 昌原明植, 高嶋秀則, 鈴木栄一: "結晶異方性エッチングを用いたFin型二重ゲートMOSFETの作製技術"第63回応用物理学会学術講演会 講演予稿集. No.2, 25p-F-19. 798 (2002)

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      2002 Annual Research Report
  • [Publications] 柳永員, 石井賢一, 堤利幸, 昌原明植, 高嶋秀則, 鈴木英一: "理想的な矩形チャンネル断面をもつFin型二重ゲートMOSFET(FXMOSFET)の特性評価"第50回応用物理学関係連合講演会 講演予稿集. No.2, 28p-ZV-11. 964 (2003)

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  • [Publications] 勝俣 真, 冨澤 一隆: "ドリフト拡散・モンテカルロ結合モデルによるP-i-nフォトダイオードの解析"日本シミュレーション学会大会 第21回シミュレーション・テクノロジー・コンファレンス計算電気・電子工学シンポジウム 発表論文集. 229-232 (2002)

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      2002 Annual Research Report
  • [Publications] 鷹野 国男, 冨澤 一隆: "バランス方程式による半導体デバイスシミュレーション"日本シミュレーション学会大会 第21回シミュレーション・テクノロジー・コンファレンス計算電気・電子工学シンポジウム発表論文集. 233-236 (2002)

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      2002 Annual Research Report
  • [Publications] 冨澤 一隆, 山口憲: "セメスター大学講義 半導体デバイス-動作原理と応用-"丸善株式会社. 209 (2003)

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      2002 Annual Research Report
  • [Publications] T.Tsutsumi, K.Ishii, H.Hiroshima, S.Kanemaru, E.Suzuki, K.Tomizawa: ""Electrical and Geometrical Properties of a Si Quantum Nanowire Device Fabricated by an Inorganic EB Resist Process""Proceedings of the 2001 International Micrprocesses and Nanotechnology Conference. 70-71 (2001)

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      2001 Annual Research Report
  • [Publications] M.Abe, S.Madhavi, Y.Shimada, K.Hirakawa, K.Tomizawa: ""Transient velocity of electrons in GaAs investigated by time-domain THz spectroscopy"Proceedings of the International Conference on Nonequilibrium Carrier Dynamics in Semiconductors (HCIS-12). (2001)

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      2001 Annual Research Report

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Published: 2001-04-01   Modified: 2016-04-21  

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