| Project/Area Number |
13650791
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Material processing/treatments
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| Research Institution | Tsuruoka National College of Technology |
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Principal Investigator |
YOSHIKI Hiroyuki Tsuruoka National College of Technology, Electrical Engineering, Associate Professor, 電気工学科, 助教授 (00300525)
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| Project Period (FY) |
2001 – 2003
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| Project Status |
Completed (Fiscal Year 2003)
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| Budget Amount *help |
¥3,600,000 (Direct Cost: ¥3,600,000)
Fiscal Year 2003: ¥900,000 (Direct Cost: ¥900,000)
Fiscal Year 2002: ¥800,000 (Direct Cost: ¥800,000)
Fiscal Year 2001: ¥1,900,000 (Direct Cost: ¥1,900,000)
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| Keywords | microplasma / atmospheric discharge / capillary inner-wall / electro-osmosis flow / wettability / microplasma jet / localized processing / Si etching / Si局所的エッチング / ユビキタスプラズマ源 / マイクロキャピラリ / 内壁処理 / 局所的エッチング / マイクロキャピラリー / シリコン酸化膜 |
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| Research Abstract |
RF excited microplasma generation system, which generates atmospheric-pressure He and Ar microplasma in a capillary with a cross section of 150×500 μm^2 on a quartz chip 2 cm square of a thickness of 1 mm at a low-power of less than 10 W, has been developed. It's a portable plasma source with a weight of about 5 kg. The atomic excitation temperature of He and Ar plasmas were estimated by an optical emission spectroscopic to be 2000-2500 K and 5000 K, respectively. The microplasma was applied to inner-wall modification and SiO_2 thin films coating on a poly(ethylene terephthalate) (PET) capillary with an inner diameter of φ0.5 mm to demonstrate the electro-osmosis flow (EOF) control. Furthermore, the microplasma was also applied to inner-wall treatment of a poly(tetrafluoroethylene) (PTFE) tube of φ1×0.5 mm to cause the wettability. The maximum wettability was obtained at a gas flow rate of 200 ml/min and a treatment time of 15 s. X-ray spectroscopy (XPS) of the plasma treated PTFE inner-wall revealed an O1s peak corresponding to the C=0 group. Scanning electron microscope (SEM) image showed that the plasma treated inner-wall is smoothed due to the etching effect.
Moreover, an atmospheric-pressure microplasma jet (μ-PJ) using a steel surgical needle with an outer diameter of less than 0.5 mm has been developed. The O_2 μ-PJ was applied a localized removal of a photoresist films. Furthermore, the localized Si etching was also examined using the He/SF_6/O_2 μ-PJ and the etching rate of 170 μm/min was attained.
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