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Development of Automatic Detection Machine for Contaminants on Wafer and Crystal Originated Particles (COP) in Wafer with Nano-meter order

Research Project

Project/Area Number 14350217
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Measurement engineering
Research InstitutionNagaoka University of Technology

Principal Investigator

AKIYAMA Nobuyuki  Nagaoka University of Technology, Engineering Department, Professor, 工学部, 教授 (90251850)

Co-Investigator(Kenkyū-buntansha) KOSIZUMI Mituyoshi  Hitachi Electric Engineering Co.Ltd., Research Department, Department manager, 研究部, 部長
KURITA Masanori  Nagaoka University of Technology, Engineering Department, Professor, 工学部, 教授 (20087175)
Project Period (FY) 2002 – 2003
Project Status Completed (Fiscal Year 2003)
Budget Amount *help
¥5,000,000 (Direct Cost: ¥5,000,000)
Fiscal Year 2003: ¥1,700,000 (Direct Cost: ¥1,700,000)
Fiscal Year 2002: ¥3,300,000 (Direct Cost: ¥3,300,000)
Keywordsparticle detection / COP (crystal originated particle) detection / scattered light detection / CZ wafer / FZ wafer
Research Abstract

In this study, an experiment and a theoretical analysis to detect the small particles adhering to a wafer and the crystal originated particles (COPs) existing in the wafer, whose diameters are approximately 0.1μm, are carried out successfully. The technology to separate COPs from detected particles is also carried out
The intensity distribution of light scattered by particles and COPs is calculated using the Maxwell equation under the assumption that they are illuminated by laser light. The finite difference time domain (FD-TD) method is used to solve the Maxwell equation. On the basis of the above mentioned results, it is theoretically verified that both particles and COPS larger than 0.1 μm in diameter are detected and recognized independently
For the experiment, both particles and COPs are detected when an Ar-ion laser is illuminated perpendicularly downward onto the wafer, and the obliquely scattered light is detected using a photomultiplier tube No.1. Only particles are detected when a YAG laser is illuminated obliquely with an incident angle of 77ー and the light scattered perpendicularly upward is detected using a photomultiplier tube No.2. On the basis of the two detected signals, the particles and COPs can be recognized independently
The experiment was conducted using two types of wafers. One is a wafer made by a Czochralski (CZ) method, which is known as a wafer with COPs, and the other is a wafer made by a floating zone (FZ) method, which is known as a non-COP wafer. COPs are detected on the CZ wafer but not on the FZ wafer. On the basis of this experimental result, it is experimentally verified that COPs can be detected.by this detection method
The experimental results coincide with the theoretical results

Report

(3 results)
  • 2003 Annual Research Report   Final Research Report Summary
  • 2002 Annual Research Report
  • Research Products

    (4 results)

All Other

All Publications (4 results)

  • [Publications] 秋山伸幸, 鈴木寿朗, 川田賢司, 吉田昌弘, 八掛保夫: "SiO_2薄膜付きウエハ上微粒子からの散乱光検出"精密工学会誌. 68. 531-535 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Nobuyuki AKIYAMA, Toshiaki SUZUKI, Kenji KAWATA, Masahiro YOSHIDA, Yasuo YATSUGAKE: "Detection of Light Scattered by Particles on Silicon Wafer"Journal of the Japan Society for Precision Engineering. Vol.68. 531-535 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] 秋山伸幸, 鈴木寿朗, 川田賢司, 吉田昌弘, 八掛保夫: "SiO_2薄膜付きウエハ上微粒子からの散乱光検出"精密工学会誌. 68巻4号. 531-535 (2002)

    • Related Report
      2003 Annual Research Report
  • [Publications] 秋山伸幸, 鈴木寿朗, 川田賢司, 吉田昌弘, 八掛保夫: "SiO_2薄膜付きウエハ上微粒子からの散乱光検出"精密工学会誌. 68巻4号. 531-535 (2002)

    • Related Report
      2002 Annual Research Report

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Published: 2002-04-01   Modified: 2016-04-21  

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