| Project/Area Number |
14550094
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
機械工作・生産工学
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| Research Institution | Tokyo University Agriculture And Technology |
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Principal Investigator |
OTANI Yukitoshi Tokyo University Agriculture And Technology, Faculty of Technology, Associate Professor, 工学部, 助教授 (10233165)
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| Project Period (FY) |
2002 – 2003
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| Project Status |
Completed (Fiscal Year 2003)
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| Budget Amount *help |
¥2,700,000 (Direct Cost: ¥2,700,000)
Fiscal Year 2003: ¥1,000,000 (Direct Cost: ¥1,000,000)
Fiscal Year 2002: ¥1,700,000 (Direct Cost: ¥1,700,000)
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| Keywords | vacuum-ultra violet / Optical elements / F2 laser / birefringence / fluorescent glass / calcium fluoride |
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| Research Abstract |
Semiconductors are highly integrated for the requirement of higher mass storage and high speed operation. The wavelength for exposure becomes shorter and shorter to improve high space resolution of lithography, because the space resolution of lithography depends on the wavelength. Now ArF laser is planning to be used for next generation of lithography and its resolution of line width is expected 90 nm. Moreover, the next next generation of lithography is intended to use a F2 (fluorine) laser in 157nm. There is little room for option of optical components except a calcium fluoride (CaF2). However it has birefringence dispersion such as true bireflingence. It means that birefringence increases in response to short wavelength. It is necessary to change the old way to measure by using visible light especially, He-Ne laser. Therefore we have to inspect optical components in the same wavelength. We propose a Mueller matrix polarimeter and interferometer for 1 57nm instead of birefringence measurement. Moreover, we purpose a novel image detection system for vacuum ultra-violet using a fluorescent glass. A vacuum Mueller matrix polarimeter is developed for measurement of the Muller matrix of samples, partially, calcium fluoride materials in 157nm wavelength. From the measured Mueller matrix with no sample present, we found the influence of absorption error in the detector and orientation error in quarter-wave plates on measurement results. The birefringence of samples is determind from the Mueller matrix. Experimental results show this Mueller matrix polarimeter is available to be used for characterizing the intrinsic birefringence of materials for processed lens at the 157nm lithography.
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