• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to previous page

Development of Novel Sputter System using Capacitively Coupled Neutral Loop Discharge Plasma Production Technology

Research Project

Project/Area Number 14550269
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field 電力工学・電気機器工学
Research InstitutionUniversity of Miyazaki

Principal Investigator

HONDA Chikahisa  University of Miyazaki, Faculty of Engineering, Professor, 工学部, 教授 (20037881)

Co-Investigator(Kenkyū-buntansha) YOUL-MOON Sung  University of Miyazaki, Faculty of Engineering, Associate Professor, 工学部, 助教授 (50304837)
OTSUBO Masahisa  University of Miyazaki, Faculty of Engineering, Professor, 工学部, 教授 (90041011)
Project Period (FY) 2002 – 2003
Project Status Completed (Fiscal Year 2003)
Budget Amount *help
¥3,800,000 (Direct Cost: ¥3,800,000)
Fiscal Year 2003: ¥1,300,000 (Direct Cost: ¥1,300,000)
Fiscal Year 2002: ¥2,500,000 (Direct Cost: ¥2,500,000)
KeywordsNeutral Loop Discharge (NLD) / Magnetic Null Field / Process Plasma / Sputtering / Capacitively Coupled NLD / Plasma Localization / Plasma Dynamic Control / Electron Heating / NLDプラズマ / 容量結合型プラズマ
Research Abstract

In this work, a new NLD plasma production technology for sputter application has been proposed. The results are summarized as follow.
1)Investigations on the degree of localization of NLD plasma produced under various conditions of the magnetic field, RF electric field, frequency and NL radius have been performed. From results, it was found that the plasma localization increased with F_0, which can be used to characterize the localization degree of the plasma production region. Considering the relation between F_0 and plasma localization, in-depth plasma control can be achieved at a given specific chamber size.
2)The electron behavior was investigated on experiment and simulation platforms. The results were in agreement with the existing inductively coupled type NLD. On the calculation platform, the electron motion around capacitive type magnetic null region exhibited the characteristic meandering motion. The same type of electron heating can be expected to occur in this new type plasma.
From the experimental results that the electron density and ion current density possessing peaks at the null region, it was ascertained that the electron heating around null region is also essential for plasma production in this capacitive type null field configuration.
From the thin film experiments, it could be found that the thickness uniformity was well enhanced with the substrate rotation and dynamical plasma control although further detail work is necessary to establish this. Furthermore, it is expected that the dynamic control of plasma over the target surface will be realized, because rotating and arranging the outer permanent magnets can actively control the position and area of magnetic null field region. With plasma application, the enhancement of target erosion and its uniformity are possible.

Report

(3 results)
  • 2003 Annual Research Report   Final Research Report Summary
  • 2002 Annual Research Report
  • Research Products

    (26 results)

All Other

All Publications (26 results)

  • [Publications] Y.M.Sung, M.Otsubo, C.Honda: "Studies of a magnetic null discharge for sputtering application"Surface & Coatings Technology. 171. 178-182 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.M.Sung, C.Honda: "Studies on the plasma localization of a magnetic neutral loop discharge using normalized radio frequency electric field"Journal of Vacuum Science and Technology B. 20・4. 1457-1464 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.M.Sung, S.Atsuta, M.Otsubo, C.Honda: "A Sputtering Type Neutral Loop Discharge Plasma"Proc.2003 IEEE International Conference on Plasma Science (Korea). 431 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] S.Atsuta, Y.M.Sung, M.Otsubo, C.Honda: "Magnetic null discharge sputtering with full target erosion"Proc.4th Asian-European International Conference on Plasma Surface Engineering (Korea). 98 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] S.Atsuta, Y.M.Sung, M.Otsubo, C.Honda: "A Novel Sputter System with Full Target Erosion"Proc.2003 Japan-Korea Joint Symposium on Electrical Discharge and High Voltage Engineering (Nagasaki). 337-340 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] S.Atsuta, Y.M.Sung, M.Otsubo, C.Honda: "A Study on the Sputtering Type Neutral Loop Discharge Plasma"Proc.2002 Joint Conference of ACED & K-J Symposium on Electrical Discharge and High Voltage Engineering (Korea). 483-486 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.M.Sung, M.Otsubo, C.Honda: "Plasma Dynamic Control of a Neutral Loop Discharge for Sputtering Application"Proc.Joint International Plasma Symposium of 6^<th> APCPST, 15^<th> SPSM, OS 2002 & l1^<th> KAPRA (Korea). 151 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.M.Sung, M.Otsubo, C.Honda: "Studies of a magnetic null discharge for sputtering application"Surface & Coatings Technology. 171. 178-182 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.M.Sung, C.Honda: "Studies on the plasma localization of a magnetic neutral loop discharge using normalized radio frequency electric field"Journal of Vacuum Science and Technology B. 20・4. 1457-1464 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.M.Sung, S.Atsuta, M.Otsubo, C.Honda: "A Sputtering Type Neutral Loop Discharge Plasma"Proc. 2003 IEEE International Conference on Plasma Science (Korea). 431 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] S.Atsuta, Y.M.Sung, M.Otsubo, C.Honda: "Magnetic null discharge sputtering with full target erosion"Proc. 4th Asian-European International Conference on Plasma Surface Engineering (Korea). 98 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] S.Atsuta, Y.M.Sung, M.Otsubo, C.Honda: "A Novel Sputter System with Full Target Erosion"Proc. 2003 Japan-Korea Joint Symposium on Electrical Discharge and High Voltage Engineering (Nagasaki). 337-340 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] S.Atsuta, Y.M.Sung, M.Otsubo, C.Honda: "A Study on the Sputtering Type Neutral Loop Discharge Plasma"Proc. 2002 Joint Conference of ACED & K-J Symposium on Electrical Discharge and High Voltage Engineering (Korea). 483-486 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.M.Sung, M.Otsubo, C.Honda: "Plasma Dynamic Control of a Neutral Loop Discharge for Sputtering Application"Proc. Joint International Plasma Symposium of 6^<th> APCPST, 15^<th> SPSM, OS 2002 & 11^<th> KAPRA (Korea). 151 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.M.Sung, M.Otsubo, C.Honda: "Studies of a magnetic null discharge for sputtering application"Surface & Coatings Technology. 171. 178-182 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] Y.M.Sung, C.Honda: "Studies on the plasma localization of a magnetic neutral loop discharge using normalized radio frequency electric field"Journal of Vacuum Science and Technology B. 20・4. 1457-1464 (2002)

    • Related Report
      2003 Annual Research Report
  • [Publications] Y.M.Sung, S.Atsuta, M.Otsubo, C.Honda: "A Sputtering Type Neutral Loop Discharge Plasma"Proc.2003 IEEE International Conference on Plasma Science (Korea). 431-431 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] S.Atsuta, Y.M.Sung, M.Otsubo, C.Honda: "Magnetic null discharge sputtering with full target erosion"Proc.4th Asian-European International Conference on Plasma Surface Engineering (Korea). 98-98 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] S.Atsuta, Y.M.Sung, M.Otsubo, C.Honda: "A Novel Sputter System with Full Target Erosion"Proc.2003 Japan-Korea Joint Symposium on Electrical Discharge and High Voltage Engineering (Nagasaki). 337-340 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] S.Atsuta, Y.M.Sung, M.Otsubo, C.Honda: "A Study on the Sputtering Type Neutral Loop Discharge Plasma"Proc.2002 Joint Conference of ACED & K-J Symposium on Electrical Discharge and High Voltage Engineering (Korea). 483-486 (2002)

    • Related Report
      2003 Annual Research Report
  • [Publications] Y.M.Sung, M.Otsubo, C.Honda: "Plasma Dynamic Control of a Neutral Loop Discharge for Sputtering Application"Proc.Joint International Plasma Symposium of 6^<th> APCPST, 15^<th> SPSM, OS 2002 & 11^<th> KAPRA, (Korea). 151-151 (2002)

    • Related Report
      2003 Annual Research Report
  • [Publications] Y.M.Sung, M.Otsubo, C.Honda: "Studies of a magnetic null discharge for sputtering application"Surface & Coatings Technology. (掲載予定). (2003)

    • Related Report
      2002 Annual Research Report
  • [Publications] Y.M.Sung, C.Honda: "Studies on the plasma localization of a magnetic neutral loop discharge using normalized radio freguency electric field"Journal of Vacuum Science and Technology B. Vol.20, No.4. 1457-1464 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] 成烈文, 敦由悟, 大坪昌久, 本田親久: "磁場ヌル放電プラズマの動的制御に関する基礎研究"プラズマ・核融合学会 九州・沖縄・山口支部 第6回支部大会 研究発表論文集. 1巻. 5-6 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] S.Atsuta, Y.M.Sung, M.Otsubo, C.Honda: "A Study on the Sputtering Type Neutral Loop Discharge Plasma"2002 Joint Conference of ACED & K-J Symposium on Electrical Discharge and High Voltage Engineering. Vol.2. 483-486 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] Y.M.Sung, M.Otsubo, C.Honda: "Plasma Dynamic Control of a Neutral Loop Discharge for Sputtering Application"Joint International Plasma Symposium of 6^<th> APCPST, 15^<th> SPSM, OS 2002 & 11^<th> KAPRA. Vol.1. (2002)

    • Related Report
      2002 Annual Research Report

URL: 

Published: 2002-04-01   Modified: 2016-04-21  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi