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Generation of Giant Thermo-electric Power by Ultra-heavily Boron Doped SiGe and Its Application

Research Project

Project/Area Number 15360161
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionKanazawa University

Principal Investigator

SASAKI Kimihiro  Kanazawa University, School of Natural Science & Technology, Professor, 自然科学研究科, 教授 (40162359)

Co-Investigator(Kenkyū-buntansha) 守本 純  防衛大学校, 電気情報学群, 教授
畑 朋延  金沢大学, 工学部, 教授 (50019767)
Project Period (FY) 2003 – 2005
Project Status Completed (Fiscal Year 2005)
Budget Amount *help
¥13,900,000 (Direct Cost: ¥13,900,000)
Fiscal Year 2005: ¥1,600,000 (Direct Cost: ¥1,600,000)
Fiscal Year 2004: ¥4,400,000 (Direct Cost: ¥4,400,000)
Fiscal Year 2003: ¥7,900,000 (Direct Cost: ¥7,900,000)
KeywordsThermo-electric Effect / SiGe / Strain / Epitaxial Growth / Power Factor / Seebeck coefficient / Crystalline Defect / ZT / 高濃度ドープ / 多層構造膜 / 熱電性能指数
Research Abstract

Crystallinity :
Crystalline growth of SiGe films was slightly observed to take place at 400℃ from XRD measurement. Below that the films were amorphous structure. The films were confirmed epitaxially grown from RHEED observation. Above 500℃, crystallinity was improved.
Resistivity :
Until 400℃, film resistivity decreased with increasing growth temperature but above that, resistivity was increased again. This phenomena is explained that at low temperature carrier is not generated because of the amorphous structure. While crystalline growth proceeds, carrier comes to be generated. Under almost perfect crystalline structure, however, resistivity increases again because of intrinsic semiconductor resulting in no carrier genneration. The reason of low resistivity at 400℃ is considered that appropriate crystalline defects generated carriers, which could conduct within the crystallized region.
Seebeck coefficient :
SiGe films prepared showed large Seebeck coefficients of 1.5-2.0mV/K which is more than 3 times larger than that of bulk SiGe. No special coreration was observed on Seebeck coefficient with samples.
Thermo-electric performances :
Power factor was estimated from the Seebeck coeffcient and resistivity and showed as high as 7.2x10^<-2>Wm^<-1>K^<-2>. Moreover, the non-dimensional figure of merit Z reached ZT=1.3 at room temperature. This value shows useful for practical use.

Report

(4 results)
  • 2005 Annual Research Report   Final Research Report Summary
  • 2004 Annual Research Report
  • 2003 Annual Research Report
  • Research Products

    (26 results)

All 2006 2005 2004 2003 Other

All Journal Article (17 results) Book (2 results) Patent(Industrial Property Rights) (1 results) Publications (6 results)

  • [Journal Article] Crystallinity and strain control growth of SiGe using ion sputtering technique2006

    • Author(s)
      Kimihiro Sasaki, Kazuya Yoshimori
    • Journal Title

      Thin Solid Films (In press)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Annual Research Report 2005 Final Research Report Summary
  • [Journal Article] A novel magnetron sputtering for flexible coatings as a function for production of high quality films2006

    • Author(s)
      C.Wang, K.Sasaki, Y.Yonezawa, T.Hata
    • Journal Title

      Vacuum (In press)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Annual Research Report 2005 Final Research Report Summary
  • [Journal Article] Crystallinity and strain control growth of SiGe using ion sputtering technique2006

    • Author(s)
      Kimihiro Sasaki, Kazuya Yoshimori
    • Journal Title

      Thin Solid Films 508

      Pages: 124-127

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Future Textile2006

    • Author(s)
      T.Hori, K.Sasaki et al.
    • Journal Title

      SENI-SHA

      Pages: 113-116

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Unbalanced Magnetron Sputtering using Cylindrical Target for Low-temperature Optical Costing2005

    • Author(s)
      C.Wang, K.Sasaki, Y.Yonezawa, T.Hata
    • Journal Title

      Jpn.J.Appl.Phys. 44・1B

      Pages: 669-672

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Annual Research Report 2005 Final Research Report Summary
  • [Journal Article] A novel magnetron sputtering for flexible coatings as a function for production of high quality films2005

    • Author(s)
      C.Wang, K.Sasaki, Y.Yonezawa, T.Hata
    • Journal Title

      Proc.of 8th Intern.Symposium on Sputtering & Plasma process

      Pages: 58-61

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Annual Research Report 2005 Final Research Report Summary
  • [Journal Article] 劣化エピタキシャル成長したSi-Ge系薄膜の熱電特性2005

    • Author(s)
      渡瀬博之, 的場彰成, 佐々木公洋, 岡本庸一, 守本純
    • Journal Title

      第2回日本熱電学会学術講演会

      Pages: 66-67

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Annual Research Report 2005 Final Research Report Summary
  • [Journal Article] Unbalanced Magnetron Sputtering using Cylindrical Target for Low-temperature Optical Costing2005

    • Author(s)
      C.Wang, K.Sasaki, Y.Yonezawa, T.Hata
    • Journal Title

      Jpn.J.Appl.Phys. 44[1B]

      Pages: 669-672

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Thermo-electric Properties of Deteriorate Epitaxial Grown Si-Ge Based Thin Films2005

    • Author(s)
      H.Watase, A.Matoba, K.Sasaki, Y.Okamoto, J.Morimoto
    • Journal Title

      2nd Meeting of The Thermoelectrics Society of Japan

      Pages: 66-67

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Sputter Growth SiGe Films-Epitaxy, Strain and Thermo-electric Properties2004

    • Author(s)
      K.Sasaki, T.Hata
    • Journal Title

      Abs.3^<rd> Intern.Workshop on New Group IV(Si-Ge-C) Semiconductors

      Pages: 45-46

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Sputtering Epitaxy of SiGe Films Using Mixture Target2004

    • Author(s)
      K.Yoshimori, K.Sasaki, T.Hata
    • Journal Title

      Abs.2004 Intern.Sypmp.on Organic and Inorganic Materials and Related Nanotechnologies

      Pages: 202-202

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary 2004 Annual Research Report
  • [Journal Article] Thermoelectric Properties of Si/Ge Multi-nanolaye Films Prepared by Ion-beam Sputtering Technique2004

    • Author(s)
      M.Kitai, H.Watase, K.Sasaki, T.Hata
    • Journal Title

      Abs.2004 Intern.Sypmp.on Organic and Inorganic Materials and Related Nanotechnologies

      Pages: 203-203

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Epitaxial Growth of SiGe Films Grown by Ion-Beam Sputtering and Generation of Large Thermoelectric Power2004

    • Author(s)
      K.Sasaki, M.Kitai, H.Watase
    • Journal Title

      Tech.Dig.of 2004 AWAD

      Pages: 91-95

    • NAID

      110003175593

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary 2004 Annual Research Report
  • [Journal Article] Sputter Growth SiGe Films -Epitaxy, Strain and Thermo-electric Properties2004

    • Author(s)
      K.Sasaki, T.Hata
    • Journal Title

      Abs.3^<rd> Intern.Workshop on New Group IV(Si-Ge-C) Semiconductors

      Pages: 45-46

    • Related Report
      2004 Annual Research Report
  • [Journal Article] Thermoelectric Properties of Si/Ge Multi-nanolayer Films Prepared by Ion-beam Sputtering Technique2004

    • Author(s)
      M.Kitai, H.Watase, K.Sasaki, T.Hata
    • Journal Title

      Abs.2004 Intern.Sypmp.on Organic and Inorganic Materials and Related Nanotechnologies

      Pages: 203-203

    • Related Report
      2004 Annual Research Report
  • [Journal Article] Anomalous large thermoelectric power on heavily B-doped SiGe thin films with thermal annealing2003

    • Author(s)
      T.Kawahara, S.M.Lee, Y.Okamoto, J.Morimoto, K.Sasaki, T.Hata
    • Journal Title

      Jpn.J.Appl.Phys. 41(8B)

    • NAID

      110004081121

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] A novel magnetron sputtering for flexible coatings as a function for production of high quality films

    • Author(s)
      C.Wang, K.Sasaki, Y.Yonezawa, T.Hata
    • Journal Title

      Vacuum (in press)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Book] Future Texile2006

    • Author(s)
      堀照夫監修, 佐々木公洋他
    • Total Pages
      438
    • Publisher
      繊維社
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Book] Future Textile2006

    • Author(s)
      堀照夫監修, 佐々木公洋他
    • Total Pages
      438
    • Publisher
      繊維社
    • Related Report
      2005 Annual Research Report
  • [Patent(Industrial Property Rights)] 傾斜材料とこれを用いた機能素子2005

    • Inventor(s)
      畑 朋延, 佐々木 公洋, 森田 信一
    • Industrial Property Rights Holder
      IHI
    • Filing Date
      2005-05-13
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Publications] 北居正弘, 池田乙元, 佐々木公洋, 畑朋延, 森田信一: "超高濃度BドープSi/GeB超格子構造の作製と熱電特性"電子情報通信学会技術研究報告. SDM2003-48. 85-89 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] K.Sasaki, T.Ikeda, M.Kitai, H.Konta, T.Hata: "Investigation of Effect of Sputtering Gases on Ion-Beam-Sputtering Growth of Si and Ge"Transactions of Materials Research Society of Japan. 28[4]. 1157-1159 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] K.SASAKI, K.KAWAI, T.HASU, M.YABUUCHI, T.HATA: "Feasibility of Ultra-thin Films for Gate Insulator by Limited Reaction Sputtering Process"IEICE Transactions on Electronics. E87-C[2]. 218-222 (2004)

    • Related Report
      2003 Annual Research Report
  • [Publications] 藪内誠, 河合賢太郎, 永田善也, 佐々木公洋, 畑朋延: "制限反応スパッタ法によるZrO2薄膜の界面構造とゲート絶縁膜特性"応用物理学会シリコンテクノロジー分科会. 52-1. 27-31 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] Yoichi Okamoto et al.: "The Measurement of Annealing Cycle Effect of Si-Ge-Au Amorphous Thin Film with Anomalously Large Thermoelectric Power by Using Photoacoustic Spectroscopy"Japanese Journal of Applied Physics. 42[5B]. 3048-3051 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] Makoto Hamabe et al.: "Thermoelectric Characteristics of Si/Ge Superlattice Thin Films at Temperatures Less Than 300 K"Japanese Journal of Applied Physics. 42[5B]. 6779-6783 (2003)

    • Related Report
      2003 Annual Research Report

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Published: 2003-04-01   Modified: 2016-04-21  

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