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STUDY OF A LITHOGRAPHY TECHNIQUE WITH LOW COST BY NANO-HEAT SPOT

Research Project

Project/Area Number 15360396
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Material processing/treatments
Research InstitutionNATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY

Principal Investigator

KUWAHARA Masashi  NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, CENTER FOR APPLIED NEAR-FIELD OPTICS RESEARCH, Senior Researcher, 近接場光応用工学研究センター, 主任研究員 (60356954)

Project Period (FY) 2003 – 2004
Project Status Completed (Fiscal Year 2004)
Budget Amount *help
¥11,900,000 (Direct Cost: ¥11,900,000)
Fiscal Year 2004: ¥5,300,000 (Direct Cost: ¥5,300,000)
Fiscal Year 2003: ¥6,600,000 (Direct Cost: ¥6,600,000)
KeywordsOptical disks / Mastering / Thermal lithography / Super resolution readout / Carbon nano tube / AFM / Mutual diffusion / リソグラフィー / 回折限界 / ガウス分布 / TeFeCo / 熱利用 / ナノスケール加工 / 超高密光ディスク / 熱リソグラフィ / 光ディスク原盤 / ZnS-SiO_2 / TbFeCo
Research Abstract

In this project, we focused on the phenomenon of nano-scale heating. The development of a fabrication technique (referred to here as thermal lithography) and the elucidation of the super-resolution readout mechanism were carried out. Light intensity inside a focused laser spot has a Gaussian profile and the temperature distribution induced by it has also a similar profile. Therefore, a high temperature area with sub-wavelength dimensions can be generated in the center of the focused laser spot. Physical or chemical reactions induced by heating can be confined inside this region. This phenomenon is useful for fabricating nano-scale structures and is integrally related to the super-resolution readout mechanism. We succeeded in producing minute dots 50 nm in diameter and with a spacing of 50 nm using a sample consisting of TbFeCo and ZnS-SiO_2. These dimensions and spacing were approximately one sixth of the optical diffraction limit. Additionally, advanced carbon nano tube(CNT) probes were developed for the observation of the fabricated structures in detail. The adoption of a base probe with a blunt apex and setting the CNT length to approximately 200 nm lead to better durability and lower noise in comparison with conventional CNT probes. The mechanism of super-resolution readout was believed to be related to the optical near-field or surface plasmons, however, it is clear from this study that nano-scale heating plays an important role in the mechanism, and the role of the each layer within the device structure was clarified. These results lead to a breakthrough in the development of super-resolution optical disks. In the future, application of thermal lithography to semiconductor fabrication as well as further clarifying the super-resolution readout mechanism and developing a temperature measurement system will be carried out.

Report

(3 results)
  • 2004 Annual Research Report   Final Research Report Summary
  • 2003 Annual Research Report
  • Research Products

    (24 results)

All 2005 2004 2003

All Journal Article (18 results) Patent(Industrial Property Rights) (6 results)

  • [Journal Article] Improvement in the aspect ratio of fabricated minute dots by the volume change thermal lithography technique2005

    • Author(s)
      M.Kuwahara et al.
    • Journal Title

      Microelectronic Engineering 78-79

      Pages: 359-363

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2004 Final Research Report Summary
  • [Journal Article] Volume-Change Thermal Lithography for Ultra-High Density Optical ROM Mastering Process2005

    • Author(s)
      M.Kuwahara et al.
    • Journal Title

      Proceedings of SPIE 5662

      Pages: 51-56

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2004 Final Research Report Summary
  • [Journal Article] Improvement in the aspect ratio of fabricated minute dots by the volume change thermal lithography technique2005

    • Author(s)
      M.Kuwahara, J.Kim, P.Fons, J.Tominaga
    • Journal Title

      Microelectronic Engineering 78-79

      Pages: 359-363

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2004 Final Research Report Summary
  • [Journal Article] Volume-Change Thermal Lithography for Ultra-High Density Optical ROM Mastering Process2005

    • Author(s)
      M.Kuwahara, J.Kim, Y.Duseop, J.Tominaga
    • Journal Title

      Proceedings of SPIE (5^<th> International Symposium on Laser Precision Microfabrication) 5662

      Pages: 51-56

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2004 Final Research Report Summary
  • [Journal Article] スーパーレンズディスクの超解像再生機構における熱効果2004

    • Author(s)
      桑原 正史 ら
    • Journal Title

      映像情報メディア学会誌 58

      Pages: 1429-1434

    • NAID

      110006837022

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2004 Final Research Report Summary
  • [Journal Article] Super resolutional readout disk with metal-free phthalocyanine recording layer2004

    • Author(s)
      T.Shima et al.
    • Journal Title

      Japanese Journal Applied Physics 43

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2004 Final Research Report Summary
  • [Journal Article] Thermal origin of readout mechanism of light-scattering super-resolution near-field structure disk2004

    • Author(s)
      M.Kuwahara et al.
    • Journal Title

      Japanese Journal Applied Physics 43

    • NAID

      10011950004

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2004 Final Research Report Summary
  • [Journal Article] Practical use of a carbon nanotube attached to a blunt apex in an atomic force microscope2004

    • Author(s)
      M.Kuwahara et al.
    • Journal Title

      Materials Characterization 52

      Pages: 43-48

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2004 Final Research Report Summary
  • [Journal Article] Nano Scale Dots Fabrication by Volume-Change Thermal-Lithography2004

    • Author(s)
      M.Kuwahara et al.
    • Journal Title

      Japanese Journal Applied Physics 43

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2004 Final Research Report Summary
  • [Journal Article] Thermal origin of readout mechanism of light-scattering super-resolution near-field structure disk2004

    • Author(s)
      M.Kuwahara, T.Shima, A.Kolobov, J.Tominaga
    • Journal Title

      Japanese Journal Applied Physics 43

    • NAID

      10011950004

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2004 Final Research Report Summary
  • [Journal Article] Super resolutional readout disk with metal-free phthalocyanine recording layer2004

    • Author(s)
      T.Shima, M.Kuwahara, T.Fukaya, T.Nakano, J.Tominaga
    • Journal Title

      Japanese Journal Applied Physics 43

    • NAID

      10011950343

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2004 Final Research Report Summary
  • [Journal Article] Nano Scale Dots Fabrication by Volume-Change Thermal-Lithography2004

    • Author(s)
      M.Kuwahara, J.Kim, Y.Duseop, J.Tominaga
    • Journal Title

      Japanese Journal Applied Physics 43

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2004 Final Research Report Summary
  • [Journal Article] Practical use of a carbon nanotube attached to a blunt apex in an atomic force microscope2004

    • Author(s)
      M.Kuwahara, H.Abe, H.Tokumoto, T.Shima, J.Tominaga, H.Fukuda
    • Journal Title

      Materials Characterization 52

      Pages: 43-48

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2004 Final Research Report Summary
  • [Journal Article] Nano Scale Dots Fabrication by Volume-Change Thermal-Lithography2004

    • Author(s)
      Masashi Kuwahara
    • Journal Title

      Japanese Journal Applied Physics 43巻・8B号

    • Related Report
      2004 Annual Research Report
  • [Journal Article] A volume-change thermal lithography technique2004

    • Author(s)
      Masashi Kuwahara
    • Journal Title

      Microelectronic Engineering 73巻及び74巻

      Pages: 69-73

    • Related Report
      2004 Annual Research Report
  • [Journal Article] Volume-Change Thermal Lithography for Ultra-High Density Optical ROM Mastering Process2004

    • Author(s)
      Masashi Kuwahara
    • Journal Title

      Proceedings of SPIE(5th International Symposium on Laser Precision Microfabrication) 5662巻

      Pages: 51-56

    • Related Report
      2004 Annual Research Report
  • [Journal Article] A volume-change thermal lithography technique2003

    • Author(s)
      M.Kuwahara et al.
    • Journal Title

      Microelectronic Engineering 73-74

      Pages: 69-74

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2004 Final Research Report Summary
  • [Journal Article] A volume-change thermal lithography technique2003

    • Author(s)
      M.Kuwahara, J.Kim, Y.Duseop, J.Tominaga
    • Journal Title

      Microelectronic Engineering 73-74

      Pages: 69-73

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2004 Final Research Report Summary
  • [Patent(Industrial Property Rights)] パターン形成材料、パターン形成方法および光ディスク2004

    • Inventor(s)
      桑原ら
    • Industrial Property Rights Holder
      産総研, サムソン
    • Industrial Property Number
      2004-244201
    • Filing Date
      2004-08-24
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2004 Final Research Report Summary
  • [Patent(Industrial Property Rights)] パターン形成材料、パターン形成方法および光ディスク2004

    • Inventor(s)
      桑原 正史 他
    • Industrial Property Rights Holder
      産総研・サムソン電子
    • Industrial Property Number
      2004-244201
    • Filing Date
      2004-08-24
    • Related Report
      2004 Annual Research Report
  • [Patent(Industrial Property Rights)] 微細構造描画用多層構造体と描画方法、及びそれを利用した光ディスクの原盤作製方法及びマスタリング方法2003

    • Inventor(s)
      桑原ら
    • Industrial Property Rights Holder
      産総研
    • Industrial Property Number
      2003-143624
    • Filing Date
      2003-05-21
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2004 Final Research Report Summary
  • [Patent(Industrial Property Rights)] 光記録ディスク2003

    • Inventor(s)
      島ら
    • Industrial Property Rights Holder
      産総研, TDK
    • Industrial Property Number
      2003-364093
    • Filing Date
      2003-10-24
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2004 Final Research Report Summary
  • [Patent(Industrial Property Rights)] データ再生方法およびデータ記録再生装置2003

    • Inventor(s)
      桑原ら
    • Industrial Property Rights Holder
      産総研, TDK
    • Industrial Property Number
      2003-372020
    • Filing Date
      2003-10-31
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2004 Final Research Report Summary
  • [Patent(Industrial Property Rights)] レーザービームの再生パワーの決定方法およびデータ記録再生装置2003

    • Inventor(s)
      桑原ら
    • Industrial Property Rights Holder
      産総研, TDK
    • Industrial Property Number
      2003-371626
    • Filing Date
      2003-10-31
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2004 Final Research Report Summary

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Published: 2003-04-01   Modified: 2016-04-21  

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