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Analysis of dynamics of particles suspended in non-equilibrium rf plasma space

Research Project

Project/Area Number 15360413
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Properties in chemical engineering process/Transfer operation/Unit operation
Research InstitutionHIR0SHIMA UNIVERSITY

Principal Investigator

SHIMADA Manabu  Hiroshima University, Graduate School of Engineering, Professor, 大学院・工学研究科, 教授 (70178953)

Co-Investigator(Kenkyū-buntansha) OKUYAMA Kikuo  Hiroshima University, Graduate School of Engineering, Professor, 大学院・工学研究科, 教授 (00101197)
WULED Lenggoro  Hiroshima University, Graduate School of Engineering, Research Associate, 大学院・工学研究科, 助手 (10304403)
Project Period (FY) 2003 – 2005
Project Status Completed (Fiscal Year 2005)
Budget Amount *help
¥14,500,000 (Direct Cost: ¥14,500,000)
Fiscal Year 2005: ¥2,200,000 (Direct Cost: ¥2,200,000)
Fiscal Year 2004: ¥2,200,000 (Direct Cost: ¥2,200,000)
Fiscal Year 2003: ¥10,100,000 (Direct Cost: ¥10,100,000)
Keywordsplasma dust / process plasma / low-temperature-plasma enhanced CVD / aerosol dynamics / coagulational growth / particle charging / laser light scatterine measurement / transport and deposition control / エアロゾル / 荷電
Research Abstract

The purpose of this study has been to understand the growth processes and transport phenomena of fine particles generated in a non-equilibrium plasma field by measuring the properties and motion of the particles. The research results in the research period are summarized as follows.
1.Detailed measurements of the spatial distribution of fine particles in plasma was made possible by installing an in-line particle measurement system in a plasma reactor equipped with an in situ laser light scattering measurement system. The range of the measurable size and concentration of particles was determined by using test particles. The properties of fine particles could be measured for those generated in the plasma CVD processes for thin film fabrication of SiO_2 and Si. The transport and deposition behavior and trapping phenomena of fine particles suspended in plasma and post-plasma fields could be evaluated by visualization of the particles.
2.The spatial distribution of several parameters characterizing a plasma field was obtained by measurements using plasma measurement devices and numerical simulation. Theoretical models for describing the processes of particle charging and coagulation were derived by considering the above parameters. Particle behavior predicted with the models was found to agree satisfactorily with measured results.
3.A numerical simulator was prepared by deriving a particle transport model based on the various forces acting on charged fine particles in plasma. The model and the simulator were validated with measured results. A technique for controlling the transport of fine particles in plasma was also proposed and its efficiency was verified by building an actual device based on the technique.
4.The model for coagulational growth of fine particles in plasma was analyzed in conjunction with the particle transport model, which made clear the mechanisms governing the size of fine particles generated in plasma.

Report

(4 results)
  • 2005 Annual Research Report   Final Research Report Summary
  • 2004 Annual Research Report
  • 2003 Annual Research Report
  • Research Products

    (71 results)

All 2006 2005 2004 2003 Other

All Journal Article (67 results) Publications (4 results)

  • [Journal Article] プラズマCVD装置内でのダストの静電除去-プラズマプロセスのクリーン化に寄与する技術の開発-.2006

    • Author(s)
      島田 学
    • Journal Title

      クリーンテクノロジー 16, 1

      Pages: 14-17

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] プラズマエッチング装置のパーティクル低減-エッチング装置におけるパーティクルのモニタリングと発塵の抑制-.2006

    • Author(s)
      守屋 剛
    • Journal Title

      クリーンテクノロジー 16, 2

      Pages: 16-22

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Suppression of Particle Generation in a Plasma Process Using a Sine-wave Modulated rf Plasma.2006

    • Author(s)
      Kashihara, N.
    • Journal Title

      J. Nanoparticle Res. (印刷中)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Plasma Synthesis of Light Emitting Gallium Nitride Nanoparticles Using a Novel Microwave-resonant Cavity.2006

    • Author(s)
      Shimada, M., et al.
    • Journal Title

      Jpn.J.Appl.Phys. 45, Pt.1,(1A)

      Pages: 328-332

    • NAID

      40007102832

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Removal of Dust Particles in Plasma Enhanced CVD Equipment by using the Electrostatic Force -Development of Technologies Contributing to Cleaning of Plasma Process-.2006

    • Author(s)
      Shimada, M., et al.
    • Journal Title

      Clean Technology 16,(1)

      Pages: 14-17

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Particle Reduction in Plasma Etching Equipments -Monitoring of Particles in Etching Equipment and Control of Dust Generation-.2006

    • Author(s)
      Moriya, T., et al.
    • Journal Title

      Clean Technology 16,(2)

      Pages: 16-22

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Suppression of Particle Generation in a Plasma Process Using a Sine-wave Modulated rf Plasma.2006

    • Author(s)
      Kashihara, N., et al.
    • Journal Title

      J.Nanoparticle Res. (in press)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] プラズマCVD装置内でのダストの静電除去-プラズマプロセスのクリーン化に寄与する技術の開発-.2006

    • Author(s)
      島田 学
    • Journal Title

      クリーンテクノロジー 16・1

      Pages: 14-17

    • Related Report
      2005 Annual Research Report
  • [Journal Article] プラズマエッチング装置のパーティクル低減-エッチング装置におけるパーティクルのモニタリングと発塵の抑制-.2006

    • Author(s)
      守屋 剛
    • Journal Title

      クリーンテクノロジー 16・2

      Pages: 16-22

    • Related Report
      2005 Annual Research Report
  • [Journal Article] Suppression of Particle Generation in a Plasma Process Using a Sine-wave Modulated rf Plasma.2006

    • Author(s)
      Kashihara, N.
    • Journal Title

      J.Nanoparticle Res. (印刷中)

    • Related Report
      2005 Annual Research Report
  • [Journal Article] 半導体製造装置における停電対策-停電・瞬時電圧低下により発生するパーティクルと復旧-.2005

    • Author(s)
      守屋 剛
    • Journal Title

      クリーンテクノロジー 15, 1

      Pages: 1-3

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] PECVD成膜装置内での粒子汚染現象に対する操作流量の影響.2005

    • Author(s)
      林 豊
    • Journal Title

      粉体工学会誌 42, 2

      Pages: 105-109

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Modeling of and Experiments on Dust Particle Levitation in the Sheath of a Radio Frequency Plasma Reactor.2005

    • Author(s)
      Setyawan, H.
    • Journal Title

      J. Appl.Phys. 97, 4

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Removal of Particles during Plasma Processes Using a Collector based on the Properties of Particles Suspended in the Plasma.2005

    • Author(s)
      Setyawan, H.
    • Journal Title

      J. Vac. Sci. Technol. A 23, 3

      Pages: 388-393

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Incorporation of Dust Particles into a Growing Film during Silicon Dioxide Deposition from a TEOS/O_2 Plasma.2005

    • Author(s)
      Shimada, M.
    • Journal Title

      Aerosol Sci. Tech. 39

      Pages: 408-414

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Observation of Heat-Induced Particle Re-suspension and Transport in a Vacuum Chamber.2005

    • Author(s)
      Moriya, T.
    • Journal Title

      Jpn. J. Appl. Phys. 44, 7A

      Pages: 4871-4877

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Effects of Mobility Change and Distribution of Bipolar Ions on Aerosol Nanoparticle Diffusion Charging.2005

    • Author(s)
      Lee, H. M.
    • Journal Title

      J. Chem. Eng. Japan 38, 7

      Pages: 486-496

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Reduction of Particle Contamination in an Actual Plasma Etching Process.2005

    • Author(s)
      Moriya, T.
    • Journal Title

      Int. Symp. On Semiconductor Manufacturing

      Pages: 229-232

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] 新規変調プラズマによるSiH_4/H_2プラズマCVDリアクター内のダスト微粒子の抑制.2005

    • Author(s)
      島田 学
    • Journal Title

      エアロゾル研究 20, 3

      Pages: 231-237

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Particle Reduction and Control in Plasma Etching Equipment.2005

    • Author(s)
      Moriya, T.
    • Journal Title

      IEEE Transactions on Semiconductor Manufacturing 18, 4

      Pages: 477-486

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Dust Particle Collector Using Electrostatic Force for Particulate Contamination Control in Plasma Enhanced CVD Reactor.2005

    • Author(s)
      Hayashi, Y.
    • Journal Title

      4th Asian Aerosol Conference

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Annual Research Report 2005 Final Research Report Summary
  • [Journal Article] Plasma Synthesis of Light Emitting Gallium Nitride Nanoparticles Using a Novel Microwave-resonant Cavity.2005

    • Author(s)
      Shimada, M.
    • Journal Title

      Jpn. J. Appl. Phys. 45, 1A

      Pages: 328-332

    • NAID

      40007102832

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Blackout Countermeasures in Semiconductor Manufacturing Equipments -Particles Generated in Blackout or Temporary Voltage Reduction and Recovery-.2005

    • Author(s)
      Moriya, T., et al.
    • Journal Title

      Clean Technology 15,(1)

      Pages: 1-3

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Effects of Gas Flow Rate on Particulate Contamination in a PECVD Reactor.2005

    • Author(s)
      Hayashi, Y., et al.
    • Journal Title

      J.Soc.Powder, Technol., Japan 42,(2)

      Pages: 105-109

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Modeling of and Experiments on Dust Particle Levitation in the Sheath of a Radio Frequency Plasma Reactor.2005

    • Author(s)
      Setyawan, H., et al.
    • Journal Title

      J.Appl.Phys. 97,(4)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Removal of Particles during Plasma Processes Using a Collector based on the Properties of Particles Suspended in the Plasma.2005

    • Author(s)
      Setyawan, H., et al.
    • Journal Title

      J.Vac.Sci.Tech.A 23,(3)

      Pages: 388-393

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Incorporation of Dust Particles into a Growing Film during Silicon Dioxide Deposition from a TEOS/O_2 Plasma.2005

    • Author(s)
      Shimada, M., et al.
    • Journal Title

      Aerosol Sci.Technol. 39,(5)

      Pages: 408-414

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Observation of Heat-Induced Particle Re-suspension and Transport in a Vacuum Chamber.2005

    • Author(s)
      Moriya, T., et al.
    • Journal Title

      Jpn.J.Appl.Phys. 44,(7A)

      Pages: 4871-4877

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Effects of Mobility Change and Distribution of Bipolar Ions on Aerosol Nanoparticle Diffusion Charging.2005

    • Author(s)
      Lee, H.M., et al.
    • Journal Title

      J.Chem.Eng.Japan 38,(7)

      Pages: 486-496

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Reduction of Particle Contamination in an Actual Plasma Etching Process.2005

    • Author(s)
      Moriya, T., et al.
    • Journal Title

      Int.Symp.on Semiconductor Manufacturing (ISSM)

      Pages: 229-232

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Suppression of Dust Particle Contamination in a SiH_4/H_2 Plasma CVD Reactor Using a New Type of Modulated Plasma.2005

    • Author(s)
      Shimada, M., et al.
    • Journal Title

      J.Aerosol Res. 20,(3)

      Pages: 231-237

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Particle Reduction and Control in Plasma Etching Equipment.2005

    • Author(s)
      Moriya, T., et al.
    • Journal Title

      IEEE Transactions on Semiconductor Manufacturing 18,(4)

      Pages: 477-486

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Dust Particle Collector Using Electrostatic Force for Particulate Contamination Control in Plasma Enhanced CVD Reactor.2005

    • Author(s)
      Hayashi, Y., et al.
    • Journal Title

      4th Asian Aerosol Conference A-29

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Effects of Mobility Change and Distribution of Bipolar Ions on Aerosol Nanoparticle Diffusion Charging.2005

    • Author(s)
      Lee, H.M.
    • Journal Title

      J.Chem.Eng.Japan 38・7

      Pages: 486-496

    • Related Report
      2005 Annual Research Report
  • [Journal Article] Reduction of Particle Contamination in an Actual Plasma Etching Process.2005

    • Author(s)
      Moriya, T.
    • Journal Title

      Int.Symp.on Semiconductor Manufacturing

    • Related Report
      2005 Annual Research Report
  • [Journal Article] 新規変調プラズマによるSiH_4/H_2プラズマCVDリアクター内のダスト微粒子の抑制.2005

    • Author(s)
      島田 学
    • Journal Title

      エアロゾル研究 20・3

      Pages: 231-237

    • Related Report
      2005 Annual Research Report
  • [Journal Article] Particle Reduction and Control in Plasma Etching Equipment.2005

    • Author(s)
      Moriya, T.
    • Journal Title

      IEEE Transactions on Semiconductor Manufacturing 18・4

      Pages: 477-486

    • Related Report
      2005 Annual Research Report
  • [Journal Article] Plasma Synthesis of Light Emitting Gallium Nitride Nanoparticles Using a Novel Microwave-resonant Cavity.2005

    • Author(s)
      Shimada, M.
    • Journal Title

      Jpn.J.Appl.Phys. 45・1A

      Pages: 328-332

    • NAID

      40007102832

    • Related Report
      2005 Annual Research Report
  • [Journal Article] 半導体製造装置における停電対策-停電・瞬時電圧低下により発生するパーティクルと復旧-2005

    • Author(s)
      守屋 剛
    • Journal Title

      クリーンテクノロジー 15, 1

      Pages: 1-3

    • Related Report
      2004 Annual Research Report
  • [Journal Article] PECVD成膜装置内での粒子汚染現象に対する操作流量の影響2005

    • Author(s)
      林 豊
    • Journal Title

      粉体工学会誌 42, 2

      Pages: 105-109

    • Related Report
      2004 Annual Research Report
  • [Journal Article] Modeling of and Experiments on Dust Particle Levitation in the Sheath of a Radio Freauency Plasma Reactor.2005

    • Author(s)
      Setyawan, H.
    • Journal Title

      J.Appl.Phys. 97, 4

    • Related Report
      2004 Annual Research Report
  • [Journal Article] Removal of Particles during Plasma Processes Using a Collector based on the Properties of Particles Suspended in the Plasma.2005

    • Author(s)
      Setyawan, H.
    • Journal Title

      J.Vac.Sci.Tech.A 23, 3(印刷中)

    • Related Report
      2004 Annual Research Report
  • [Journal Article] Incorporation of Dust Particles into a Growing Film during Silicon Dioxide Deposition from a TEOS/O2 Plasma.2005

    • Author(s)
      Shimada, M.
    • Journal Title

      Aerosol Sci.Techn. (印刷中)

    • Related Report
      2004 Annual Research Report
  • [Journal Article] Observation of Heat-Induced Particle Re-suspension and Transport in a Vacuum Chamber.2005

    • Author(s)
      Moriya, T.
    • Journal Title

      Jpn.J.Appl.Phys. (印刷中)

    • Related Report
      2004 Annual Research Report
  • [Journal Article] 次世代プラズマプロセスの開発.2004

    • Author(s)
      柏原伸紀
    • Journal Title

      化学工業 55, 1

      Pages: 26-30

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Particle Formation and Trapping Behavior in a TEOS/O_2 Plasma and Their Effects on Contamination of a Si Wafer.2004

    • Author(s)
      Setyawan, H.
    • Journal Title

      Aerosol Sci. Tech. 38, 2

      Pages: 120-127

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Observation and Evaluation of Flaked Particles Behaviors in Magnetically Enhanced Reactive Ion Etching Equipment Using Dipole Ring Magnet.2004

    • Author(s)
      Moriya, T.
    • Journal Title

      J. Vac. Sci. Technol. B 22, 4

      Pages: 1688-1693

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Suppression of Particulate Contamination for a PECVD Process by Using a New Type of Modulating Plasma.2004

    • Author(s)
      Shimada, M.
    • Journal Title

      Nanoparticles from the Vapor Phase Synthesis with Chemical and Biochemical Applications

      Pages: 9-9

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary 2004 Annual Research Report
  • [Journal Article] Particle Reduction and Contamination Control in Plasma Etching Equipment.2004

    • Author(s)
      Moriya, T.
    • Journal Title

      The 13th Int. Symp. on Semiconductor Manufacturing (ISSM)

      Pages: 193-197

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Evaluation of Dust Particle Properties and Particulate Contamination in a PECVD Reactor by Visualization Measurements.2004

    • Author(s)
      Hayashi, Y.
    • Journal Title

      The 10th APCChE Congress

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary 2004 Annual Research Report
  • [Journal Article] Visualization and Control of Particulate Contamination Phenomena in a Plasma Enhanced CVD Reactor.2004

    • Author(s)
      Shimada, M.
    • Journal Title

      AIChE 2004 Annual Meeting

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary 2004 Annual Research Report
  • [Journal Article] Behavior of Flaked Particles in a Magnetically Enhanced Reactive Ion Etching Equipment.2004

    • Author(s)
      Moriya, T.
    • Journal Title

      26th Int. Symp. on Dry Process (DPS 2004)

      Pages: 193-197

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Development of Next Generation Plasma Process.2004

    • Author(s)
      Kashihara, N., et al.
    • Journal Title

      Chemical Industry 55,(1)

      Pages: 26-30

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Particle Formation and Trapping Behavior in a TEOS/02 Plasma and Their Effects on Contamination of a Si Wafer.2004

    • Author(s)
      Setyawan, H., et al.
    • Journal Title

      Aerosol Sci.Technol 38,(2)

      Pages: 120-127

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Observation and Evaluation of Flaked Particles Behaviors in Magnetically Enhanced Reactive Ion Etching Equipment Using Dipole Ring Magnet.2004

    • Author(s)
      Moriya, T., et al.
    • Journal Title

      J.Vac.Sci.Technol.B 22,(4)

      Pages: 1688-1693

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Suppression of Particulate Contamination for a PECVD Process by Using a New Type of Modulating Plasma.2004

    • Author(s)
      Shimada, M., et al.
    • Journal Title

      Nanoparticles from the Vapor Phase Synthesis with Chemical and Biochemical Applications P-9

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Particle Reduction and Contamination Control in Plasma Etching Equipment.2004

    • Author(s)
      Moriya, T., et al.
    • Journal Title

      The 13th Int.Symp.on Semiconductor Manufacturing (ISSM)

      Pages: 193-197

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Evaluation of Dust Particle Properties and Particulate Contamination in a PECVD Reactor by Visualization Measurements.2004

    • Author(s)
      Hayashi, Y., et al.
    • Journal Title

      10th APCChE Congress A-46

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Visualization and Control of Particulate Contamination Phenomena in a Plasma Enhanced CVD Reactor.2004

    • Author(s)
      Shimada, M., et al.
    • Journal Title

      AIChE 2004 Annual Meeting 372g

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Behavior of Flaked Particles in a Magnetically Enhanced Reactive Ion Etching Equipment.2004

    • Author(s)
      Moriya, T., et al.
    • Journal Title

      26th Int.Symp.on Dry Process (DPS 2004)

      Pages: 193-197

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Observation and Evaluation of Flaked Particles Behaviors in Magnetically Enhanced Reactive Ion Etching Equipment Using Dipole Ring Magnet.2004

    • Author(s)
      Moriya, T.
    • Journal Title

      J.Vac.Sci.Technol.B 22, 4

    • Related Report
      2004 Annual Research Report
  • [Journal Article] Particle Reduction and Contamination Control in Plasma Etching Equipment.2004

    • Author(s)
      Moriya, T.
    • Journal Title

      The 13th Int.Symp.on Semiconductor Manufacturing (ISSM)

    • Related Report
      2004 Annual Research Report
  • [Journal Article] Behavior of Flaked Particles in a Magnetically Enhanced Reactive Ion Etching Equipment.2004

    • Author(s)
      Moriya, T.
    • Journal Title

      26th Int.Symp.on Dry Process (DPS 2004)

    • Related Report
      2004 Annual Research Report
  • [Journal Article] プラズマを用いた半導体製造装置内のパーティクル発生・成長・挙動の可視化.2003

    • Author(s)
      守屋 剛
    • Journal Title

      空気清浄 41, 3

      Pages: 212-221

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Particle Formation and Its Effect on Silicon Wafer Contamination During Thin Film Preparation Using TEOS/Oxygen Plasma.2003

    • Author(s)
      Shimada, M.
    • Journal Title

      Abstracts of 22nd Annual AAAR Conference

      Pages: 77-77

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Visualization of particle generation, growth and behavior in semiconductor manufacturing equipment with plasma processing.2003

    • Author(s)
      Moriya, T., et al.
    • Journal Title

      Journal of Japan Air Cleaning Association 41,(3)

      Pages: 212-221

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Particle Formation and Its Effect on Silicon Wafer Contamination During Thin Film Preparation Using TEOS/Oxygen Plasma.2003

    • Author(s)
      Shimada, M., et al.
    • Journal Title

      Abstracts of 22nd Annual AAAR Conference 77

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Publications] Setyawan, H.: "Particle Formation and Trapping Behavior in a TEOS/O_2 Plasma and Their Effects on Contamination of a Si Wafer"Aerosol Science and Technology. 38, 2. 120-127 (2004)

    • Related Report
      2003 Annual Research Report
  • [Publications] 柏原伸紀: "次世代プラズマプロセスの開発"化学工業. 55, 1. 26-30 (2004)

    • Related Report
      2003 Annual Research Report
  • [Publications] Shimada, M.: "Particle Formation and Its Effect on Silicon Wafer Contamination During Thin Film Preparation Using TEOS/Oxygen Plasma"Abstracts of 22nd Annual AAAR Conference. 77-77 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] 守屋 剛: "プラズマを用いた半導体製造装置内のパーティクル発生・成長・挙動の可視化"空気清浄. 41, 3. 212-221 (2003)

    • Related Report
      2003 Annual Research Report

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Published: 2003-04-01   Modified: 2021-04-07  

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