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Development of Novel electrochemical Nanofabrication Processes through Controlling Non-linear Diffusion

Research Project

Project/Area Number 15560633
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Material processing/treatments
Research InstitutionWaseda University

Principal Investigator

HOMMA Takayuki  Waseda University, Faculty of Science and Engineering, Professor, 理工学術院, 教授 (80238823)

Co-Investigator(Kenkyū-buntansha) SHOJI Shuichi  Waseda University, Faculty of Science and Engineering, Professor, 理工学術院, 教授 (00171017)
Project Period (FY) 2003 – 2005
Project Status Completed (Fiscal Year 2005)
Budget Amount *help
¥3,700,000 (Direct Cost: ¥3,700,000)
Fiscal Year 2005: ¥900,000 (Direct Cost: ¥900,000)
Fiscal Year 2004: ¥1,100,000 (Direct Cost: ¥1,100,000)
Fiscal Year 2003: ¥1,700,000 (Direct Cost: ¥1,700,000)
KeywordsMicrofabrication / Nano surface / interface / Micro chemical systems / Electrochemistry / Nano device fabrication
Research Abstract

The objective of this research was to develop novel nanofabrication processes of metal nanostructures trough electrochemical approaches. Especially, control and utilization of the nonlinear diffusion of the species, which is unique to the electrochemical processes, were emphasized. In the first year of the research, preferential electrochemical deposition of metal species at the nano-defect sites on Si wafer surface was confirmed, and by utilizing this, fabrication process of metal nanostructure was developed. Also, quantitative analysis was made for the reaction of reductant species at the surface of metal cluster using ab-initio molecular orbital calculation. In addition, attempt on the application of illumination-assisted anodization process was made to develop Si nanofabrication process, and by controlling the illumination condition using aperture-like structure, which controls nonlinear diffusion of holes to the reaction sites, uniform formation of macro pore array was achieved. I … More n the second year, the fabrication process of metal nanostructure onto Si wafer surface was improved to achieve further precision control for various metal species. The modification of the Si macro pore array was attempted to fabricate pico-liter volume glass tube array which is applicable as microreactors. The single-batch process to fabricate the pore array and its filling to form metal-needle array was also developed. In addition, theoretical analysis on the chemical properties of strained Si surface, which is key material for fabricating high-performance ULSI, was also attempted and the correlation between the surface reactivity and "degree of strain" was quantitatively evaluated. In the final year, fabrication process for through-hole to the tip of the glass tube was developed to form "nano-nozzle" array. This process was achieved by controlling the nonlinear diffusion of etchant species. By using this process, fabrication of filter devices and other systems was attempted. In addition, quantitative evaluation procedure of the reactivity of reductant for electroless deposition process was established using quantum chemical calculation approaches. As described, novel electrochemical processes for precision nanofabrication have been developed and detailed mechanism of the reaction processes has elucidated. Less

Report

(4 results)
  • 2005 Annual Research Report   Final Research Report Summary
  • 2004 Annual Research Report
  • 2003 Annual Research Report
  • Research Products

    (35 results)

All 2007 2006 2005 2004 Other

All Journal Article (30 results) Book (2 results) Patent(Industrial Property Rights) (1 results) Publications (2 results)

  • [Journal Article] Self-aligned Formation of Nano-holes to Arrayed Micro Glass Tubes2007

    • Author(s)
      H.Sato, T.Yamaguchi, T.Isobe, T.Homma, S.Shoji
    • Journal Title

      Electrochim. Acta (印刷中)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Molecular Orbital Study on the Oxidation Mechanism of Hydrazine and Hydroxylamine as Reducing Agents for Electroless Deposition Process2007

    • Author(s)
      T.Shimada, A.Tamaki, H.Nakai, T.Homma
    • Journal Title

      Electrochemistry (印刷中)

    • NAID

      10018285935

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Density Functional Theory Study on the Reaction Mechanism of Reductants for Electroless Ag Deposition Process2007

    • Author(s)
      T.Shimada, H.Nakai, T.Homma
    • Journal Title

      J. Electrochem. Soc. (印刷中)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Self-aligned Formation of Nano-holes to Arrayed Micro Glass Tubes2007

    • Author(s)
      Hiotaka Sato, Takuya Yamaguchi, Tetsuhiko Isobe, Takayuki Homma, Shuichi Shoji
    • Journal Title

      Electrochim. Acta 52 (in press)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Molecular Orbital Study on the Oxidation Mechanism of Hydrazine and Hydroxylamine as Reducing Agents for Electroless Deposition Process2007

    • Author(s)
      Takuya Shimada, Amiko Tamaki, Hiromi Nakai, Takayuki Homma
    • Journal Title

      Electrochemistry 75 (in press)

    • NAID

      10018285935

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Density Functional Theory Study on the 'Reaction Mechanism of Reductants for Electroless Ag Deposition Process2007

    • Author(s)
      Takuya Shimada, Hiromi. Nakai, Takayuki Homma
    • Journal Title

      J. Electrochem. Soc. 154 (in press)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Fabrication of High-Aspect-Ratio Arrayed Structures Using Si Ele ctrochemical Etching2006

    • Author(s)
      H.Sato, T.Homma
    • Journal Title

      Sci. Tech. of Adv. Mater. 7

      Pages: 468-474

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Fabrication of High- Aspect-Ratio Arrayed Structures Using Si Electrochemical Etching2006

    • Author(s)
      Hirotaka Sato, Takayuki Homma
    • Journal Title

      Sci. Tech. of Adv. Mater. 7

      Pages: 468-474

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Picoliter Volume Glass Tube Array Fabricated by Si Electrochemical Etching Process2005

    • Author(s)
      H.Sato, T.Homma, K.Mori, T.Osaka, S.Shoji
    • Journal Title

      Electrochim. Acta 51(5)

      Pages: 844-848

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Density Functional Theory Study on the Oxidation Mechanisms of Aldehydes as Reductants for Electroless Cu Deposition Process2005

    • Author(s)
      T.Shimada, K.Sakata, T.Homma, H.Nakai, T.Osaka
    • Journal Title

      Electrochim. Acta 51(5)

      Pages: 906-915

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Characterization of Strained Si Wafer Surface by Density Functional Theory Analysis2005

    • Author(s)
      K.Sakata, H.Nakai, T.Homma, T.Osaka
    • Journal Title

      Electrochim. Acta 51(5)

      Pages: 1000-1003

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Electrochemical Formation Process of Si Macropore and Metal Filling for High Aspect Ratio Metal Microstructure Using Single Electrolyte System2005

    • Author(s)
      H.Sato, T.Homma, K.Mori, T.Osaka, S.Shoji
    • Journal Title

      Electrochemistry 73(4)

      Pages: 275-278

    • NAID

      10014001963

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Fabrication of Patterned Nanostructures with Various Metal Species on Si Wafer Surface by Maskless and Electroless Process2005

    • Author(s)
      N.Kubo, T.Homma, Y.Hondo, T.Osaka
    • Journal Title

      Electrochim. Acta 51(5)

      Pages: 834-837

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Picoliter Volume Glass Tube Array Fabricated by Si Electrochemical Etching Process2005

    • Author(s)
      Hirotaka Sato, Takayuki Homma, Kentaro Mori, Tetsuya Osaka, Shuichi Shoji
    • Journal Title

      Electrochim. Acta 51(5)

      Pages: 844-848

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Density Functional Theory Study on the Oxidation Mechanisms of Aldehydes as Reductants for Electroless Cu Deposition Process2005

    • Author(s)
      Takuya Shimada, Kaoruho Sakata, Takayuki Homma, Hiromi Nakai, Tetsuya Osaka
    • Journal Title

      Electrochim. Acta 51(5)

      Pages: 906-915

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Characterization of Strained Si Wafer Surface by Density Functional Theory Analysis2005

    • Author(s)
      Kaoruho Sakata, Hiromi Nakai, Takayuki Homma, Tetsuya Osaka
    • Journal Title

      Electrochim. Acta 51(5)

      Pages: 1000-1003

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Electrochemical Formation Process of Si Macropore and Metal Filling for High Aspect Ratio Metal Microstructure Using Single Electrolyte System2005

    • Author(s)
      Hirotaka Sato, Takayuki Homma, Kentaro Mori, Tetsuya Osaka, Shuichi Shoji
    • Journal Title

      Electrochemistry 73(4)

      Pages: 275-278

    • NAID

      10014001963

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Fabrication of Patterned Nanostructures with Various Metal Species on Si Wafer Surface by Maskless and Electroless Process2005

    • Author(s)
      Nobuhiro Kubo, Takayuki Homma, Yosuke Hondo, Tetsuya Osaka
    • Journal Title

      Electrochim. Acta 51(5)

      Pages: 834-837

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Picoliter volume glass tube array fabricated by Si electrochemical etching process2005

    • Author(s)
      H.Sato, T.Homma, K.Mori, T.Osaka, S.Shoji
    • Journal Title

      Electrochim.Acta 51

      Pages: 844-848

    • Related Report
      2005 Annual Research Report
  • [Journal Article] Characterization of strained Si wafer surface by density functional theory analysis2005

    • Author(s)
      K.Sakata, T.Homma, H.Nakai, T.Osaka
    • Journal Title

      Electrochim.Acta 51

      Pages: 1000-1003

    • Related Report
      2005 Annual Research Report
  • [Journal Article] Density functional theory study on the oxidation mechanisms of aldehydes as reductants for electroless Cu deposition process2005

    • Author(s)
      T.Shimnada, K.Sakata, T.Homma, H.Nakai, T.Osaka
    • Journal Title

      Electrochim.Acta 51

      Pages: 906-915

    • Related Report
      2005 Annual Research Report
  • [Journal Article] Area-selective formation of macropore array by anisotropic electrochemical etching on n-Si(100)surface in aqueous HF solution2005

    • Author(s)
      T.Homma, H.Sato, K.Mori, T.Osaka, S.Shoji
    • Journal Title

      J.Phys.Chem.B 109(in press)

    • Related Report
      2004 Annual Research Report
  • [Journal Article] Area-Selective Formation of Macropore Array by Anisotropic Electrochemical Etching on an N-Si(100) Surface in Aqueous HF Solution2004

    • Author(s)
      T.Homma, H.Sato, K.Mori, T.Osaka, S.Shoji
    • Journal Title

      J. Phys. Chem. B 109(12)

      Pages: 5724-5727

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] 微小流路を用いた無電解析出プロセスによる複合金属ナノ粒子の作製2004

    • Author(s)
      佐藤裕崇, 大日向陽, 本間敬之, 逢坂 哲彌
    • Journal Title

      表面技術 55(2)

      Pages: 966-967

    • NAID

      10014096953

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Area-Selective Formation of Macro Pore Array by Anisotropic Electrochemical Etching on an N-Si(100) Surface in Aqueous HF Solution2004

    • Author(s)
      Takayuki Homma, Hirotaka Sato, Kentaro Mori, Tetsuya Osaka, Shuichi Shoji
    • Journal Title

      J. Phys. Chem. B 109(12)

      Pages: 5724-5727

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Syithesis of composite nanoparticles through electroless deposition using micro-channels2004

    • Journal Title

      J Surf Fin.Soc. Jpn. 55(12)

      Pages: 966-967

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Ab Initio Molecular Orbital Study of the Electron Emission Mechanism of TiCl3 as a Reductant for an Electroless Deposition Process2004

    • Author(s)
      T.Shimada, I.Komatsu, T.Homma, H.Nakai, T.Osaka
    • Journal Title

      Electrochemistry 72(6)

      Pages: 462-465

    • Related Report
      2004 Annual Research Report
  • [Journal Article] Area Selective Formation of Magnetic Nanodot Arrays on Si Wafer by Electroless Deposition2004

    • Author(s)
      J.Kawaji, F.Kitaizumi, H.Oikawa, D.Niwa, T.Homma, T.Osaka
    • Journal Title

      J.Magn.Magn.Matter 287

      Pages: 245-249

    • Related Report
      2004 Annual Research Report
  • [Journal Article] 電解・無電解析出法を用いた微小機能構造体の形成2004

    • Author(s)
      本間敬之
    • Journal Title

      表面技術 55(4)

      Pages: 232-236

    • NAID

      10012887126

    • Related Report
      2004 Annual Research Report
  • [Journal Article] 固液界面反応を用いたナノファブリケーションとデバイス構築2004

    • Author(s)
      本間敬之
    • Journal Title

      表面科学 25(5)

      Pages: 265-271

    • NAID

      10012929605

    • Related Report
      2004 Annual Research Report
  • [Book] Electrocrystallization in Nanotechnology2007

    • Author(s)
      T.Homma et al.(Co-authored)
    • Total Pages
      264
    • Publisher
      Wiley-VCH
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Book] 図解 最先端表面処理技術のすべて2006

    • Author(s)
      本間敬之他(共著)
    • Total Pages
      323
    • Publisher
      工業調査会
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Patent(Industrial Property Rights)] マイクロリアク及びその製造方法2004

    • Inventor(s)
      本間敬之, 庄子習一, 逢坂哲彌, 佐藤裕崇
    • Industrial Property Rights Holder
      早稲田大学
    • Filing Date
      2004-01-23
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Publications] T.Homma, N.Kubo, T.Osaka: "Maskless and electroless fabrication of patterned metal nanostructures on silicon wafers by controlling local surface activities"Electrochim. Acta. 48. 3115-3122 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] T.Homma, H.Sato, K.Mori, T.Osaka, S.Shoji: "High aspect ratio nanovolume glass cell array fabri-cated by area-selective silicon electrochemical etching process"Proc. IEEE MEMS2004. 17. 258-261 (2004)

    • Related Report
      2003 Annual Research Report

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Published: 2003-04-01   Modified: 2016-04-21  

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