| Budget Amount *help |
¥3,700,000 (Direct Cost: ¥3,700,000)
Fiscal Year 2005: ¥900,000 (Direct Cost: ¥900,000)
Fiscal Year 2004: ¥1,100,000 (Direct Cost: ¥1,100,000)
Fiscal Year 2003: ¥1,700,000 (Direct Cost: ¥1,700,000)
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| Research Abstract |
The objective of this research was to develop novel nanofabrication processes of metal nanostructures trough electrochemical approaches. Especially, control and utilization of the nonlinear diffusion of the species, which is unique to the electrochemical processes, were emphasized. In the first year of the research, preferential electrochemical deposition of metal species at the nano-defect sites on Si wafer surface was confirmed, and by utilizing this, fabrication process of metal nanostructure was developed. Also, quantitative analysis was made for the reaction of reductant species at the surface of metal cluster using ab-initio molecular orbital calculation. In addition, attempt on the application of illumination-assisted anodization process was made to develop Si nanofabrication process, and by controlling the illumination condition using aperture-like structure, which controls nonlinear diffusion of holes to the reaction sites, uniform formation of macro pore array was achieved. I
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n the second year, the fabrication process of metal nanostructure onto Si wafer surface was improved to achieve further precision control for various metal species. The modification of the Si macro pore array was attempted to fabricate pico-liter volume glass tube array which is applicable as microreactors. The single-batch process to fabricate the pore array and its filling to form metal-needle array was also developed. In addition, theoretical analysis on the chemical properties of strained Si surface, which is key material for fabricating high-performance ULSI, was also attempted and the correlation between the surface reactivity and "degree of strain" was quantitatively evaluated. In the final year, fabrication process for through-hole to the tip of the glass tube was developed to form "nano-nozzle" array. This process was achieved by controlling the nonlinear diffusion of etchant species. By using this process, fabrication of filter devices and other systems was attempted. In addition, quantitative evaluation procedure of the reactivity of reductant for electroless deposition process was established using quantum chemical calculation approaches. As described, novel electrochemical processes for precision nanofabrication have been developed and detailed mechanism of the reaction processes has elucidated. Less
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