| Budget Amount *help |
¥14,560,000 (Direct Cost: ¥11,200,000、Indirect Cost: ¥3,360,000)
Fiscal Year 2017: ¥2,210,000 (Direct Cost: ¥1,700,000、Indirect Cost: ¥510,000)
Fiscal Year 2016: ¥6,370,000 (Direct Cost: ¥4,900,000、Indirect Cost: ¥1,470,000)
Fiscal Year 2015: ¥5,980,000 (Direct Cost: ¥4,600,000、Indirect Cost: ¥1,380,000)
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| Outline of Final Research Achievements |
In this study, we aimed to develop a combinative oxide RT depositon method by using RT atomic layer depoition (ALD). By investigating the coadsorption reaction of the different precursors, we constructed the ALD process where the Al/(Al+Si) atomic ratio can be controlled in the range from 0.4 to 0.8. The fabricated alumina-silica film is applicable as an adsorbent of cations. When we apply this film to the photoanodes of the dye sensitized solar cells, it was confirmed that the photo current was enhanced. The present technology is applicable for decorating the photoanodes to enhance the power generation efficiency of dye sensitized solar cells.
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