| Budget Amount *help |
¥17,160,000 (Direct Cost: ¥13,200,000、Indirect Cost: ¥3,960,000)
Fiscal Year 2019: ¥2,210,000 (Direct Cost: ¥1,700,000、Indirect Cost: ¥510,000)
Fiscal Year 2018: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
Fiscal Year 2017: ¥2,340,000 (Direct Cost: ¥1,800,000、Indirect Cost: ¥540,000)
Fiscal Year 2016: ¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000)
Fiscal Year 2015: ¥8,190,000 (Direct Cost: ¥6,300,000、Indirect Cost: ¥1,890,000)
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| Outline of Final Research Achievements |
In this study, Microchannel Epitaxy, which is a sperior technique for dislocation reduction in highly-missmatched heteroepitaxy, is improved to obtain dislcation-free template substrate of the material that is hard to be supplied as a bulk substrate. The points of the research are the followings; one is the usage of graphene mask, and the other is the employment of remote-epitaxy for the reduction of dislocations, which transfer through the microchannel to the epitaxial layer. Consequently, we have succeeded in the superior utilization of graphene mask and the foundation of an innovative technique in which the graphene mask is used not only to enhance the decomposition rate of the source materials but also suppressing the transfer probability of the defect information of the substrate to the epitaxial layer.
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